Sung Je Kim

Person

Beaverton, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Planar substrate edge contact with open volume equalization pathway...
- Patent number 11,443,975
- Issue date Sep 13, 2022
- Lam Research Corporation
- Patrick Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for flow monitoring in a precursor vapor supply...
- Patent number 11,255,017
- Issue date Feb 22, 2022
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conical wafer centering and holding device for semiconductor proces...
- Patent number 10,655,224
- Issue date May 19, 2020
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Planar substrate edge contact with open volume equalization pathway...
- Patent number 10,622,243
- Issue date Apr 14, 2020
- Patrick Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for flow monitoring in a precursor vapor supply...
- Patent number 10,351,953
- Issue date Jul 16, 2019
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY...
- Publication number 20200407849
- Publication date Dec 31, 2020
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAY...
- Publication number 20200227304
- Publication date Jul 16, 2020
- LAM RESEARCH CORPORATION
- Patrick Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL A...
- Publication number 20200219757
- Publication date Jul 9, 2020
- LAM RESEARCH CORPORATION
- Patrick BREILING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Wafer Edge Contact Hardware and Methods to Eliminate Deposition at...
- Publication number 20180334746
- Publication date Nov 22, 2018
- LAM RESEARCH CORPORATION
- Patrick Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY...
- Publication number 20180265983
- Publication date Sep 20, 2018
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONICAL WAFER CENTERING AND HOLDING DEVICE FOR SEMICONDUCTOR PROCES...
- Publication number 20180171473
- Publication date Jun 21, 2018
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAY...
- Publication number 20180122685
- Publication date May 3, 2018
- LAM RESEARCH CORPORATION
- Patrick Breiling
- H01 - BASIC ELECTRIC ELEMENTS

Sung Je Kim

Person

Patents Grantslast 30 patents

Planar substrate edge contact with open volume equalization pathway...

Systems and methods for flow monitoring in a precursor vapor supply...

Conical wafer centering and holding device for semiconductor proces...

Planar substrate edge contact with open volume equalization pathway...

Systems and methods for flow monitoring in a precursor vapor supply...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY...

PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAY...

INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL A...

Wafer Edge Contact Hardware and Methods to Eliminate Deposition at...

SYSTEMS AND METHODS FOR FLOW MONITORING IN A PRECURSOR VAPOR SUPPLY...

CONICAL WAFER CENTERING AND HOLDING DEVICE FOR SEMICONDUCTOR PROCES...

PLANAR SUBSTRATE EDGE CONTACT WITH OPEN VOLUME EQUALIZATION PATHWAY...