Stijn Willem Herman Karel STEENBRINK

Person

Den Haag, NL

People

Patents Grantslast 30 patents

Information Patent Grant
System, method and apparatus for multi-beam lithography including a...
- Patent number 8,263,942
- Issue date Sep 11, 2012
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System, method and apparatus for multi-beam lithography including a...
- Patent number 8,247,958
- Issue date Aug 21, 2012
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electrostatic lens structure
- Patent number 8,198,602
- Issue date Jun 12, 2012
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multiple beam charged particle optical system
- Patent number 8,188,450
- Issue date May 29, 2012
- Mapper Lithography IP B.V.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple beam charged particle optical system
- Patent number 8,134,135
- Issue date Mar 13, 2012
- Mapper Lithography IP B.V.
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle optical system comprising an electrostatic deflector
- Patent number 8,110,813
- Issue date Feb 7, 2012
- Mapper Lithography IP B.V.
- Norman Hendrikus Rudolf Baars
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection lens arrangement
- Patent number 8,089,056
- Issue date Jan 3, 2012
- Mapper Lithography IP B.V.
- Marco Jan Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System, method and apparatus for multi-beam lithography including a...
- Patent number 7,710,009
- Issue date May 4, 2010
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and apparatus for multi-beam lithography including a...
- Patent number 7,215,070
- Issue date May 8, 2007
- Mapper Lithography IP B.V.
- Stijn Willem Herman Karel Steenbrink
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER
- Publication number 20120293780
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Laura DINU-GÜRTLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM MODULATOR
- Publication number 20120292491
- Publication date Nov 22, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
MODULATION DEVICE AND CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SY...
- Publication number 20120273658
- Publication date Nov 1, 2012
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE
- Publication number 20120273691
- Publication date Nov 1, 2012
- Alrik van den Brom
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
- Publication number 20120211677
- Publication date Aug 23, 2012
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE METHOD
- Publication number 20110261344
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
Charged particle multi-beamlet lithography system with modulation d...
- Publication number 20110260040
- Publication date Oct 27, 2011
- MAPPER LITHOGRAPHY IP BV
- Marco Jan-Jaco Wieland
- B82 - NANO-TECHNOLOGY
Information Patent Application
CAPACITIVE SENSING SYSTEM WITH DIFFERENTIAL PAIRS
- Publication number 20110254565
- Publication date Oct 20, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido De Boer
- G01 - MEASURING TESTING
Information Patent Application
CAPACITIVE SENSING SYSTEM
- Publication number 20110193574
- Publication date Aug 11, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
INTEGRATED SENSOR SYSTEM
- Publication number 20110193573
- Publication date Aug 11, 2011
- MAPPER LITHOGRAPHY IP BV
- Guido DE BOER
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A...
- Publication number 20110180721
- Publication date Jul 28, 2011
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
- Publication number 20110168910
- Publication date Jul 14, 2011
- Pieter Kruit
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle optical system comprising an electrostatic deflector
- Publication number 20100276606
- Publication date Nov 4, 2010
- MAPPER LITHOGRAPHY IP BV
- Norman Hendrikus Rudolf BAARS
- B82 - NANO-TECHNOLOGY
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A...
- Publication number 20100219357
- Publication date Sep 2, 2010
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20090261267
- Publication date Oct 22, 2009
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION LENS ARRANGEMENT
- Publication number 20090212229
- Publication date Aug 27, 2009
- MAPPER LITHOGRAPHY IP BV
- Marco Jan Jaco WIELAND
- B82 - NANO-TECHNOLOGY
Information Patent Application
System, method and apparatus for multi-beam lithography including a...
- Publication number 20070182303
- Publication date Aug 9, 2007
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY
Information Patent Application
Dispenser cathode
- Publication number 20060028114
- Publication date Feb 9, 2006
- Stijn Willem Herman Karel Steenbrink
- B82 - NANO-TECHNOLOGY

Stijn Willem Herman Karel STEENBRINK

Person

Patents Grantslast 30 patents

System, method and apparatus for multi-beam lithography including a...

System, method and apparatus for multi-beam lithography including a...

Electrostatic lens structure

Multiple beam charged particle optical system

Multiple beam charged particle optical system

Charged particle optical system comprising an electrostatic deflector

Projection lens arrangement

System, method and apparatus for multi-beam lithography including a...

System, method and apparatus for multi-beam lithography including a...

Patents Applicationslast 30 patents

CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER

CHARGED PARTICLE BEAM MODULATOR

MODULATION DEVICE AND CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SY...

CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE

MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM

EXPOSURE METHOD

Charged particle multi-beamlet lithography system with modulation d...

CAPACITIVE SENSING SYSTEM WITH DIFFERENTIAL PAIRS

CAPACITIVE SENSING SYSTEM

INTEGRATED SENSOR SYSTEM

SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A...

MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM

Charged particle optical system comprising an electrostatic deflector

SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A...

PROJECTION LENS ARRANGEMENT

PROJECTION LENS ARRANGEMENT

System, method and apparatus for multi-beam lithography including a...

Dispenser cathode