Steven Douglas Golladay

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multiple electron beam irradiation apparatus, multiple electron bea...
- Patent number 10,886,102
- Issue date Jan 5, 2021
- NuFlare Technology, Inc.
- Kazuhiko Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High performance source for electron beam projection lithography
- Patent number 6,596,999
- Issue date Jul 22, 2003
- Nikon Corporation
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Servo control for high emittance electron source
- Patent number 6,590,216
- Issue date Jul 8, 2003
- Nikon Corporation
- Samuel K. Doran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image position and lens field control in electron beam systems
- Patent number 6,420,713
- Issue date Jul 16, 2002
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pinhole detector for electron intensity distribution
- Patent number 6,353,231
- Issue date Mar 5, 2002
- Nikon Corporation
- Steven Douglas Golladay
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Compensation of within-subfield linewidth variation in e-beam proje...
- Patent number 6,296,976
- Issue date Oct 2, 2001
- Nikon Corporation
- Timothy R. Groves
- B82 - NANO-TECHNOLOGY
Information Patent Grant
On-line dynamic corrections adjustment method
- Patent number 6,218,671
- Issue date Apr 17, 2001
- Nikon Corporation
- Michael Gordon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensation of space charge in a particle beam system
- Patent number 6,201,251
- Issue date Mar 13, 2001
- Nikon Corporation
- Steven Douglas Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-element deflection aberration correction for electron beam li...
- Patent number 6,180,947
- Issue date Jan 30, 2001
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High emittance electron source having high illumination uniformity
- Patent number 6,091,187
- Issue date Jul 18, 2000
- International Business Machines Corporation
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic-electrostatic symmetric doublet projection lens
- Patent number 6,069,363
- Issue date May 30, 2000
- International Business Machines Corporation
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam projection lithography system (EBPS)
- Patent number 6,069,684
- Issue date May 30, 2000
- International Business Machines Corporation
- Steven D. Golladay
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Blanking system for electron beam projection system
- Patent number 6,023,067
- Issue date Feb 8, 2000
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Illumination deflection system for E-beam projection
- Patent number 6,005,250
- Issue date Dec 21, 1999
- Nikon Corporation
- Werner Stickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam imaging system having hollow beam illumination
- Patent number 5,821,542
- Issue date Oct 13, 1998
- International Business Machines Corporation
- Steven Douglas Golladay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Objective lens with large field deflection system and homogeneous l...
- Patent number 5,614,833
- Issue date Mar 25, 1997
- International Business Machines Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING
Information Patent Grant
System using induced current for contactless testing of wiring netw...
- Patent number 5,612,626
- Issue date Mar 18, 1997
- International Business Machines Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING
Information Patent Grant
Retarding field electron-optical apparatus
- Patent number 5,606,261
- Issue date Feb 25, 1997
- International Business Machines, Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING
Information Patent Grant
System using induced current for contactless testing of wiring netw...
- Patent number 5,404,110
- Issue date Apr 4, 1995
- International Business Machines Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING
Information Patent Grant
Method for opens/shorts testing of capacitively coupled networks in...
- Patent number 5,057,773
- Issue date Oct 15, 1991
- International Business Machines Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for opens/shorts testing of capacitively coupl...
- Patent number 4,943,769
- Issue date Jul 24, 1990
- International Business Machines Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam contactless testing system with grid bias switching
- Patent number 4,843,330
- Issue date Jun 27, 1989
- International Business Machines Corporation
- Steven D. Golladay
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MULTIPLE ELECTRON BEAM IRRADIATION APPARATUS, MULTIPLE ELECTRON BEA...
- Publication number 20200013585
- Publication date Jan 9, 2020
- NuFlare Technology, Inc.
- Kazuhiko INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High performance source for electron beam projection lithography
- Publication number 20030085364
- Publication date May 8, 2003
- Steven D. Golladay
- H01 - BASIC ELECTRIC ELEMENTS

Steven Douglas Golladay

Person

Patents Grantslast 30 patents

Multiple electron beam irradiation apparatus, multiple electron bea...

High performance source for electron beam projection lithography

Servo control for high emittance electron source

Image position and lens field control in electron beam systems

Pinhole detector for electron intensity distribution

Compensation of within-subfield linewidth variation in e-beam proje...

On-line dynamic corrections adjustment method

Compensation of space charge in a particle beam system

Multi-element deflection aberration correction for electron beam li...

High emittance electron source having high illumination uniformity

Magnetic-electrostatic symmetric doublet projection lens

Electron beam projection lithography system (EBPS)

Blanking system for electron beam projection system

Illumination deflection system for E-beam projection

Particle beam imaging system having hollow beam illumination

Objective lens with large field deflection system and homogeneous l...

System using induced current for contactless testing of wiring netw...

Retarding field electron-optical apparatus

System using induced current for contactless testing of wiring netw...

Method for opens/shorts testing of capacitively coupled networks in...

Apparatus and method for opens/shorts testing of capacitively coupl...

Electron beam contactless testing system with grid bias switching

Patents Applicationslast 30 patents

MULTIPLE ELECTRON BEAM IRRADIATION APPARATUS, MULTIPLE ELECTRON BEA...

High performance source for electron beam projection lithography