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Subbareddy Kanagasabapathy
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Shrewsbury, MA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Photoresists containing Si-polymers
Patent number
7,390,608
Issue date
Jun 24, 2008
Rohm and Haas Electronic Materials LLC
George G. Barclay
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Processes for producing silane monomers and polymers and photoresis...
Patent number
7,217,490
Issue date
May 15, 2007
Shipley Company, L.L.C.
George G. Barclay
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresists containing sulfonamide component
Patent number
7,189,490
Issue date
Mar 13, 2007
Shipley Company, L.L.C.
Subbareddy Kanagasabapathy
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Processes for producing polysiloxanes and photoresist compositions...
Patent number
7,008,750
Issue date
Mar 7, 2006
Shipley Company, L.L.C.
George G. Barclay
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoimageable composition
Patent number
6,803,171
Issue date
Oct 12, 2004
Shipley Company LLC
Dana A. Gronbeck
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Patents Applications
last 30 patents
Information
Patent Application
Polymers and photoresists comprising same
Publication number
20050196699
Publication date
Sep 8, 2005
Rohm and Haas Electronic Materials L.L.C.
Subbareddy Kanagasabapathy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Photoimageable composition
Publication number
20050026077
Publication date
Feb 3, 2005
Shipley Company, L.L.C.
Dana A. Gronbeck
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Fluorinated Si-polymers and photoresists comprising same
Publication number
20040229159
Publication date
Nov 18, 2004
Subbareddy Kanagasabapathy
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Fluorinated Si-polymers and photoresists comprising same
Publication number
20040224255
Publication date
Nov 11, 2004
Subbareddy Kanagasabapathy
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Photoresists containing Si-polymers
Publication number
20040209187
Publication date
Oct 21, 2004
Shipley Company, L.L.C.
George G. Barclay
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresists containing sulfonamide component
Publication number
20040161698
Publication date
Aug 19, 2004
Shipley Company L.L.C.
Subbareddy Kanagasabapathy
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Processes for producing silane monomers and polymers and photoresis...
Publication number
20030219676
Publication date
Nov 27, 2003
Shipley Company, L.L.C.
George G. Barclay
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...