Steve S. Y. Mak

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Advanced mask patterning with patterning layer
- Patent number 8,734,660
- Issue date May 27, 2014
- Intel Corporation
- Jian Ma
- B44 - DECORATIVE ARTS
Information Patent Grant
Advanced mask patterning with patterning layer
- Patent number 7,460,209
- Issue date Dec 2, 2008
- Intel Corporation
- Jian Ma
- B44 - DECORATIVE ARTS
Information Patent Grant
Fluorine free integrated process for etching aluminum including cha...
- Patent number 7,270,761
- Issue date Sep 18, 2007
- Appleid Materials, Inc
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Masking methods and etching sequences for patterning electrodes of...
- Patent number 6,919,168
- Issue date Jul 19, 2005
- Applied Materials, Inc.
- Jeng H. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching an anisotropic profile in platinum
- Patent number 6,749,770
- Issue date Jun 15, 2004
- Jeng H. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compact independent pressure control and vacuum isolation for a tur...
- Patent number 6,598,615
- Issue date Jul 29, 2003
- Applied Materials, Inc.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching methods for anisotropic platinum profile
- Patent number 6,323,132
- Issue date Nov 27, 2001
- Applied Materials, Inc.
- Jeng H. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for shielding a dielectric member to allow for...
- Patent number 6,277,251
- Issue date Aug 21, 2001
- Applied Materials, Inc.
- Jeng H. Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF plasma method
- Patent number 6,270,687
- Issue date Aug 7, 2001
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iridium etchant methods for anisotropic profile
- Patent number 6,265,318
- Issue date Jul 24, 2001
- Applied Materials, Inc.
- Jeng H. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron carbide parts and coatings in a plasma reactor
- Patent number 6,120,640
- Issue date Sep 19, 2000
- Applied Materials, Inc.
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF plasma etch reactor with internal inductive coil antenna and ele...
- Patent number 6,071,372
- Issue date Jun 6, 2000
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-cleaning focus ring
- Patent number 5,942,039
- Issue date Aug 24, 1999
- Applied Materials, Inc.
- Arnold Kholodenko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process gas focusing apparatus and method
- Patent number 5,891,348
- Issue date Apr 6, 1999
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas injection slit nozzle for a plasma process reactor
- Patent number 5,885,358
- Issue date Mar 23, 1999
- Applied Materials, Inc.
- Dan Maydan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF plasma reactor with cleaning electrode for cleaning during proce...
- Patent number 5,817,534
- Issue date Oct 6, 1998
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for cleaning by-products from plasma chamber s...
- Patent number 5,756,400
- Issue date May 26, 1998
- Applied Materials, Inc.
- Yan Ye
- B08 - CLEANING
Information Patent Grant
Gas injection slit nozzle for a plasma process reactor
- Patent number 5,746,875
- Issue date May 5, 1998
- Applied Materials, Inc.
- Dan Maydan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection slit nozzle for a plasma process reactor
- Patent number 5,643,394
- Issue date Jul 1, 1997
- Applied Materials, Inc.
- Dan Maydan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Passivating, stripping and corrosion inhibition of semiconductor su...
- Patent number 5,545,289
- Issue date Aug 13, 1996
- Applied Materials, Inc.
- Jian Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching using xenon
- Patent number 5,384,009
- Issue date Jan 24, 1995
- Applied Materials, Inc.
- Steven Mak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removal of photoresist over metal which also removes or...
- Patent number 5,174,856
- Issue date Dec 29, 1992
- Applied Materials, Inc.
- Jeng H. Hwang
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
ADVANCED MASK PATTERNING WITH PATTERNING LAYER
- Publication number 20080308527
- Publication date Dec 18, 2008
- Intel Corporation
- JIAN MA
- B44 - DECORATIVE ARTS
Information Patent Application
Advanced mask patterning with patterning layer
- Publication number 20060215135
- Publication date Sep 28, 2006
- Jian Ma
- B44 - DECORATIVE ARTS
Information Patent Application
Method and apparatus for cleaning a substrate processing chamber
- Publication number 20040200498
- Publication date Oct 14, 2004
- APPLIED MATERIALS, INC.
- Xikun Wang
- B08 - CLEANING
Information Patent Application
Fluorine free integrated process for etching aluminum including cha...
- Publication number 20040074869
- Publication date Apr 22, 2004
- APPLIED MATERIALS, INC.
- Xikun Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Masking methods and etching sequences for patterning electrodes of...
- Publication number 20030059720
- Publication date Mar 27, 2003
- Jeng H. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of etching an anisotropic profile in platinum
- Publication number 20020037647
- Publication date Mar 28, 2002
- Jeng H. Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for allowing a stable power transmission into a plasma proce...
- Publication number 20010050267
- Publication date Dec 13, 2001
- Jeng H. Hwang
- H01 - BASIC ELECTRIC ELEMENTS

Steve S. Y. Mak

Person

Patents Grantslast 30 patents

Advanced mask patterning with patterning layer

Advanced mask patterning with patterning layer

Fluorine free integrated process for etching aluminum including cha...

Masking methods and etching sequences for patterning electrodes of...

Method of etching an anisotropic profile in platinum

Compact independent pressure control and vacuum isolation for a tur...

Etching methods for anisotropic platinum profile

Apparatus and method for shielding a dielectric member to allow for...

RF plasma method

Iridium etchant methods for anisotropic profile

Boron carbide parts and coatings in a plasma reactor

RF plasma etch reactor with internal inductive coil antenna and ele...

Self-cleaning focus ring

Process gas focusing apparatus and method

Gas injection slit nozzle for a plasma process reactor

RF plasma reactor with cleaning electrode for cleaning during proce...

Method and apparatus for cleaning by-products from plasma chamber s...

Gas injection slit nozzle for a plasma process reactor

Gas injection slit nozzle for a plasma process reactor

Passivating, stripping and corrosion inhibition of semiconductor su...

Plasma etching using xenon

Method for removal of photoresist over metal which also removes or...

Patents Applicationslast 30 patents

ADVANCED MASK PATTERNING WITH PATTERNING LAYER

Advanced mask patterning with patterning layer

Method and apparatus for cleaning a substrate processing chamber

Fluorine free integrated process for etching aluminum including cha...

Masking methods and etching sequences for patterning electrodes of...

Method of etching an anisotropic profile in platinum

Method for allowing a stable power transmission into a plasma proce...