Sukjong Bae

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Charged-particle beam exposure method and charged-particle beam cor...
- Patent number 10,056,229
- Issue date Aug 21, 2018
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Electron beam exposure system and methods of performing exposing an...
- Patent number 9,588,415
- Issue date Mar 7, 2017
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of reducing registration errors of photomasks and photomask...
- Patent number 9,323,142
- Issue date Apr 26, 2016
- Samsung Electronics Co., Ltd.
- Jin Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE
- Publication number 20240302750
- Publication date Sep 12, 2024
- SAMSUNG DISPLAY CO., LTD.
- CHOULWON MIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A PHOTOMASK
- Publication number 20240272544
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Hyoyeon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK EXPOSURE SYSTEM AND MASK EXPOSURE METHOD
- Publication number 20240152062
- Publication date May 9, 2024
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...
- Publication number 20230042743
- Publication date Feb 9, 2023
- Katholieke Universiteit Leuven
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...
- Publication number 20180012730
- Publication date Jan 11, 2018
- Samsung Electronics Co., Ltd.
- SUKJONG BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM EXPOSURE SYSTEM AND METHODS OF PERFORMING EXPOSING AN...
- Publication number 20150355547
- Publication date Dec 10, 2015
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Reducing Registration Errors of Photomasks and Photomask...
- Publication number 20150050584
- Publication date Feb 19, 2015
- Samsung Electronics Co., Ltd.
- Jin Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Sukjong Bae

Person

Patents Grantslast 30 patents

Charged-particle beam exposure method and charged-particle beam cor...

Electron beam exposure system and methods of performing exposing an...

Methods of reducing registration errors of photomasks and photomask...

Patents Applicationslast 30 patents

CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE

METHOD OF MANUFACTURING A PHOTOMASK

MASK EXPOSURE SYSTEM AND MASK EXPOSURE METHOD

PHOTORESIST INSPECTION APPARATUS, PHOTORESIST INSPECTION METHOD USI...

CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...

ELECTRON BEAM EXPOSURE SYSTEM AND METHODS OF PERFORMING EXPOSING AN...

Methods of Reducing Registration Errors of Photomasks and Photomask...