Subhash Deshmukh

Person

Livemore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
LED based optical source coupled with plasma source
- Patent number 9,721,802
- Issue date Aug 1, 2017
- Applied Materials, Inc.
- Subhash Deshmukh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for etching metal using a combination of plasma and solid s...
- Patent number 9,576,810
- Issue date Feb 21, 2017
- Applied Materials, Inc.
- Subhash Deshmukh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Resist hardening and development processes for semiconductor device...
- Patent number 9,411,237
- Issue date Aug 9, 2016
- Applied Materials, Inc.
- Peng Xie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interface treatment of semiconductor surfaces with high density low...
- Patent number 9,378,941
- Issue date Jun 28, 2016
- Applied Materials, Inc.
- Aneesh Nainani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for etching high aspect ratio features
- Patent number 8,475,625
- Issue date Jul 2, 2013
- Applied Materials, Inc.
- Sharma Pamarthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process uniformity across a wafer by controlling a variable...
- Patent number 8,080,479
- Issue date Dec 20, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process uniformity across a wafer by controlling RF phase be...
- Patent number 8,076,247
- Issue date Dec 13, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing a workpiece in a plasma reactor with variable...
- Patent number 7,968,469
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process uniformity across a wafer by apportioning ground ret...
- Patent number 7,884,025
- Issue date Feb 8, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Improving plasma process uniformity across a wafer by apportioning...
- Patent number 7,879,731
- Issue date Feb 1, 2011
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing etch profile bending and bowing in high aspect...
- Patent number 7,846,846
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
UV-ASSISTED REACTIVE ION ETCH FOR COPPER
- Publication number 20170011887
- Publication date Jan 12, 2017
- Applied Materials, Inc.
- Subhash Deshmukh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST HARDENING AND DEVELOPMENT PROCESSES FOR SEMICONDUCTOR DEVICE...
- Publication number 20160329222
- Publication date Nov 10, 2016
- Applied Materials, Inc.
- Peng Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LED BASED OPTICAL SOURCE COUPLED WITH PLASMA SOURCE
- Publication number 20150096683
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Subhash Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR ETCHING METAL USING A COMBINATION OF PLASMA AND SOLID S...
- Publication number 20150099369
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- Subhash Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERFACE TREATMENT OF SEMICONDUCTOR SURFACES WITH HIGH DENSITY LOW...
- Publication number 20150093862
- Publication date Apr 2, 2015
- APPLIED MATEIRALS, INC.
- Aneesh Nainani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST HARDENING AND DEVELOPMENT PROCESSES FOR SEMICONDUCTOR DEVICE...
- Publication number 20140263172
- Publication date Sep 18, 2014
- Peng Xie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PULSED DC PLASMA ETCHING PROCESS AND APPARATUS
- Publication number 20140273487
- Publication date Sep 18, 2014
- Subhash Deshmukh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV-ASSISTED REACTIVE ION ETCH FOR COPPER
- Publication number 20140262755
- Publication date Sep 18, 2014
- Subhash Deshmukh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING HIGH ASPECT RATIO FEATURES ON A SUBSTRATE
- Publication number 20100330805
- Publication date Dec 30, 2010
- KENNY LINH DOAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING LOW K DIELECTRIC DUAL DAMASCENE STRUCTURES
- Publication number 20090156012
- Publication date Jun 18, 2009
- Applied Materials, Inc.
- CHANG-LIN HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PREVENTING ETCH PROFILE BENDING AND BOWING IN HIGH ASPECT...
- Publication number 20090081876
- Publication date Mar 26, 2009
- Applied Materials, Inc.
- Kallol BERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...
- Publication number 20080182417
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...
- Publication number 20080182418
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING RF PHASE BE...
- Publication number 20080180028
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH VARIABLE...
- Publication number 20080179181
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING POWER AMON...
- Publication number 20080182416
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYIN...
- Publication number 20080178803
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH WIDE PROCESS WINDOW EMPLOYING PLURAL VHF SOURCES
- Publication number 20080179011
- Publication date Jul 31, 2008
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR ETCHING HIGH ASPECT RATIO FEATURES
- Publication number 20070256785
- Publication date Nov 8, 2007
- Sharma Pamarthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for monitoring a process in a plasma processi...
- Publication number 20060065632
- Publication date Mar 30, 2006
- Chia-Cheng Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for monitoring a process in a plasma processi...
- Publication number 20060065623
- Publication date Mar 30, 2006
- Timothy J. Guiney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for monitoring a process in a plasma processi...
- Publication number 20060065631
- Publication date Mar 30, 2006
- Chia-Cheng Cheng
- H01 - BASIC ELECTRIC ELEMENTS

Subhash Deshmukh

Person

Patents Grantslast 30 patents

LED based optical source coupled with plasma source

Process for etching metal using a combination of plasma and solid s...

Resist hardening and development processes for semiconductor device...

Interface treatment of semiconductor surfaces with high density low...

Apparatus for etching high aspect ratio features

Plasma process uniformity across a wafer by controlling a variable...

Plasma process uniformity across a wafer by controlling RF phase be...

Method of processing a workpiece in a plasma reactor with variable...

Plasma process uniformity across a wafer by apportioning ground ret...

Improving plasma process uniformity across a wafer by apportioning...

Method of preventing etch profile bending and bowing in high aspect...

Patents Applicationslast 30 patents

UV-ASSISTED REACTIVE ION ETCH FOR COPPER

RESIST HARDENING AND DEVELOPMENT PROCESSES FOR SEMICONDUCTOR DEVICE...

LED BASED OPTICAL SOURCE COUPLED WITH PLASMA SOURCE

PROCESS FOR ETCHING METAL USING A COMBINATION OF PLASMA AND SOLID S...

INTERFACE TREATMENT OF SEMICONDUCTOR SURFACES WITH HIGH DENSITY LOW...

RESIST HARDENING AND DEVELOPMENT PROCESSES FOR SEMICONDUCTOR DEVICE...

PULSED DC PLASMA ETCHING PROCESS AND APPARATUS

UV-ASSISTED REACTIVE ION ETCH FOR COPPER

METHODS FOR FORMING HIGH ASPECT RATIO FEATURES ON A SUBSTRATE

METHOD FOR FABRICATING LOW K DIELECTRIC DUAL DAMASCENE STRUCTURES

METHOD OF PREVENTING ETCH PROFILE BENDING AND BOWING IN HIGH ASPECT...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RET...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING RF PHASE BE...

METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR WITH VARIABLE...

PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING POWER AMON...

PLASMA REACTOR WITH ION DISTRIBUTION UNIFORMITY CONTROLLER EMPLOYIN...

PLASMA REACTOR WITH WIDE PROCESS WINDOW EMPLOYING PLURAL VHF SOURCES

APPARATUS FOR ETCHING HIGH ASPECT RATIO FEATURES

Methods and apparatus for monitoring a process in a plasma processi...

Methods and apparatus for monitoring a process in a plasma processi...

Methods and apparatus for monitoring a process in a plasma processi...