Stephan Six

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for determining material removal and device for the beam mac...
- Patent number 11,162,778
- Issue date Nov 2, 2021
- Carl Zeiss SMT GmbH
- Steffen Bezold
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical imaging with reduced immersion liquid evaporation effects
- Patent number 10,107,943
- Issue date Oct 23, 2018
- Carl Zeiss SMT GmbH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 9,733,395
- Issue date Aug 15, 2017
- Carl Zeiss SMT GmbH
- Vladimir Kamenov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging with reduced immersion liquid evaporation effects
- Patent number 9,645,513
- Issue date May 9, 2017
- Carl Zeiss SMT GmbH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging with reduced immersion liquid evaporation effects
- Patent number 8,934,079
- Issue date Jan 13, 2015
- Carl Zeiss SMT GmbH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer chuck for EUV lithography
- Patent number 8,564,925
- Issue date Oct 22, 2013
- Carl Zeiss SMT GmbH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement for immersion lithography with a hydrophobic co...
- Patent number 8,279,402
- Issue date Oct 2, 2012
- Carl Zeiss SMT GmbH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element, projection lens and associated projection exposure...
- Patent number 7,738,187
- Issue date Jun 15, 2010
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
DUV LITHOGRAPHY SYSTEM
- Publication number 20240201597
- Publication date Jun 20, 2024
- Carl Zeiss SMT GMBH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A LAYER OPTICAL ELEMENT, AND OPTICAL ASSEMBLY...
- Publication number 20240167145
- Publication date May 23, 2024
- Carl Zeiss SMT GMBH
- Stephan SIX
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DETERMINING MATERIAL REMOVAL AND DEVICE FOR THE BEAM MAC...
- Publication number 20200033115
- Publication date Jan 30, 2020
- Carl Zeiss SMT GMBH
- Steffen BEZOLD
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS
- Publication number 20190146122
- Publication date May 16, 2019
- Carl Zeiss SMT GMBH
- Stephan Six
- G02 - OPTICS
Information Patent Application
METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...
- Publication number 20190035512
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Christian Grasse
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS
- Publication number 20170329055
- Publication date Nov 16, 2017
- Carl Zeiss SMT GMBH
- Stephan Six
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20170322343
- Publication date Nov 9, 2017
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS
- Publication number 20150009565
- Publication date Jan 8, 2015
- Carl Zeiss SMT GMBH
- Stephan Six
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140320955
- Publication date Oct 30, 2014
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS
- Publication number 20120062865
- Publication date Mar 15, 2012
- Carl Zeiss SMT GMBH
- Stephan Six
- G02 - OPTICS
Information Patent Application
WAFER CHUCK FOR EUV LITHOGRAPHY
- Publication number 20110310524
- Publication date Dec 22, 2011
- Carl Zeiss SMT GMBH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20110222043
- Publication date Sep 15, 2011
- Carl Zeiss SMT GMBH
- Vladimir Kamenov
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT FOR IMMERSION LITHOGRAPHY WITH A HYDROPHOBIC CO...
- Publication number 20090233233
- Publication date Sep 17, 2009
- Carl Zeiss SMT AG
- Stephan SIX
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, PROJECTION LENS AND ASSOCIATED PROJECTION EXPOSURE...
- Publication number 20080304035
- Publication date Dec 11, 2008
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G02 - OPTICS
Information Patent Application
Microlithographic projection exposure apparatus
- Publication number 20080297754
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- Vladimir Kamenov
- G02 - OPTICS

Stephan Six

Person

Patents Grantslast 30 patents

Method for treating a reflective optical element for the EUV wavele...

Method for determining material removal and device for the beam mac...

Optical imaging with reduced immersion liquid evaporation effects

Microlithographic projection exposure apparatus

Optical imaging with reduced immersion liquid evaporation effects

Optical imaging with reduced immersion liquid evaporation effects

Wafer chuck for EUV lithography

Optical arrangement for immersion lithography with a hydrophobic co...

Optical element, projection lens and associated projection exposure...

Patents Applicationslast 30 patents

DUV LITHOGRAPHY SYSTEM

METHOD FOR DEPOSITING A LAYER OPTICAL ELEMENT, AND OPTICAL ASSEMBLY...

METHOD FOR DETERMINING MATERIAL REMOVAL AND DEVICE FOR THE BEAM MAC...

OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS

METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...

OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS

WAFER CHUCK FOR EUV LITHOGRAPHY

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

OPTICAL ARRANGEMENT FOR IMMERSION LITHOGRAPHY WITH A HYDROPHOBIC CO...

OPTICAL ELEMENT, PROJECTION LENS AND ASSOCIATED PROJECTION EXPOSURE...

Microlithographic projection exposure apparatus