Stephen YUEN

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Power deposition control in inductively coupled plasma (ICP) reactors
- Patent number 10,553,398
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Samer Banna
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielded lid heater assembly
- Patent number 10,083,816
- Issue date Sep 25, 2018
- Applied Materials, Inc.
- Michael D. Willwerth
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shielded lid heater assembly
- Patent number 9,362,148
- Issue date Jun 7, 2016
- Applied Materials, Inc.
- Michael D. Willwerth
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods to eliminate “M-shape” etch rate profile in inductively cou...
- Patent number 8,956,500
- Issue date Feb 17, 2015
- Applied Materials, Inc.
- Stephen Yuen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielded lid heater assembly
- Patent number 8,419,893
- Issue date Apr 16, 2013
- Applied Materials, Inc.
- Michael D. Willwerth
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching a substrate in a process zone
- Patent number 6,905,800
- Issue date Jun 14, 2005
- Stephen Yuen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated shallow trench isolation approach
- Patent number 6,677,242
- Issue date Jan 13, 2004
- Applied Materials Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of silicon etch and chamber cleaning processes
- Patent number 6,566,270
- Issue date May 20, 2003
- Applied Materials Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching silicon-containing material on substrates
- Patent number 6,322,714
- Issue date Nov 27, 2001
- Applied Materials Inc.
- Padmapani Nallan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SHIELDED LID HEATER ASSEMBLY
- Publication number 20160254123
- Publication date Sep 1, 2016
- Applied Materials, Inc.
- Michael D. WILLWERTH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER DEPOSITION CONTROL IN INDUCTIVELY COUPLED PLASMA (ICP) REACTORS
- Publication number 20150068682
- Publication date Mar 12, 2015
- Applied Materials, Inc.
- SAMER BANNA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELDED LID HEATER ASSEMBLY
- Publication number 20130189848
- Publication date Jul 25, 2013
- Michael D. WILLWERTH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHIELDED LID HEATER ASSEMBLY
- Publication number 20090236315
- Publication date Sep 24, 2009
- Applied Materials, Inc.
- Michael D. Willwerth
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO ELIMINATE "M-SHAPE" ETCH RATE PROFILE IN INDUCTIVELY COU...
- Publication number 20080264904
- Publication date Oct 30, 2008
- STEPHEN YUEN
- H01 - BASIC ELECTRIC ELEMENTS

Stephen YUEN

Person

Patents Grantslast 30 patents

Power deposition control in inductively coupled plasma (ICP) reactors

Shielded lid heater assembly

Shielded lid heater assembly

Methods to eliminate “M-shape” etch rate profile in inductively cou...

Shielded lid heater assembly

Etching a substrate in a process zone

Integrated shallow trench isolation approach

Integration of silicon etch and chamber cleaning processes

Process for etching silicon-containing material on substrates

Patents Applicationslast 30 patents

SHIELDED LID HEATER ASSEMBLY

POWER DEPOSITION CONTROL IN INDUCTIVELY COUPLED PLASMA (ICP) REACTORS

SHIELDED LID HEATER ASSEMBLY

SHIELDED LID HEATER ASSEMBLY

METHODS TO ELIMINATE "M-SHAPE" ETCH RATE PROFILE IN INDUCTIVELY COU...