Sum-Yee Betty TANG

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Graded ARC for high NA and immersion lithography
- Patent number 8,125,034
- Issue date Feb 28, 2012
- Applied Materials, Inc.
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded ARC for high NA and immersion lithography
- Patent number 7,776,516
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Wendy H. Yeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid precursors for the CVD deposition of amorphous carbon films
- Patent number 7,407,893
- Issue date Aug 5, 2008
- Applied Materials, Inc.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etch process for dielectric materials comprising oxidized organo si...
- Patent number 6,762,127
- Issue date Jul 13, 2004
- Yves Pierre Boiteux
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mixed frequency high temperature nitride CVD process
- Patent number 6,664,202
- Issue date Dec 16, 2003
- Applied Materials Inc.
- Sum-Yee Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ integrated oxide etch process particularly useful for coppe...
- Patent number 6,380,096
- Issue date Apr 30, 2002
- Applied Materials, Inc.
- Hoiman Hung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOW REFRACTIVE INDEX COATING DEPOSITED BY REMOTE PLASMA CVD
- Publication number 20140091417
- Publication date Apr 3, 2014
- Applied Materials, Inc.
- Sum-Yee Betty TANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUOROCARBON COATING HAVING LOW REFRACTIVE INDEX
- Publication number 20140091379
- Publication date Apr 3, 2014
- Applied Materials, Inc.
- Sum-Yee Betty TANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PECVD MULTI-STEP PROCESSING WITH CONTINUOUS PLASMA
- Publication number 20110151142
- Publication date Jun 23, 2011
- Applied Materials, Inc.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY
- Publication number 20100239979
- Publication date Sep 23, 2010
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded ARC for high na and immersion lithography
- Publication number 20080020319
- Publication date Jan 24, 2008
- APPLIED MATERIALS, INC.
- Wendy H. Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for low temperature deposition of an amorphous carbon layer
- Publication number 20070286954
- Publication date Dec 13, 2007
- APPLIED MATERIALS, INC.
- Sum-Yee Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Enhancement of remote plasma source clean for dielectric films
- Publication number 20070207275
- Publication date Sep 6, 2007
- APPLIED MATERIALS, INC.
- Thomas Nowak
- B08 - CLEANING
Information Patent Application
Liquid precursors for the CVD deposition of amorphous carbon films
- Publication number 20050287771
- Publication date Dec 29, 2005
- APPLIED MATERIALS, INC.
- Martin Jay Seamons
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Stress-tuned, single-layer silicon nitride film
- Publication number 20050170104
- Publication date Aug 4, 2005
- APPLIED MATERIALS, INC.
- KeeBum Jung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MIXED FREQUENCY HIGH TEMPERATURE NITRIDE CVD PROCESS
- Publication number 20030199175
- Publication date Oct 23, 2003
- Applied Materials, Inc.
- Sum-Yee Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch process for dielectric materials comprising oxidized organo si...
- Publication number 20030073321
- Publication date Apr 17, 2003
- Applied Material, Inc.
- Yves Pierre Boiteux
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU INTEGRATED OXIDE ETCH PROCESS PARTICULARLY USEFUL FOR COPPE...
- Publication number 20010008226
- Publication date Jul 19, 2001
- HOIMAN HUNG
- H01 - BASIC ELECTRIC ELEMENTS

Sum-Yee Betty TANG

Person

Patents Grantslast 30 patents

Graded ARC for high NA and immersion lithography

Graded ARC for high NA and immersion lithography

Liquid precursors for the CVD deposition of amorphous carbon films

Etch process for dielectric materials comprising oxidized organo si...

Mixed frequency high temperature nitride CVD process

In-situ integrated oxide etch process particularly useful for coppe...

Patents Applicationslast 30 patents

LOW REFRACTIVE INDEX COATING DEPOSITED BY REMOTE PLASMA CVD

FLUOROCARBON COATING HAVING LOW REFRACTIVE INDEX

PECVD MULTI-STEP PROCESSING WITH CONTINUOUS PLASMA

GRADED ARC FOR HIGH NA AND IMMERSION LITHOGRAPHY

Graded ARC for high na and immersion lithography

Methods for low temperature deposition of an amorphous carbon layer

Enhancement of remote plasma source clean for dielectric films

Liquid precursors for the CVD deposition of amorphous carbon films

Stress-tuned, single-layer silicon nitride film

MIXED FREQUENCY HIGH TEMPERATURE NITRIDE CVD PROCESS

Etch process for dielectric materials comprising oxidized organo si...

IN-SITU INTEGRATED OXIDE ETCH PROCESS PARTICULARLY USEFUL FOR COPPE...