Sterling G. Watson

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 11,348,222
- Issue date May 31, 2022
- KLA-Tencor Technologies Corp.
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 10,713,771
- Issue date Jul 14, 2020
- KLA-Tencor Technologies Corp.
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for inspection of wafers and reticles using des...
- Patent number 9,002,497
- Issue date Apr 7, 2015
- KLA-Tencor Technologies Corp.
- William Volk
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for providing selective defect sensitivity
- Patent number 7,440,093
- Issue date Oct 21, 2008
- KLA-Tencor Technologies Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for modifying a reticle's optical properties
- Patent number 7,303,842
- Issue date Dec 4, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for monitoring a reticle
- Patent number 7,300,729
- Issue date Nov 27, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for determining and correcting reticle variations
- Patent number 7,300,725
- Issue date Nov 27, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Systems and methods for mitigating variances on a patterned wafer u...
- Patent number 7,297,453
- Issue date Nov 20, 2007
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus and methods for providing selective defect sensitivity
- Patent number 7,271,891
- Issue date Sep 18, 2007
- KLA-Tencor Technologies Corporation
- Yalin Xiong
- G01 - MEASURING TESTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,731,787
- Issue date May 4, 2004
- KLA-Tencor Corporation
- Anthony Vacca
- G01 - MEASURING TESTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,381,358
- Issue date Apr 30, 2002
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for determining reticle defect printability
- Patent number 6,076,465
- Issue date Jun 20, 2000
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20200074619
- Publication date Mar 5, 2020
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20180247403
- Publication date Aug 30, 2018
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and Systems for Inspection of Wafers and Reticles Using Des...
- Publication number 20150178914
- Publication date Jun 25, 2015
- KLA-Tencor Technologies Corporation
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determing reticle defect printability
- Publication number 20090324054
- Publication date Dec 31, 2009
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20080133160
- Publication date Jun 5, 2008
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...
- Publication number 20080081385
- Publication date Apr 3, 2008
- Paul Frank Marella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20070140548
- Publication date Jun 21, 2007
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems and methods for mitigating variances on a patterned wafer u...
- Publication number 20060240336
- Publication date Oct 26, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for determining and correcting reticle variations
- Publication number 20060234145
- Publication date Oct 19, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and methods for modifying a reticle's optical properties
- Publication number 20060234139
- Publication date Oct 19, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for monitoring a reticle
- Publication number 20060234144
- Publication date Oct 19, 2006
- KLA-Tencor Technologies Corporation
- Sterling G. Watson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20050140970
- Publication date Jun 30, 2005
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods and systems for inspection of wafers and reticles using des...
- Publication number 20050004774
- Publication date Jan 6, 2005
- William Volk
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20040096094
- Publication date May 20, 2004
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20030138138
- Publication date Jul 24, 2003
- KLA-Tencor Corporation
- Anthony Vacca
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining reticle defect printability
- Publication number 20020126888
- Publication date Sep 12, 2002
- KLA-Tencor Corporation
- Anthony Vacca
- G01 - MEASURING TESTING

Sterling G. Watson

Person

Patents Grantslast 30 patents

Methods and systems for inspection of wafers and reticles using des...

Methods and systems for inspection of wafers and reticles using des...

Methods and systems for inspection of wafers and reticles using des...

Apparatus and methods for providing selective defect sensitivity

Systems and methods for modifying a reticle's optical properties

Method for monitoring a reticle

Method for determining and correcting reticle variations

Systems and methods for mitigating variances on a patterned wafer u...

Apparatus and methods for providing selective defect sensitivity

System and method for determining reticle defect printability

System and method for determining reticle defect printability

System and method for determining reticle defect printability

Patents Applicationslast 30 patents

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

Methods and Systems for Inspection of Wafers and Reticles Using Des...

System and method for determing reticle defect printability

System and method for determining reticle defect printability

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DES...

System and method for determining reticle defect printability

Systems and methods for mitigating variances on a patterned wafer u...

Method for determining and correcting reticle variations

Systems and methods for modifying a reticle's optical properties

Method for monitoring a reticle

System and method for determining reticle defect printability

Methods and systems for inspection of wafers and reticles using des...

System and method for determining reticle defect printability

System and method for determining reticle defect printability

System and method for determining reticle defect printability