Sudeep PALLIKKARA KUTTIATOOR

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Self-stopping polishing composition and method for high topological...
- Patent number 12,116,502
- Issue date Oct 15, 2024
- CMC MATERIALS LLC
- Juyeon Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP compositions selective for oxide and nitride with improved dish...
- Patent number 10,640,679
- Issue date May 5, 2020
- Cabot Microelectronics Corporation
- Sudeep Pallikkara Kuttiatoor
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical-mechanical planarization of polymer films
- Patent number 9,434,859
- Issue date Sep 6, 2016
- Cabot Microelectronics Corporation
- Sudeep Pallikkara Kuttiatoor
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP compositions exhibiting reduced dishing in STI wafer polishing
- Patent number 9,422,455
- Issue date Aug 23, 2016
- Cabot Microelectronics Corporation
- Sudeep Pallikkara Kuttiatoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL...
- Publication number 20220195244
- Publication date Jun 23, 2022
- CMC Materials, Inc.
- Juyeon CHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR DIELECTRIC CMP
- Publication number 20210115298
- Publication date Apr 22, 2021
- Cabot Microelectronics Corporation, nka CMC Materials, Inc.
- Sarah BROSNAN
- C01 - INORGANIC CHEMISTRY
Information Patent Application
COMPOSITION AND METHOD FOR SILICON OXIDE AND CARBON DOPED SILICON O...
- Publication number 20210115300
- Publication date Apr 22, 2021
- CMC Materials, Inc.
- Steven KRAFT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION AND METHOD FOR DIELECTRIC CMP
- Publication number 20210115299
- Publication date Apr 22, 2021
- CMC Materials, Inc.
- Sarah BROSNAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH IMPROVED DISH...
- Publication number 20180105721
- Publication date Apr 19, 2018
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF POLISHING A LOW-K SUBSTRATE
- Publication number 20170194160
- Publication date Jul 6, 2017
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS EXHIBITING REDUCED DISHING IN STI WAFER POLISHING
- Publication number 20160168421
- Publication date Jun 16, 2016
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL PLANARIZATION OF POLYMER FILMS
- Publication number 20150083689
- Publication date Mar 26, 2015
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Sudeep PALLIKKARA KUTTIATOOR

Person

Patents Grantslast 30 patents

Self-stopping polishing composition and method for high topological...

CMP compositions selective for oxide and nitride with improved dish...

Chemical-mechanical planarization of polymer films

CMP compositions exhibiting reduced dishing in STI wafer polishing

Patents Applicationslast 30 patents

SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL...

COMPOSITION AND METHOD FOR DIELECTRIC CMP

COMPOSITION AND METHOD FOR SILICON OXIDE AND CARBON DOPED SILICON O...

COMPOSITION AND METHOD FOR DIELECTRIC CMP

CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH IMPROVED DISH...

METHOD OF POLISHING A LOW-K SUBSTRATE

CMP COMPOSITIONS EXHIBITING REDUCED DISHING IN STI WAFER POLISHING

CHEMICAL-MECHANICAL PLANARIZATION OF POLYMER FILMS