Stilian Ivanov Pandev

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,880,142
- Issue date Jan 23, 2024
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,796,390
- Issue date Oct 24, 2023
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 11,784,097
- Issue date Oct 10, 2023
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Tomography based semiconductor measurements using simplified models
- Patent number 11,610,297
- Issue date Mar 21, 2023
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Self-calibrated overlay metrology using a skew training sample
- Patent number 11,604,063
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Self-calibrating overlay metrology
- Patent number 11,604,420
- Issue date Mar 14, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for determining quality of semiconductor measur...
- Patent number 11,530,913
- Issue date Dec 20, 2022
- KLA Corporation
- Dzmitry Sanko
- G01 - MEASURING TESTING
Information Patent Grant
Measurement recipe optimization based on probabilistic domain knowl...
- Patent number 11,520,321
- Issue date Dec 6, 2022
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Signal-domain adaptation for metrology
- Patent number 11,415,898
- Issue date Aug 16, 2022
- KLA Corporation
- Stilian Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bandgap measurements of patterned film stacks using spectroscopic m...
- Patent number 11,378,451
- Issue date Jul 5, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Grant
Process control metrology
- Patent number 11,313,809
- Issue date Apr 26, 2022
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Model-based metrology using images
- Patent number 11,200,658
- Issue date Dec 14, 2021
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement of overlay error using device inspection system
- Patent number 10,943,838
- Issue date Mar 9, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Differential methods and apparatus for metrology of semiconductor t...
- Patent number 10,935,893
- Issue date Mar 2, 2021
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor metrology based on hyperspectral imaging
- Patent number 10,801,953
- Issue date Oct 13, 2020
- KLA-Tencor Corporation
- David Y. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated use of model-based metrology and a process model
- Patent number 10,769,320
- Issue date Sep 8, 2020
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process robust overlay metrology based on optical scatterometry
- Patent number 10,732,516
- Issue date Aug 4, 2020
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 10,612,916
- Issue date Apr 7, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor metrology and defect classification using electron mi...
- Patent number 10,580,673
- Issue date Mar 3, 2020
- KLA Corporation
- Stilian Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model-based single parameter measurement
- Patent number 10,502,549
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for patterned wafer characterization
- Patent number 10,502,694
- Issue date Dec 10, 2019
- KLA-Tencor Corporation
- Thaddeus Gerard Dziura
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods for process control
- Patent number 10,490,462
- Issue date Nov 26, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic removal of correlation of highly correlated parameters for...
- Patent number 10,386,729
- Issue date Aug 20, 2019
- KLA-Tencor Corporation
- Lie-Quan Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Model-based metrology using images
- Patent number 10,380,728
- Issue date Aug 13, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-location metrology
- Patent number 10,365,225
- Issue date Jul 30, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Signal response metrology for scatterometry based overlay measurements
- Patent number 10,352,876
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement recipe optimization based on spectral sensitivity and p...
- Patent number 10,354,929
- Issue date Jul 16, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Model based measurement systems with improved electromagnetic solve...
- Patent number 10,345,095
- Issue date Jul 9, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System, method and computer program product for calibration of metr...
- Patent number 10,295,342
- Issue date May 21, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Grant
Model optimization approach based on spectral sensitivity
- Patent number 10,255,385
- Issue date Apr 9, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR IMPROVING MEASUREMENT PERFORMANCE OF CHARACTE...
- Publication number 20240378483
- Publication date Nov 14, 2024
- KLA Corporation
- Stilian Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Full Wafer Measurement Based On A Trained Full Wafer Measurement Model
- Publication number 20240353759
- Publication date Oct 24, 2024
- KLA Corporation
- Stilian Ivanov Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR ESTIMATING MEASUREMENT UNCERTAINTY FOR CHARAC...
- Publication number 20240201637
- Publication date Jun 20, 2024
- KLA Corporation
- Stilian Pandev
- G05 - CONTROLLING REGULATING
Information Patent Application
Overlay Estimation Based on Optical Inspection and Machine Learning
- Publication number 20240142883
- Publication date May 2, 2024
- KLA Corporation
- Nireekshan K. Reddy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CORRECTING TARGET LOCATIONS FOR TEMPERATURE IN SEMICONDUCTOR APPLIC...
- Publication number 20240120221
- Publication date Apr 11, 2024
- KLA Corporation
- Min-Yeong Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Measurements With Robust In-Line Tool Matching
- Publication number 20230258585
- Publication date Aug 17, 2023
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ESTIMATING IN-DIE OVERLAY WITH TOOL INDUCED SHIFT CORRECTION
- Publication number 20230258446
- Publication date Aug 17, 2023
- KLA Corporation
- Min-Yeong MOON
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20230221656
- Publication date Jul 13, 2023
- KLA Corporation
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods And Systems For Data Driven Parameterization And Measuremen...
- Publication number 20230169255
- Publication date Jun 1, 2023
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Profile Measurement Based On A Scanning Conditional M...
- Publication number 20230092729
- Publication date Mar 23, 2023
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE
- Publication number 20220412734
- Publication date Dec 29, 2022
- Stilian Pandev
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Measurement Of Tilt And Overlay Of A Structure
- Publication number 20220404143
- Publication date Dec 22, 2022
- KLA Corporation
- Stilian Ivanov Pandev
- G01 - MEASURING TESTING
Information Patent Application
SELF-CALIBRATING OVERLAY METROLOGY
- Publication number 20220357673
- Publication date Nov 10, 2022
- Stilian Pandev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High Resolution Profile Measurement Based On A Trained Parameter Co...
- Publication number 20220352041
- Publication date Nov 3, 2022
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20220349752
- Publication date Nov 3, 2022
- KLA Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
IMAGING REFLECTOMETRY FOR INLINE SCREENING
- Publication number 20220307990
- Publication date Sep 29, 2022
- John Charles Robinson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dynamic Control Of Machine Learning Based Measurement Recipe Optimi...
- Publication number 20220114438
- Publication date Apr 14, 2022
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Methods And Systems For Determining Quality Of Semiconductor Measur...
- Publication number 20220090912
- Publication date Mar 24, 2022
- KLA Corporation
- Dzmitry Sanko
- G01 - MEASURING TESTING
Information Patent Application
Measurement Recipe Optimization Based On Probabilistic Domain Knowl...
- Publication number 20210165398
- Publication date Jun 3, 2021
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Tomography Based Semiconductor Measurements Using Simplified Models
- Publication number 20210166375
- Publication date Jun 3, 2021
- KLA Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20210159128
- Publication date May 27, 2021
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Signal-Domain Adaptation for Metrology
- Publication number 20210109453
- Publication date Apr 15, 2021
- KLA Corporation
- Stilian Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Metrology Based On Hyperspectral Imaging
- Publication number 20200225151
- Publication date Jul 16, 2020
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR FAST AUTOMATIC DETE...
- Publication number 20200025554
- Publication date Jan 23, 2020
- KLA-Tencor Corporation
- Antonio A. Gellineau
- G01 - MEASURING TESTING
Information Patent Application
Model-Based Metrology Using Images
- Publication number 20190325571
- Publication date Oct 24, 2019
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Measurement of Overlay Error Using Device Inspection System
- Publication number 20190252270
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Choon Hoong Hoo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Semiconductor Metrology and Defect Classification Using Electron Mi...
- Publication number 20190214285
- Publication date Jul 11, 2019
- KLA-Tencor Corporation
- Stilian Pandev
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...
- Publication number 20190041266
- Publication date Feb 7, 2019
- KLA-Tencor Corporation
- Tianhan Wang
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Spectroscopic Beam Profile Metrology
- Publication number 20180347961
- Publication date Dec 6, 2018
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Application
Process Robust Overlay Metrology Based On Optical Scatterometry
- Publication number 20180252514
- Publication date Sep 6, 2018
- KLA-Tencor Corporation
- Stilian Ivanov Pandev
- G06 - COMPUTING CALCULATING COUNTING

Stilian Ivanov Pandev

Person

Patents Grantslast 30 patents

Self-calibrating overlay metrology

Bandgap measurements of patterned film stacks using spectroscopic m...

Measurement of overlay error using device inspection system

Tomography based semiconductor measurements using simplified models

Self-calibrated overlay metrology using a skew training sample

Self-calibrating overlay metrology

Methods and systems for determining quality of semiconductor measur...

Measurement recipe optimization based on probabilistic domain knowl...

Signal-domain adaptation for metrology

Bandgap measurements of patterned film stacks using spectroscopic m...

Process control metrology

Model-based metrology using images

Measurement of overlay error using device inspection system

Differential methods and apparatus for metrology of semiconductor t...

Semiconductor metrology based on hyperspectral imaging

Integrated use of model-based metrology and a process model

Process robust overlay metrology based on optical scatterometry

Measurement of multiple patterning parameters

Semiconductor metrology and defect classification using electron mi...

Model-based single parameter measurement

Methods and apparatus for patterned wafer characterization

Metrology systems and methods for process control

Dynamic removal of correlation of highly correlated parameters for...

Model-based metrology using images

Multi-location metrology

Signal response metrology for scatterometry based overlay measurements

Measurement recipe optimization based on spectral sensitivity and p...

Model based measurement systems with improved electromagnetic solve...

System, method and computer program product for calibration of metr...

Model optimization approach based on spectral sensitivity

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR IMPROVING MEASUREMENT PERFORMANCE OF CHARACTE...

Full Wafer Measurement Based On A Trained Full Wafer Measurement Model

SYSTEM AND METHOD FOR ESTIMATING MEASUREMENT UNCERTAINTY FOR CHARAC...

Overlay Estimation Based on Optical Inspection and Machine Learning

CORRECTING TARGET LOCATIONS FOR TEMPERATURE IN SEMICONDUCTOR APPLIC...

Semiconductor Measurements With Robust In-Line Tool Matching

ESTIMATING IN-DIE OVERLAY WITH TOOL INDUCED SHIFT CORRECTION

SELF-CALIBRATING OVERLAY METROLOGY

Methods And Systems For Data Driven Parameterization And Measuremen...

Semiconductor Profile Measurement Based On A Scanning Conditional M...

SELF-CALIBRATED OVERLAY METROLOGY USING A SKEW TRAINING SAMPLE

Methods And Systems For Measurement Of Tilt And Overlay Of A Structure

SELF-CALIBRATING OVERLAY METROLOGY

High Resolution Profile Measurement Based On A Trained Parameter Co...

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

IMAGING REFLECTOMETRY FOR INLINE SCREENING

Dynamic Control Of Machine Learning Based Measurement Recipe Optimi...

Methods And Systems For Determining Quality Of Semiconductor Measur...

Measurement Recipe Optimization Based On Probabilistic Domain Knowl...

Tomography Based Semiconductor Measurements Using Simplified Models

Measurement of Overlay Error Using Device Inspection System

Signal-Domain Adaptation for Metrology

Semiconductor Metrology Based On Hyperspectral Imaging

SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR FAST AUTOMATIC DETE...

Model-Based Metrology Using Images

Measurement of Overlay Error Using Device Inspection System

Semiconductor Metrology and Defect Classification Using Electron Mi...

Bandgap Measurements of Patterned Film Stacks Using Spectroscopic M...

Methods And Systems For Spectroscopic Beam Profile Metrology

Process Robust Overlay Metrology Based On Optical Scatterometry