Steven Raymond Walther

Person

Andover, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process control for atmospheric plasma treatment of surfaces
- Patent number 12,290,697
- Issue date May 6, 2025
- Steven R. Walther
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for plasma ignition with a self-resonating device
- Patent number 10,076,020
- Issue date Sep 11, 2018
- MKS Instruments, Inc.
- Shaun T. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma ignition with a self-resonating device
- Patent number 9,736,920
- Issue date Aug 15, 2017
- MKS Instruments, Inc.
- Shaun T. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exit window in electron beam emitter and method for f...
- Patent number 8,766,523
- Issue date Jul 1, 2014
- Hitachi Zosen Corporation
- Steven R. Walther
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electron beam sterilization apparatus
- Patent number 8,636,949
- Issue date Jan 28, 2014
- Hitachi Zosen Corporation
- Michael Lawrence Bufano
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Patterned assembly for manufacturing a solar cell and a method thereof
- Patent number 8,470,616
- Issue date Jun 25, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Paul Sullivan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Methods and apparatuses for reducing heat on an emitter exit window
- Patent number 8,339,024
- Issue date Dec 25, 2012
- Hitachi Zosen Corporation
- Steven R. Walther
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electron beam emitter with slotted gun
- Patent number 8,338,796
- Issue date Dec 25, 2012
- Hitachi Zosen Corporation
- Steven Raymond Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for low-temperature ion implantation
- Patent number 8,319,196
- Issue date Nov 27, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam sterilization apparatus
- Patent number 8,293,173
- Issue date Oct 23, 2012
- Hitachi Zosen Corporation
- Michael Lawrence Bufano
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Patterned assembly for manufacturing a solar cell and a method thereof
- Patent number 8,222,053
- Issue date Jul 17, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Paul Sullivan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Techniques for temperature controlled ion implantation
- Patent number 7,993,698
- Issue date Aug 9, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer bonding activated by ion implantation
- Patent number 7,939,424
- Issue date May 10, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Yuri Erokhin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for low-temperature ion implantation
- Patent number 7,935,942
- Issue date May 3, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned assembly for manufacturing a solar cell and a method thereof
- Patent number 7,820,460
- Issue date Oct 26, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Paul Sullivan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Predicting dose repeatability in an ion implantation
- Patent number 7,820,987
- Issue date Oct 26, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleave initiation using varying ion implant dose
- Patent number 7,820,527
- Issue date Oct 26, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Peter Nunan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for detecting wafer charging in a plasma processing system
- Patent number 7,675,730
- Issue date Mar 9, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Local pressure sensing in a plasma processing system
- Patent number 7,638,781
- Issue date Dec 29, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Outgassing rate detection
- Patent number 7,615,748
- Issue date Nov 10, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-uniform ion implantation
- Patent number 7,544,957
- Issue date Jun 9, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ surface contamination removal for ion implanting
- Patent number 7,544,959
- Issue date Jun 9, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- B08 - CLEANING
Information Patent Grant
Ion implant beam angle integrity monitoring and adjusting
- Patent number 7,459,703
- Issue date Dec 2, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steven Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for stable and repeatable ion implantation
- Patent number 7,396,746
- Issue date Jul 8, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma implantation of deuterium for passivation of semiconductor-d...
- Patent number 7,378,335
- Issue date May 27, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam current monitoring
- Patent number 7,342,240
- Issue date Mar 11, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion implantation systems and methods using solid source of d...
- Patent number 7,326,937
- Issue date Feb 5, 2008
- Verian Semiconductor Equipment Associates, Inc.
- Sandeep Mehta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling ion implantation during vacuum...
- Patent number RE40008
- Issue date Jan 22, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- 250 - Radiant energy
Information Patent Grant
Faraday dose and uniformity monitor for plasma based ion implantation
- Patent number 7,132,672
- Issue date Nov 7, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for plasma doping and ion implantation in an...
- Patent number 6,716,727
- Issue date Apr 6, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS CONTROL FOR ATMOSPHERIC PLASMA TREATMENT OF SURFACES
- Publication number 20210339034
- Publication date Nov 4, 2021
- Steven R. Walther
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
Method for Ion Implantation
- Publication number 20180315605
- Publication date Nov 1, 2018
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Steven Raymond Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Plasma Ignition with a Self-Resonating Device
- Publication number 20170303382
- Publication date Oct 19, 2017
- MKS Instruments Inc.
- Shaun T. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Metastable Enhanced Plasma Ignition
- Publication number 20160233055
- Publication date Aug 11, 2016
- MKS Instruments Inc.
- Shaun Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Plasma Ignition with a Self-Resonating Device
- Publication number 20160234924
- Publication date Aug 11, 2016
- MKS Instruments Inc.
- Shaun T. Smith
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CONTOURED SUPPORT GRID FOR HERMETICALLY SEALED THIN FILM APPLICATIONS
- Publication number 20140209820
- Publication date Jul 31, 2014
- Kenneth J. Barry
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ELECTRON BEAM STERILIZATION APPARATUS
- Publication number 20130015365
- Publication date Jan 17, 2013
- HITACHI ZOSEN CORPORATION
- Michael Lawrence Bufano
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
EMITTER EXIT WINDOW
- Publication number 20130009077
- Publication date Jan 10, 2013
- HITACHI ZOSEN CORPORATION
- Steven R. Walther
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF
- Publication number 20120276684
- Publication date Nov 1, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Paul SULLIVAN
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
TECHNIQUE FOR LOW-TEMPERATURE ION IMPLANTATION
- Publication number 20110207308
- Publication date Aug 25, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. ENGLAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EBEAM STERILIZATION APPARATUS
- Publication number 20110012030
- Publication date Jan 20, 2011
- Michael Lawrence Bufano
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
ELECTRON BEAM STERILIZATION APPARATUS
- Publication number 20110012032
- Publication date Jan 20, 2011
- Michael Lawrence Bufano
- B67 - OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS LIQUID...
Information Patent Application
Emitter Exit Window
- Publication number 20110012495
- Publication date Jan 20, 2011
- Advanced Electron Beams, Inc.
- Steven R. Walther
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
CONDENSIBLE GAS COOLING SYSTEM
- Publication number 20100155026
- Publication date Jun 24, 2010
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF
- Publication number 20100041176
- Publication date Feb 18, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Paul SULLIVAN
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
ELECTRON BEAM EMITTER WITH SLOTTED GUN
- Publication number 20090289204
- Publication date Nov 26, 2009
- Advanced Electron Beams,Inc.
- Steven Raymond Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF
- Publication number 20090227062
- Publication date Sep 10, 2009
- Paul Sullivan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
CLEAVE INITIATION USING VARYING ION IMPLANT DOSE
- Publication number 20090209084
- Publication date Aug 20, 2009
- Peter Nunan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANO-CLEAVE A THIN-FILM OF SILICON FOR SOLAR CELL FABRICATION
- Publication number 20090181492
- Publication date Jul 16, 2009
- Peter Nunan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PREDICTING DOSE REPEATABILITY IN AN ION IMPLANTATION
- Publication number 20090162953
- Publication date Jun 25, 2009
- Morgan Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL PRESSURE SENSING IN A PLASMA PROCESSING SYSTEM
- Publication number 20090101848
- Publication date Apr 23, 2009
- VARIAN SEMICONDUCTOR EQUPMENT ASSOCIATES, INC.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping System With Charge Control
- Publication number 20090104761
- Publication date Apr 23, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Yongbae Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL FOR ION BEAM ASSISTED ETCHING
- Publication number 20090084757
- Publication date Apr 2, 2009
- Yuri Erokhin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OUTGASSING RATE DETECTION
- Publication number 20090078871
- Publication date Mar 26, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BONDING ACTIVATED BY ION IMPLANTATION
- Publication number 20090081848
- Publication date Mar 26, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Yuri EROKHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conformal Doping Using High Neutral Density Plasma Implant
- Publication number 20090008577
- Publication date Jan 8, 2009
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR DETECTING WAFER CHARGING IN A PLASMA PROCESSING SYSTEM
- Publication number 20080314731
- Publication date Dec 25, 2008
- Varian Semiconductor Equipment Associates Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU SURFACE CONTAMINATION REMOVAL FOR ION IMPLANTING
- Publication number 20080185537
- Publication date Aug 7, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Steve Walther
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA...
- Publication number 20080160212
- Publication date Jul 3, 2008
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping With Electronically Controllable Implant Angle
- Publication number 20080132046
- Publication date Jun 5, 2008
- VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
- Steven Raymond Walther
- H01 - BASIC ELECTRIC ELEMENTS

Steven Raymond Walther

Person

Patents Grantslast 30 patents

Process control for atmospheric plasma treatment of surfaces

Apparatus and method for plasma ignition with a self-resonating device

Apparatus and method for plasma ignition with a self-resonating device

Electron beam exit window in electron beam emitter and method for f...

Electron beam sterilization apparatus

Patterned assembly for manufacturing a solar cell and a method thereof

Methods and apparatuses for reducing heat on an emitter exit window

Electron beam emitter with slotted gun

Technique for low-temperature ion implantation

Electron beam sterilization apparatus

Patterned assembly for manufacturing a solar cell and a method thereof

Techniques for temperature controlled ion implantation

Wafer bonding activated by ion implantation

Technique for low-temperature ion implantation

Patterned assembly for manufacturing a solar cell and a method thereof

Predicting dose repeatability in an ion implantation

Cleave initiation using varying ion implant dose

Techniques for detecting wafer charging in a plasma processing system

Local pressure sensing in a plasma processing system

Outgassing rate detection

Non-uniform ion implantation

In situ surface contamination removal for ion implanting

Ion implant beam angle integrity monitoring and adjusting

Methods for stable and repeatable ion implantation

Plasma implantation of deuterium for passivation of semiconductor-d...

Ion beam current monitoring

Plasma ion implantation systems and methods using solid source of d...

Method and apparatus for controlling ion implantation during vacuum...

Faraday dose and uniformity monitor for plasma based ion implantation

Methods and apparatus for plasma doping and ion implantation in an...

Patents Applicationslast 30 patents

PROCESS CONTROL FOR ATMOSPHERIC PLASMA TREATMENT OF SURFACES

Method for Ion Implantation

Apparatus and Method for Plasma Ignition with a Self-Resonating Device

Apparatus and Method for Metastable Enhanced Plasma Ignition

Apparatus and Method for Plasma Ignition with a Self-Resonating Device

CONTOURED SUPPORT GRID FOR HERMETICALLY SEALED THIN FILM APPLICATIONS

ELECTRON BEAM STERILIZATION APPARATUS

EMITTER EXIT WINDOW

PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF

TECHNIQUE FOR LOW-TEMPERATURE ION IMPLANTATION

EBEAM STERILIZATION APPARATUS

ELECTRON BEAM STERILIZATION APPARATUS

Emitter Exit Window

CONDENSIBLE GAS COOLING SYSTEM

PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF

ELECTRON BEAM EMITTER WITH SLOTTED GUN

PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF

CLEAVE INITIATION USING VARYING ION IMPLANT DOSE

NANO-CLEAVE A THIN-FILM OF SILICON FOR SOLAR CELL FABRICATION

PREDICTING DOSE REPEATABILITY IN AN ION IMPLANTATION

LOCAL PRESSURE SENSING IN A PLASMA PROCESSING SYSTEM

Plasma Doping System With Charge Control

UNIFORMITY CONTROL FOR ION BEAM ASSISTED ETCHING

OUTGASSING RATE DETECTION

WAFER BONDING ACTIVATED BY ION IMPLANTATION

Conformal Doping Using High Neutral Density Plasma Implant

TECHNIQUES FOR DETECTING WAFER CHARGING IN A PLASMA PROCESSING SYSTEM

IN SITU SURFACE CONTAMINATION REMOVAL FOR ION IMPLANTING

METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA...

Plasma Doping With Electronically Controllable Implant Angle