Steve Hansen

Person

Phoenix, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Model for calculating a stochastic variation in an arbitrary pattern
- Patent number 11,835,862
- Issue date Dec 5, 2023
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Failure model for predicting failure due to resist layer
- Patent number 11,354,484
- Issue date Jun 7, 2022
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model for calculating a stochastic variation in an arbitrary pattern
- Patent number 11,126,090
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimization of a lithography apparatus or patterning process based...
- Patent number 11,029,594
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model for estimating stochastic variation
- Patent number 10,795,267
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method, program product and apparatus for predicting line width rou...
- Patent number 10,386,730
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Steve Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source mask optimization to reduce stochastic effects
- Patent number 9,934,346
- Issue date Apr 3, 2018
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system and lithographic apparatus
- Patent number 9,651,875
- Issue date May 16, 2017
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process tuning with polarization
- Patent number 9,563,135
- Issue date Feb 7, 2017
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source mask optimization to reduce stochastic effects
- Patent number 9,213,783
- Issue date Dec 15, 2015
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Illumination system and lithographic apparatus
- Patent number 9,116,439
- Issue date Aug 25, 2015
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarization designs for lithographic apparatus
- Patent number 8,982,324
- Issue date Mar 17, 2015
- ASML Holding N.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source-mask optimization in lithographic apparatus
- Patent number 8,786,824
- Issue date Jul 22, 2014
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,576,377
- Issue date Nov 5, 2013
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized polarization illumination
- Patent number 8,395,757
- Issue date Mar 12, 2013
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for predicting line width rou...
- Patent number 8,050,898
- Issue date Nov 1, 2011
- ASML Masktools B.V.
- Steve Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,043,797
- Issue date Oct 25, 2011
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced pitch multiple exposure process
- Patent number 7,981,595
- Issue date Jul 19, 2011
- ASML Netherlands B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced pitch multiple exposure process
- Patent number 7,906,270
- Issue date Mar 15, 2011
- ASML Netherlands B.V.
- Theodore A Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,898,644
- Issue date Mar 1, 2011
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduced pitch multiple exposure process
- Patent number 7,781,149
- Issue date Aug 24, 2010
- ASML Netherlands B.V.
- Theodore Allen Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized polarization illumination
- Patent number 7,710,544
- Issue date May 4, 2010
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,684,013
- Issue date Mar 23, 2010
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,528,934
- Issue date May 5, 2009
- ASML Netherlands B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization to avoid sidelobe printing
- Patent number 7,496,882
- Issue date Feb 24, 2009
- ASML Netherlands B.V.
- Steven Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction of optical proximity effects by intensity modulation of...
- Patent number 7,471,375
- Issue date Dec 30, 2008
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illuminator controlled tone reversal printing
- Patent number 7,421,677
- Issue date Sep 2, 2008
- ASML Netherlands B.V.
- Steven G. Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,372,540
- Issue date May 13, 2008
- ASML Netherlands B.V.
- Steve George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized polarization illumination
- Patent number 7,292,315
- Issue date Nov 6, 2007
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhanced lithographic resolution through double exposure
- Patent number 7,256,873
- Issue date Aug 14, 2007
- ASML Netherlands B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
- Publication number 20240160112
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
- Publication number 20210405538
- Publication date Dec 30, 2021
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FAILURE MODEL FOR PREDICTING FAILURE DUE TO RESIST LAYER
- Publication number 20210382393
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
- Publication number 20200159125
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...
- Publication number 20190369480
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Steven George HANSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL FOR ESTIMATING STOCHASTIC VARIATION
- Publication number 20190317410
- Publication date Oct 17, 2019
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN
- Publication number 20170010538
- Publication date Jan 12, 2017
- ASML NETHERLANDS B.V.
- Steven George HANSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SOURCE MASK OPTIMIZATION TO REDUCE STOCHASTIC EFFECTS
- Publication number 20160110488
- Publication date Apr 21, 2016
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20150241792
- Publication date Aug 27, 2015
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Source Mask Optimization to Reduce Stochastic Effects
- Publication number 20130179847
- Publication date Jul 11, 2013
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20130044302
- Publication date Feb 21, 2013
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, Program Product and Apparatus for Predicting Line Width Rou...
- Publication number 20120109607
- Publication date May 3, 2012
- ASML Mask Tools B.V.
- Steve Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCED PITCH MULTIPLE EXPOSURE PROCESS
- Publication number 20110244401
- Publication date Oct 6, 2011
- ASML NETHERLANDS B.V.
- Theodore A. PAXTON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20110228247
- Publication date Sep 22, 2011
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLARIZATION DESIGNS FOR LITHOGRAPHIC APPARATUS
- Publication number 20110139027
- Publication date Jun 16, 2011
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZED POLARIZATION ILLUMINATION
- Publication number 20110051114
- Publication date Mar 3, 2011
- Robert SOCHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOURCE-MASK OPTIMIZATION IN LITHOGRAPHIC APPARATUS
- Publication number 20100315614
- Publication date Dec 16, 2010
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080186468
- Publication date Aug 7, 2008
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080180649
- Publication date Jul 31, 2008
- ASML NETHERLANDS B.V.
- Steve George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for predicting line width rou...
- Publication number 20080183446
- Publication date Jul 31, 2008
- Steve Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080158529
- Publication date Jul 3, 2008
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized polarization illumination
- Publication number 20080043215
- Publication date Feb 21, 2008
- ASML MASKTOOLS B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVICE MANUFACTURING METHOD
- Publication number 20080030708
- Publication date Feb 7, 2008
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Enhanced lithographic resolution through double exposure
- Publication number 20070258073
- Publication date Nov 8, 2007
- ASML NETHERLANDS B.V.
- Jozef Maria Finders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070242251
- Publication date Oct 18, 2007
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070121090
- Publication date May 31, 2007
- ASML NETHERLANDS B.V.
- Alek Chi-Heng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduced pitch multiple exposure process
- Publication number 20070003878
- Publication date Jan 4, 2007
- ASML NETHERLANDS B.V.
- Theodore A. Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070002300
- Publication date Jan 4, 2007
- ASML NETHERLANDS B.V.
- Steven George Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060256311
- Publication date Nov 16, 2006
- ASML NETHERLANDS B.V.
- Steven Hansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reduced pitch multiple exposure process
- Publication number 20060216653
- Publication date Sep 28, 2006
- ASML NETHERLANDS B.V.
- Theodore Allen Paxton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Steve Hansen

Person

Patents Grantslast 30 patents

Model for calculating a stochastic variation in an arbitrary pattern

Failure model for predicting failure due to resist layer

Model for calculating a stochastic variation in an arbitrary pattern

Optimization of a lithography apparatus or patterning process based...

Model for estimating stochastic variation

Method, program product and apparatus for predicting line width rou...

Source mask optimization to reduce stochastic effects

Illumination system and lithographic apparatus

Process tuning with polarization

Source mask optimization to reduce stochastic effects

Illumination system and lithographic apparatus

Polarization designs for lithographic apparatus

Source-mask optimization in lithographic apparatus

Lithographic apparatus and device manufacturing method

Optimized polarization illumination

Method, program product and apparatus for predicting line width rou...

Lithographic apparatus and device manufacturing method

Reduced pitch multiple exposure process

Reduced pitch multiple exposure process

Lithographic apparatus and device manufacturing method

Reduced pitch multiple exposure process

Optimized polarization illumination

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Optimization to avoid sidelobe printing

Correction of optical proximity effects by intensity modulation of...

Illuminator controlled tone reversal printing

Lithographic apparatus and device manufacturing method

Optimized polarization illumination

Enhanced lithographic resolution through double exposure

Patents Applicationslast 30 patents

MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN

MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN

FAILURE MODEL FOR PREDICTING FAILURE DUE TO RESIST LAYER

MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN

OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...

MODEL FOR ESTIMATING STOCHASTIC VARIATION

MODEL FOR CALCULATING A STOCHASTIC VARIATION IN AN ARBITRARY PATTERN

SOURCE MASK OPTIMIZATION TO REDUCE STOCHASTIC EFFECTS

ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS

Source Mask Optimization to Reduce Stochastic Effects

Lithographic Apparatus and Method

Method, Program Product and Apparatus for Predicting Line Width Rou...

REDUCED PITCH MULTIPLE EXPOSURE PROCESS

ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS

POLARIZATION DESIGNS FOR LITHOGRAPHIC APPARATUS

OPTIMIZED POLARIZATION ILLUMINATION

SOURCE-MASK OPTIMIZATION IN LITHOGRAPHIC APPARATUS

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Method, program product and apparatus for predicting line width rou...

Lithographic apparatus and device manufacturing method

Optimized polarization illumination

DEVICE MANUFACTURING METHOD

Enhanced lithographic resolution through double exposure

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Reduced pitch multiple exposure process

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Reduced pitch multiple exposure process