Stuart Crane

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Kalispell, MT, US

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Patents Grantslast 30 patents

Information Patent Grant
Methods of reducing or eliminating deposits after electrochemical p...
- Patent number 11,697,888
- Issue date Jul 11, 2023
- Applied Materials, Inc.
- Eric J Bergman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Methods of reducing or eliminating deposits after electrochemical p...
- Patent number 11,371,159
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Eric J Bergman
- B08 - CLEANING
Information Patent Grant
Drying high aspect ratio features
- Patent number 10,971,354
- Issue date Apr 6, 2021
- Applied Materials, Inc.
- Eric J. Bergman
- B08 - CLEANING
Information Patent Grant
Drying high aspect ratio features
- Patent number 10,546,762
- Issue date Jan 28, 2020
- Applied Materials, Inc.
- Eric J. Bergman
- B08 - CLEANING
Information Patent Grant
Removing photoresist from a wafer
- Patent number 10,191,379
- Issue date Jan 29, 2019
- Applied Materials, Inc.
- Paul R. McHugh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF REDUCING OR ELIMINATING DEPOSITS AFTER ELECTROCHEMICAL P...
- Publication number 20220282394
- Publication date Sep 8, 2022
- Applied Materials, Inc.
- Eric J. Bergman
- B08 - CLEANING
Information Patent Application
METHODS OF REDUCING OR ELIMINATING DEPOSITS AFTER ELECTROCHEMICAL P...
- Publication number 20200399779
- Publication date Dec 24, 2020
- Applied Materials, Inc.
- Eric J. Bergman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
DRYING HIGH ASPECT RATIO FEATURES
- Publication number 20180144954
- Publication date May 24, 2018
- Applied Materials, Inc.
- Eric J. Bergman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRYING HIGH ASPECT RATIO FEATURES
- Publication number 20180019119
- Publication date Jan 18, 2018
- Applied Materials Inc,
- Eric J. Bergman
- B08 - CLEANING
Information Patent Application
REMOVING PHOTORESIST FROM A WAFER
- Publication number 20170357158
- Publication date Dec 14, 2017
- Applied Materials, Inc.
- Paul R. McHugh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE WAFER ROTARY PROCESSING
- Publication number 20170263472
- Publication date Sep 14, 2017
- Applied Materials, Inc.
- John L. Klocke
- B08 - CLEANING