Stephen J. DeMoor

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Allen, TX, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of mapping lithography focus errors
- Patent number 7,642,021
- Issue date Jan 5, 2010
- Texas Instruments Incorporated
- Guohong Zhang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Characterizing an exposure tool for patterning a wafer
- Patent number 6,847,919
- Issue date Jan 25, 2005
- Texas Instruments Incorporated
- Guohong Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for aligning and measuring misregistration
- Patent number 5,696,835
- Issue date Dec 9, 1997
- Texas Instruments Incorporated
- A. Kathleen Hennessey
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
Method of Mapping Lithography Focus Errors
- Publication number 20080176045
- Publication date Jul 24, 2008
- Guohong Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Characterizing an exposure tool for patterning a wafer
- Publication number 20040167748
- Publication date Aug 26, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Guohong Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY