Steven Grzeskowiak

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Albany, NY, US

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Patents Applicationslast 30 patents

Information Patent Application
Method and Apparatus for In-Situ Dry Development
- Publication number 20240096622
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Steven Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Double Patterning Method of Patterning a Substrate
- Publication number 20240087892
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterning a Semiconductor Substrate
- Publication number 20240063019
- Publication date Feb 22, 2024
- TOKYO ELECTRON LIMITED
- Alexandra Krawicz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE HARDMASKS FOR SELF-ALIGNED MULTI-PATTERNING PROCESSES
- Publication number 20240047210
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Eric Chih-Fang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV Treatment of EUV Resists
- Publication number 20230152705
- Publication date May 18, 2023
- TOKYO ELECTRON LIMITED
- Steven Grzeskowiak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid Development of EUV Resists
- Publication number 20230078946
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Steven Grzeskowiak
- H01 - BASIC ELECTRIC ELEMENTS