Stephan Muellender

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective optical element and optical system for EUV lithography
- Patent number 9,996,005
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Microlithography illumination system and microlithography illuminat...
- Patent number 9,778,576
- Issue date Oct 3, 2017
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 9,720,329
- Issue date Aug 1, 2017
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element for EUV lithography and method of manufa...
- Patent number 9,606,446
- Issue date Mar 28, 2017
- Carl Zeiss SMT GmbH
- Norbert Wabra
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Deflection mirror and projection exposure apparatus for microlithog...
- Patent number 9,341,958
- Issue date May 17, 2016
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Microlithography illumination system and microlithography illuminat...
- Patent number 9,304,405
- Issue date Apr 5, 2016
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical system and projection exposure system including the...
- Patent number 9,285,515
- Issue date Mar 15, 2016
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Projection objective and method for its manufacture
- Patent number 8,944,615
- Issue date Feb 3, 2015
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Imaging optical system and projection exposure system including the...
- Patent number 8,605,255
- Issue date Dec 10, 2013
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,585,224
- Issue date Nov 19, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing a multilayer coating, optical element and opti...
- Patent number 8,457,281
- Issue date Jun 4, 2013
- Carl Zeiss SMT GmbH
- Hartmut Enkisch
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,382,301
- Issue date Feb 26, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element for radiation in the EUV and/or soft X-ray region a...
- Patent number 8,164,077
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Marco Wedowski
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical system for radiation in the EUV-wavelength range and method...
- Patent number 7,763,870
- Issue date Jul 27, 2010
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective and method for its manufacture
- Patent number 7,429,116
- Issue date Sep 30, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20160195817
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...
- Publication number 20160195820
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element for EUV Lithography and Method of Manufa...
- Publication number 20150316851
- Publication date Nov 5, 2015
- Carl Zeiss SMT GMBH
- Norbert WABRA
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
- Publication number 20140199543
- Publication date Jul 17, 2014
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING THE...
- Publication number 20140132941
- Publication date May 15, 2014
- Carl Zeiss SMT GMBH
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Deflection Mirror and Projection Exposure Apparatus for Microlithog...
- Publication number 20140022525
- Publication date Jan 23, 2014
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- B82 - NANO-TECHNOLOGY
Information Patent Application
Projection objective of a microlithographic projection exposure app...
- Publication number 20130242278
- Publication date Sep 19, 2013
- Carl Zeiss SMT GMBH
- Hartmut Enkisch
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20130148200
- Publication date Jun 13, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR PRODUCING A MULTILAYER COATING, OPTICAL ELEMENT AND OPTI...
- Publication number 20110222144
- Publication date Sep 15, 2011
- Carl Zeiss SMT GMBH
- Hartmut ENKISCH
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...
- Publication number 20110122392
- Publication date May 26, 2011
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION
- Publication number 20100265481
- Publication date Oct 21, 2010
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
- Publication number 20100149517
- Publication date Jun 17, 2010
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20090231707
- Publication date Sep 17, 2009
- Carl Zeiss SMT AG
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
- Publication number 20090015951
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD...
- Publication number 20080315134
- Publication date Dec 25, 2008
- Carl Zeiss SMT AG
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection objective and method for its manufacture
- Publication number 20050134980
- Publication date Jun 23, 2005
- Hans-Juergen Mann
- G02 - OPTICS

Stephan Muellender

Person

Patents Grantslast 30 patents

Reflective optical element and optical system for EUV lithography

Microlithography illumination system and microlithography illuminat...

Projection objective of a microlithographic projection exposure app...

Reflective optical element for EUV lithography and method of manufa...

Mirror for the EUV wavelength range, substrate for such a mirror, p...

Deflection mirror and projection exposure apparatus for microlithog...

Microlithography illumination system and microlithography illuminat...

Imaging optical system and projection exposure system including the...

Projection objective and method for its manufacture

Imaging optical system and projection exposure system including the...

Optical arrangement, in particular projection exposure apparatus fo...

Method for producing a multilayer coating, optical element and opti...

Optical arrangement, in particular projection exposure apparatus fo...

Optical element for radiation in the EUV and/or soft X-ray region a...

Optical system for radiation in the EUV-wavelength range and method...

Projection objective and method for its manufacture

Patents Applicationslast 30 patents

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...

Reflective Optical Element for EUV Lithography and Method of Manufa...

REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM INCLUDING THE...

Deflection Mirror and Projection Exposure Apparatus for Microlithog...

Projection objective of a microlithographic projection exposure app...

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

METHOD FOR PRODUCING A MULTILAYER COATING, OPTICAL ELEMENT AND OPTI...

MICROLITHOGRAPHY ILLUMINATION SYSTEM AND MICROLITHOGRAPHY ILLUMINAT...

IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION

PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...

PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE

OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD...

Projection objective and method for its manufacture