Sung-man Whang

Person

Suwon-city, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device having a plurality of channel layers and metho...
- Patent number 11,862,639
- Issue date Jan 2, 2024
- Samsung Electronics Co., Ltd.
- Woo Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device including non-sacrificial gate spacers and met...
- Patent number 11,705,503
- Issue date Jul 18, 2023
- Samsung Electronics Co., Ltd.
- Jin Bum Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device having a plurality of...
- Patent number 11,437,377
- Issue date Sep 6, 2022
- Samsung Electronics Co., Ltd.
- Woo Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a plurality of channel layers and metho...
- Patent number 10,833,085
- Issue date Nov 10, 2020
- Samsung Electronics Co., Ltd.
- Woo Cheol Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device
- Patent number 10,396,205
- Issue date Aug 27, 2019
- Samsung Electronics Co., Ltd.
- Mun-hyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating metal oxide semiconductor transistor with lig...
- Patent number 6,541,328
- Issue date Apr 1, 2003
- Samsung Electronics Co., Ltd.
- Sung-man Whang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING A PLURALITY OF CHANNEL LAYERS AND METHO...
- Publication number 20240096894
- Publication date Mar 21, 2024
- Samsung Electronics Co., Ltd.
- Woo Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A PLURALITY OF CHANNEL LAYERS AND METHO...
- Publication number 20220406779
- Publication date Dec 22, 2022
- Samsung Electronics Co., Ltd.
- Woo Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HAVING A PLURALITY OF...
- Publication number 20210020638
- Publication date Jan 21, 2021
- Samsung Electronics Co., Ltd.
- Woo Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING NON-SACRIFICIAL GATE SPACERS AND MET...
- Publication number 20210013324
- Publication date Jan 14, 2021
- Samsung Electronics Co., Ltd.
- Jin Bum KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A PLURALITY OF CHANNEL LAYERS AND METHO...
- Publication number 20200219879
- Publication date Jul 9, 2020
- Samsung Electronics Co., Ltd.
- Woo Cheol SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20190198639
- Publication date Jun 27, 2019
- Samsung Electronics Co., Ltd.
- Jin Bum KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE
- Publication number 20190097054
- Publication date Mar 28, 2019
- Samsung Electronics Co., Ltd.
- Mun-hyeon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating metal oxide semiconductor transistor with lig...
- Publication number 20020115258
- Publication date Aug 22, 2002
- SAMSUNG ELECTRONICS CO., LTD.
- Sung-man Whang
- H01 - BASIC ELECTRIC ELEMENTS

Sung-man Whang

Person

Patents Grantslast 30 patents

Semiconductor device having a plurality of channel layers and metho...

Semiconductor device including non-sacrificial gate spacers and met...

Method of manufacturing semiconductor device having a plurality of...

Semiconductor device having a plurality of channel layers and metho...

Integrated circuit device

Method of fabricating metal oxide semiconductor transistor with lig...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING A PLURALITY OF CHANNEL LAYERS AND METHO...

SEMICONDUCTOR DEVICE HAVING A PLURALITY OF CHANNEL LAYERS AND METHO...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HAVING A PLURALITY OF...

SEMICONDUCTOR DEVICE INCLUDING NON-SACRIFICIAL GATE SPACERS AND MET...

SEMICONDUCTOR DEVICE HAVING A PLURALITY OF CHANNEL LAYERS AND METHO...

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

INTEGRATED CIRCUIT DEVICE

Method of fabricating metal oxide semiconductor transistor with lig...