Steven P. Caliendo

Person

Gold Canyon, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for high throughput using beam scan size and beam position i...
- Patent number 10,256,095
- Issue date Apr 9, 2019
- TEL Epion Inc.
- Soo Doo Chae
- G05 - CONTROLLING REGULATING
Information Patent Grant
Multi-step location specific process for substrate edge profile cor...
- Patent number 9,502,209
- Issue date Nov 22, 2016
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step location specific process for substrate edge profile cor...
- Patent number 9,105,443
- Issue date Aug 11, 2015
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting beam dimension for high-gradient lo...
- Patent number 8,298,432
- Issue date Oct 30, 2012
- TEL Epion Inc.
- Ruairidh MacCrimmon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for multi-pass correction of substrate defects
- Patent number 8,293,126
- Issue date Oct 23, 2012
- TEL Epion Inc.
- Ruairidh MacCrimmon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for increasing throughput during location specifi...
- Patent number 7,917,241
- Issue date Mar 29, 2011
- TEL Epion Inc.
- Nicolaus J. Hofmeester
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for assigning a beam intensity profile to a g...
- Patent number 7,564,024
- Issue date Jul 21, 2009
- TEL Epion Inc.
- Nicolaus J. Hofmeester
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and methods for systematic non-uniformity correction usin...
- Patent number 7,550,748
- Issue date Jun 23, 2009
- TEL Epion, Inc.
- Steve Caliendo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and processing systems for using a gas cluster ion beam to...
- Patent number 7,550,749
- Issue date Jun 23, 2009
- TEL Epion Inc.
- Steve Caliendo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling the movement of CVD reaction b...
- Patent number 7,521,089
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for stabilizing the internal surface of a PECVD process chamber
- Patent number 6,626,186
- Issue date Sep 30, 2003
- Tokyo Electron Limited
- Joseph Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for incorporating silicon into CVD metal films
- Patent number 6,562,708
- Issue date May 13, 2003
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for pretreating dielectric layers to enhance the adhesion of...
- Patent number 6,482,477
- Issue date Nov 19, 2002
- Tokyo Electron Limited
- Richard C. Westhoff
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for improving the adhesion of sputtered copper films to CVD...
- Patent number 6,455,414
- Issue date Sep 24, 2002
- Tokyo Electron Limited
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR HIGH THROUGHPUT USING BEAM SCAN SIZE AND BEAM POSITION I...
- Publication number 20170077001
- Publication date Mar 16, 2017
- TEL Epion Inc.
- Soo Doo Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...
- Publication number 20150348746
- Publication date Dec 3, 2015
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...
- Publication number 20150137006
- Publication date May 21, 2015
- TEL Epion Inc.
- Hongyu H. Yue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR ADJUSTING BEAM DIMENSION FOR HIGH-GRADIENT LO...
- Publication number 20090084672
- Publication date Apr 2, 2009
- TOKYO ELECTRON LIMITED
- Ruairidh MacCRIMMON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR MULTI-PASS CORRECTION OF SUBSTRATE DEFECTS
- Publication number 20090084759
- Publication date Apr 2, 2009
- TEL Epion Inc.
- Ruairidh MacCRIMMON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFI...
- Publication number 20090037015
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Nicolaus J. Hofmeester
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR ASSIGNING A BEAM INTENSITY PROFILE TO A G...
- Publication number 20090001282
- Publication date Jan 1, 2009
- TOKYO ELECTRON LIMITED
- Nicolaus J. Hofmeester
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHODS FOR SYSTEMATIC NON-UNIFORMITY CORRECTION USIN...
- Publication number 20080237491
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Steve Caliendo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND PROCESSING SYSTEMS FOR USING A GAS CLUSTER ION BEAM TO...
- Publication number 20080237492
- Publication date Oct 2, 2008
- TOKYO ELECTRON LIMITED
- Steven Caliendo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for controlling the movement of CVD reaction b...
- Publication number 20030230322
- Publication date Dec 18, 2003
- Tokyo Electron Limited of TBS Broadcast Center
- Joseph T. Hillman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Steven P. Caliendo

Person

Patents Grantslast 30 patents

Method for high throughput using beam scan size and beam position i...

Multi-step location specific process for substrate edge profile cor...

Multi-step location specific process for substrate edge profile cor...

Method and system for adjusting beam dimension for high-gradient lo...

Method and system for multi-pass correction of substrate defects

Method and system for increasing throughput during location specifi...

Methods and apparatus for assigning a beam intensity profile to a g...

Apparatus and methods for systematic non-uniformity correction usin...

Methods and processing systems for using a gas cluster ion beam to...

Method and apparatus for controlling the movement of CVD reaction b...

Method for stabilizing the internal surface of a PECVD process chamber

Method for incorporating silicon into CVD metal films

Method for pretreating dielectric layers to enhance the adhesion of...

Method for improving the adhesion of sputtered copper films to CVD...

Patents Applicationslast 30 patents

METHOD FOR HIGH THROUGHPUT USING BEAM SCAN SIZE AND BEAM POSITION I...

MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...

MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE COR...

METHOD AND SYSTEM FOR ADJUSTING BEAM DIMENSION FOR HIGH-GRADIENT LO...

METHOD AND SYSTEM FOR MULTI-PASS CORRECTION OF SUBSTRATE DEFECTS

METHOD AND SYSTEM FOR INCREASING THROUGHPUT DURING LOCATION SPECIFI...

METHODS AND APPARATUS FOR ASSIGNING A BEAM INTENSITY PROFILE TO A G...

APPARATUS AND METHODS FOR SYSTEMATIC NON-UNIFORMITY CORRECTION USIN...

METHODS AND PROCESSING SYSTEMS FOR USING A GAS CLUSTER ION BEAM TO...

Method and apparatus for controlling the movement of CVD reaction b...