Sudipto NASKAR

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Gate-to-gate isolation for stacked transistor architecture via sele...
- Patent number 12,369,399
- Issue date Jul 22, 2025
- Intel Corporation
- Willy Rachmady
Information Patent Grant
Capacitor architectures in semiconductor devices
- Patent number 12,342,551
- Issue date Jun 24, 2025
- Intel Corporation
- Sudipto Naskar
Information Patent Grant
Cap structure for interconnect dielectrics and methods of fabrication
- Patent number 12,249,577
- Issue date Mar 11, 2025
- Intel Corporation
- Shashi Vyas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Localized spacer for nanowire transistors and methods of fabrication
- Patent number 12,176,408
- Issue date Dec 24, 2024
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gap fill dielectrics for electrical isolation of transistor structu...
- Patent number 12,087,614
- Issue date Sep 10, 2024
- Intel Corporation
- Michael Makowski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor architectures in semiconductor devices
- Patent number 11,901,404
- Issue date Feb 13, 2024
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate-all-around integrated circuit structures fabricated using alte...
- Patent number 11,894,368
- Issue date Feb 6, 2024
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grating replication using helmets and topographically-selective dep...
- Patent number 11,894,270
- Issue date Feb 6, 2024
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor architectures in semiconductor devices
- Patent number 11,791,375
- Issue date Oct 17, 2023
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grating replication using helmets and topographically-selective dep...
- Patent number 11,335,598
- Issue date May 17, 2022
- Intel Corporation
- Kevin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor architectures in semiconductor devices
- Patent number 11,264,449
- Issue date Mar 1, 2022
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Passivating silicide-based approaches for conductive via fabricatio...
- Patent number 11,239,112
- Issue date Feb 1, 2022
- Intel Corporation
- Manish Chandhok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pitch quartered three-dimensional air gaps
- Patent number 11,152,254
- Issue date Oct 19, 2021
- Intel Corporation
- Manish Chandhok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen assisted oxide gapfill
- Patent number 10,643,946
- Issue date May 5, 2020
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned via below subtractively patterned interconnect
- Patent number 10,546,772
- Issue date Jan 28, 2020
- Intel Corporation
- Manish Chandhok
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF CONTROLLING METAL GATE HEIGHT AND SELECTIVE SPACER FORMATION
- Publication number 20250220944
- Publication date Jul 3, 2025
- Intel Corporation
- Shao Ming Koh
Information Patent Application
GATE-ALL-AROUND DEVICES WITH DIFFERENT GATE LENGTHS
- Publication number 20250220969
- Publication date Jul 3, 2025
- Intel Corporation
- Shao Ming Koh
Information Patent Application
AIRGAP SPACER WRAPPED AROUND A CONTACT
- Publication number 20250220986
- Publication date Jul 3, 2025
- Intel Corporation
- Shao Ming Koh
Information Patent Application
SELF-ALIGNED INTERCONNECT FEATURES WITH FLOATING DIELECTRIC STRUCTURE
- Publication number 20250218868
- Publication date Jul 3, 2025
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECT LAYERS WITH AIR GAPS
- Publication number 20250210411
- Publication date Jun 26, 2025
- Intel Corporation
- Ananya Dutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BILAYER CAVITY SPACER FOR GATE-ALL-AROUND TRANSISTOR
- Publication number 20250212464
- Publication date Jun 26, 2025
- Intel Corporation
- Sudipto Naskar
Information Patent Application
CAPACITOR ARCHITECTURES IN SEMICONDUCTOR DEVICES
- Publication number 20250120100
- Publication date Apr 10, 2025
- Intel Corporation
- Sudipto NASKAR
Information Patent Application
SELECTIVE DIELECTRIC GROWTH FOR DIRECTING CONTACT TO GATE OR CONTAC...
- Publication number 20250112037
- Publication date Apr 3, 2025
- Intel Corporation
- Mark KOEPER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH CONTACT STRUCTURE WITH AIRGAP SPACER
- Publication number 20250113581
- Publication date Apr 3, 2025
- Intel Corporation
- Hwichan JUN
Information Patent Application
DIFFERENTIATED CONDUCTIVE LINES FOR ADVANCED INTEGRATED CIRCUIT STR...
- Publication number 20250105148
- Publication date Mar 27, 2025
- Intel Corporation
- Marvin PAIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR GAP INSULATION IN PLACE OF GATE SPACERS
- Publication number 20250098242
- Publication date Mar 20, 2025
- Intel Corporation
- Seda Cekli
Information Patent Application
N-TYPE TRANSISTOR FABRICATION IN COMPLEMENTARY FET (CFET) DEVICES
- Publication number 20250006812
- Publication date Jan 2, 2025
- Intel Corporation
- Sudipto Naskar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL INTERLOCKED CORRUGATED CAPACITOR STRUCTURES
- Publication number 20240421181
- Publication date Dec 19, 2024
- Intel Corporation
- Denzil Frost
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUIT COMPONENTS WITH HIGH PERFORMANCE THIN FILM TRANSISTOR MATERIAL
- Publication number 20240332285
- Publication date Oct 3, 2024
- Intel Corporation
- Sukru Yemenicioglu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE WITH HETEROGENOUS TRANSISTORS
- Publication number 20240332299
- Publication date Oct 3, 2024
- Intel Corporation
- Abhishek Anil Sharma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING AIR GAPS
- Publication number 20240332166
- Publication date Oct 3, 2024
- Intel Corporation
- Seda CEKLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR WITH CHANNEL-SYMMETRIC GATE
- Publication number 20240332290
- Publication date Oct 3, 2024
- Intel Corporation
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARACTOR COMPRISING HIGH PERFORMANCE THIN FILM TRANSISTOR MATERIAL
- Publication number 20240332432
- Publication date Oct 3, 2024
- Intel Corporation
- Sukru Yemenicioglu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARCHITECTURES AND METHODS FOR COMPUTATION IN MEMORY (CIM) WITH BACK...
- Publication number 20240324167
- Publication date Sep 26, 2024
- Intel Corporation
- Sudipto Naskar
Information Patent Application
INTEGRATED CIRCUIT STRUCTURES HAVING SELF-ALIGNED UNIFORM GRID META...
- Publication number 20240312986
- Publication date Sep 19, 2024
- Intel Corporation
- Dan S. LAVRIC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED BACKBONE FOR FORKSHEET TRANSISTORS
- Publication number 20240213250
- Publication date Jun 27, 2024
- Intel Corporation
- Shao Ming KOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES FABRICATED USING ALTE...
- Publication number 20240120335
- Publication date Apr 11, 2024
- Intel Corporation
- Sudipto NASKAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU MULTI-LAYER DIELECTRIC FILMS FOR APPLICATION AS GATE SPACER...
- Publication number 20240006512
- Publication date Jan 4, 2024
- Intel Corporation
- Walter CASPER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE PASSIVATION FOR EPI GROWTH IN PRESENCE OF METALLIC CONTACTS
- Publication number 20230317809
- Publication date Oct 5, 2023
- Intel Corporation
- Sudipto NASKAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIA PROFILE SHRINK FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRIC...
- Publication number 20230178426
- Publication date Jun 8, 2023
- Intel Corporation
- Tiffany ZINK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE-ALL-AROUND TRANSISTOR DEVICE WITH COMPRESSIVELY STRAINED CHANN...
- Publication number 20230163212
- Publication date May 25, 2023
- Intel Corporation
- Cory C. Bomberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE-TO-GATE ISOLATION FOR STACKED TRANSISTOR ARCHITECTURE VIA SELE...
- Publication number 20230073078
- Publication date Mar 9, 2023
- Intel Corporation
- Willy Rachmady
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRATING REPLICATION USING HELMETS AND TOPOGRAPHICALLY-SELECTIVE DEP...
- Publication number 20220238376
- Publication date Jul 28, 2022
- Intel Corporation
- Kevin LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAP STRUCTURE FOR INTERCONNECT DIELECTRICS AND METHODS OF FABRICATION
- Publication number 20220199544
- Publication date Jun 23, 2022
- Intel Corporation
- Shashi Vyas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE HAVING BACKEND DOUBLE-WALLED CAPACITORS
- Publication number 20220199760
- Publication date Jun 23, 2022
- Intel Corporation
- Abhishek A. SHARMA
- H01 - BASIC ELECTRIC ELEMENTS

Sudipto NASKAR

Person

Patents Grantslast 30 patents

Gate-to-gate isolation for stacked transistor architecture via sele...

Capacitor architectures in semiconductor devices

Cap structure for interconnect dielectrics and methods of fabrication

Localized spacer for nanowire transistors and methods of fabrication

Gap fill dielectrics for electrical isolation of transistor structu...

Capacitor architectures in semiconductor devices

Gate-all-around integrated circuit structures fabricated using alte...

Grating replication using helmets and topographically-selective dep...

Capacitor architectures in semiconductor devices

Grating replication using helmets and topographically-selective dep...

Capacitor architectures in semiconductor devices

Passivating silicide-based approaches for conductive via fabricatio...

Pitch quartered three-dimensional air gaps

Nitrogen assisted oxide gapfill

Self-aligned via below subtractively patterned interconnect

Patents Applicationslast 30 patents

METHOD OF CONTROLLING METAL GATE HEIGHT AND SELECTIVE SPACER FORMATION

GATE-ALL-AROUND DEVICES WITH DIFFERENT GATE LENGTHS

AIRGAP SPACER WRAPPED AROUND A CONTACT

SELF-ALIGNED INTERCONNECT FEATURES WITH FLOATING DIELECTRIC STRUCTURE

INTERCONNECT LAYERS WITH AIR GAPS

BILAYER CAVITY SPACER FOR GATE-ALL-AROUND TRANSISTOR

CAPACITOR ARCHITECTURES IN SEMICONDUCTOR DEVICES

SELECTIVE DIELECTRIC GROWTH FOR DIRECTING CONTACT TO GATE OR CONTAC...

TRENCH CONTACT STRUCTURE WITH AIRGAP SPACER

DIFFERENTIATED CONDUCTIVE LINES FOR ADVANCED INTEGRATED CIRCUIT STR...

AIR GAP INSULATION IN PLACE OF GATE SPACERS

N-TYPE TRANSISTOR FABRICATION IN COMPLEMENTARY FET (CFET) DEVICES

THREE-DIMENSIONAL INTERLOCKED CORRUGATED CAPACITOR STRUCTURES

CIRCUIT COMPONENTS WITH HIGH PERFORMANCE THIN FILM TRANSISTOR MATERIAL

INTEGRATED CIRCUIT DEVICE WITH HETEROGENOUS TRANSISTORS

INTEGRATED CIRCUIT STRUCTURES HAVING AIR GAPS

TRANSISTOR WITH CHANNEL-SYMMETRIC GATE

VARACTOR COMPRISING HIGH PERFORMANCE THIN FILM TRANSISTOR MATERIAL

ARCHITECTURES AND METHODS FOR COMPUTATION IN MEMORY (CIM) WITH BACK...

INTEGRATED CIRCUIT STRUCTURES HAVING SELF-ALIGNED UNIFORM GRID META...

SELF-ALIGNED BACKBONE FOR FORKSHEET TRANSISTORS

GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES FABRICATED USING ALTE...

IN-SITU MULTI-LAYER DIELECTRIC FILMS FOR APPLICATION AS GATE SPACER...

SELECTIVE PASSIVATION FOR EPI GROWTH IN PRESENCE OF METALLIC CONTACTS

VIA PROFILE SHRINK FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRIC...

GATE-ALL-AROUND TRANSISTOR DEVICE WITH COMPRESSIVELY STRAINED CHANN...

GATE-TO-GATE ISOLATION FOR STACKED TRANSISTOR ARCHITECTURE VIA SELE...

GRATING REPLICATION USING HELMETS AND TOPOGRAPHICALLY-SELECTIVE DEP...

CAP STRUCTURE FOR INTERCONNECT DIELECTRICS AND METHODS OF FABRICATION

INTEGRATED CIRCUIT DEVICE HAVING BACKEND DOUBLE-WALLED CAPACITORS