Membership
Tour
Register
Log in
Subramanyam A. Iyer
Follow
Person
Santa Clara, CA, US
People
Overview
Industries
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Supercritical carbon dioxide to reduce line edge roughness
Patent number
7,049,053
Issue date
May 23, 2006
Intel Corporation
Vijayakumar Ramachandrarao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Controlled use of photochemically susceptible chemistries for etchi...
Patent number
7,018,938
Issue date
Mar 28, 2006
Intel Corporation
Subramanyam A. Iyer
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Controlled use of photochemically susceptible chemistries for etchi...
Publication number
20060108067
Publication date
May 25, 2006
Subramanyam A. Iyer
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for removing a residue from a substrate using supercritical...
Publication number
20060102204
Publication date
May 18, 2006
TOKYO ELECTRON LIMITED
Gunilla Jacobson
B08 - CLEANING
Information
Patent Application
Supercritical carbon dioxide to reduce line edge roughness
Publication number
20040253550
Publication date
Dec 16, 2004
Vijayakumar Ramachandrarao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Etching and cleaning of semiconductors using supercritical carbon d...
Publication number
20040134885
Publication date
Jul 15, 2004
Subramanyam A. Iyer
B08 - CLEANING
Information
Patent Application
Controlled use of photochemically susceptible chemistries for etchi...
Publication number
20040097076
Publication date
May 20, 2004
Subramanyam A. Iyer
H01 - BASIC ELECTRIC ELEMENTS