Sumie Nagaseki

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Vaporizing unit, film forming apparatus, film forming method, compu...
- Patent number 9,343,295
- Issue date May 17, 2016
- Tokyo Electron Limited
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor fabrication apparatus and temperature adjustment method
- Patent number 8,818,545
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Kazuyoshi Matsuzaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, apparatus for manufac...
- Patent number 8,293,662
- Issue date Oct 23, 2012
- Tokyo Electron Limited
- Sumie Nagaseki
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor device manufacturing method, semiconductor manufactur...
- Patent number 8,242,026
- Issue date Aug 14, 2012
- Tokyo Electron Limited
- Sumie Nagaseki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20140256157
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Ikuo SAWADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COOLING UNIT, PROCESSING CHAMBER, PART IN THE PROCESSING CHAMBER, A...
- Publication number 20120204576
- Publication date Aug 16, 2012
- TOKYO ELECTRON LIMITED
- Kazuyoshi MATSUZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, APPARATUS FOR MANUFAC...
- Publication number 20120100727
- Publication date Apr 26, 2012
- TOKYO ELECTRON LIMITED
- Sumie Nagaseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR FABRICATION APPARATUS AND TEMPERATURE ADJUSTMENT METHOD
- Publication number 20120016508
- Publication date Jan 19, 2012
- TOKYO ELECTRON LIMITED
- Kazuyoshi Matsuzaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20110201208
- Publication date Aug 18, 2011
- TOKYO ELECTRON LIMITED
- Masato Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MEASURING METHOD, PLASMA MEASURING DEVICE AND STORAGE MEDIUM
- Publication number 20100321029
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Toru Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20100297346
- Publication date Nov 25, 2010
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100267243
- Publication date Oct 21, 2010
- TOKYO ELECTRON LIMITED
- Masato Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR MANUFACTUR...
- Publication number 20100003807
- Publication date Jan 7, 2010
- Tokyo Electron Limited
- Sumie Nagaseki
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Sumie Nagaseki

Person

Patents Grantslast 30 patents

Vaporizing unit, film forming apparatus, film forming method, compu...

Semiconductor fabrication apparatus and temperature adjustment method

Method of manufacturing semiconductor device, apparatus for manufac...

Semiconductor device manufacturing method, semiconductor manufactur...

Patents Applicationslast 30 patents

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

COOLING UNIT, PROCESSING CHAMBER, PART IN THE PROCESSING CHAMBER, A...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, APPARATUS FOR MANUFAC...

SEMICONDUCTOR FABRICATION APPARATUS AND TEMPERATURE ADJUSTMENT METHOD

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

PLASMA MEASURING METHOD, PLASMA MEASURING DEVICE AND STORAGE MEDIUM

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

PLASMA PROCESSING METHOD AND APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR MANUFACTUR...