SURAJIT KUMAR

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for CMP temperature control
- Patent number 11,919,123
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Grant
Wafer heater with backside and integrated bevel purge
- Patent number 11,769,684
- Issue date Sep 26, 2023
- Applied Materials, Inc.
- Tejas Ulavi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas entrainment during jetting of fluid for temperature control in...
- Patent number 11,577,358
- Issue date Feb 14, 2023
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Grant
High quality factor embedded resonator wafers
- Patent number 11,209,398
- Issue date Dec 28, 2021
- Applied Materials, Inc.
- Chuang-Chia Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liner for processing chamber
- Patent number 11,021,790
- Issue date Jun 1, 2021
- Applied Materials, Inc.
- Zhepeng Cong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for controlling temperature uniformity of a substrate
- Patent number 10,386,126
- Issue date Aug 20, 2019
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Heating modulators to improve epi uniformity tuning
- Patent number 10,132,003
- Issue date Nov 20, 2018
- Applied Materials, Inc.
- Shu-Kwan Lau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
EPI base ring
- Patent number 10,119,192
- Issue date Nov 6, 2018
- Applied Materials, Inc.
- Steve Aboagye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Quartz upper and lower domes
- Patent number 9,768,043
- Issue date Sep 19, 2017
- Applied Materials, Inc.
- Anzhong Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
EPI base ring
- Patent number 9,322,097
- Issue date Apr 26, 2016
- Applied Materials, Inc.
- Steve Aboagye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for controlling the temperature uniformity of a substrate
- Patent number 9,267,742
- Issue date Feb 23, 2016
- Applied Materials, Inc.
- Kallol Bera
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Multi-zoned plasma processing electrostatic chuck with improved tem...
- Patent number 9,248,509
- Issue date Feb 2, 2016
- Applied Materials, Inc.
- Hamid Tavassoli
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-zoned plasma processing electrostatic chuck with improved tem...
- Patent number 8,822,876
- Issue date Sep 2, 2014
- Applied Materials, Inc.
- Hamid Tavassoli
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Assembly for delivering RF power and DC voltage to a plasma process...
- Patent number 8,629,370
- Issue date Jan 14, 2014
- Applied Materials, Inc.
- Hamid Tavassoli
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
- Publication number 20240157504
- Publication date May 16, 2024
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Application
UNIFORM RADIATION HEATING CONTROL ARCHITECTURE
- Publication number 20230297740
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Preetham Rao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BATCH THERMAL PROCESS CHAMBER
- Publication number 20230230859
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Adel George TANNOUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ENTRAINMENT DURING JETTING OF FLUID FOR TEMPERATURE CONTROL IN...
- Publication number 20230182259
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Application
WAFER EDGE TEMPERATURE CORRECTION IN BATCH THERMAL PROCESS CHAMBER
- Publication number 20230167581
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Kartik Bhupendra SHAH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer Heater With Backside And Integrated Bevel Purge
- Publication number 20230113057
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Tejas Ulavi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL
- Publication number 20210402555
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Application
GAS ENTRAINMENT DURING JETTING OF FLUID FOR TEMPERATURE CONTROL IN...
- Publication number 20210402552
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Surajit Kumar
- B24 - GRINDING POLISHING
Information Patent Application
Wafer Heater With Backside And Integrated Bevel Purge
- Publication number 20210111059
- Publication date Apr 15, 2021
- Applies Materials, Inc.
- Tejas Ulavi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH QUALITY FACTOR EMBEDDED RESONATOR WAFERS
- Publication number 20210080431
- Publication date Mar 18, 2021
- Applied Materials, Inc.
- Chuang-Chia Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINER FOR PROCESSING CHAMBER
- Publication number 20200040451
- Publication date Feb 6, 2020
- Applied Materials, Inc.
- Zhepeng CONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HEATING MODULATORS TO IMPROVE EPI UNIFORMITY TUNING
- Publication number 20180023214
- Publication date Jan 25, 2018
- Applied Materials, Inc.
- Shu-Kwan LAU
- C30 - CRYSTAL GROWTH
Information Patent Application
QUARTZ UPPER AND LOWER DOMES
- Publication number 20180005856
- Publication date Jan 4, 2018
- Applied Materials, Inc.
- Anzhong CHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS CHAMBER WITH REFLECTOR
- Publication number 20160348276
- Publication date Dec 1, 2016
- Applied Materials, Inc.
- Shu-Kwan LAU
- C30 - CRYSTAL GROWTH
Information Patent Application
EPI BASE RING
- Publication number 20160230276
- Publication date Aug 11, 2016
- Applied Materials, Inc.
- STEVE ABOAGYE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE
- Publication number 20160169593
- Publication date Jun 16, 2016
- KALLOL BERA
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
CARBON FIBER RING SUSCEPTOR
- Publication number 20150083046
- Publication date Mar 26, 2015
- Applied Materials, Inc.
- Joseph M. RANISH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...
- Publication number 20140346743
- Publication date Nov 27, 2014
- Hamid Tavassoli
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
REFLECTIVE LINERS
- Publication number 20140287170
- Publication date Sep 25, 2014
- JOSEPH M. RANISH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPI BASE RING
- Publication number 20140261185
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- STEVE ABOAGYE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
QUARTZ UPPER AND LOWER DOMES
- Publication number 20140199056
- Publication date Jul 17, 2014
- Anzhong CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...
- Publication number 20120091104
- Publication date Apr 19, 2012
- Applied Materials, Inc.
- Hamid Tavassoli
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
ASSEMBLY FOR DELIVERING RF POWER AND DC VOLTAGE TO A PLASMA PROCESS...
- Publication number 20110297650
- Publication date Dec 8, 2011
- Applied Materials, Inc.
- Hamid Tavassoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE
- Publication number 20110180243
- Publication date Jul 28, 2011
- Applied Materials, Inc.
- KALLOL BERA
- F28 - HEAT EXCHANGE IN GENERAL

SURAJIT KUMAR

Person

Patents Grantslast 30 patents

Apparatus and method for CMP temperature control

Wafer heater with backside and integrated bevel purge

Gas entrainment during jetting of fluid for temperature control in...

High quality factor embedded resonator wafers

Liner for processing chamber

Apparatus for controlling temperature uniformity of a substrate

Heating modulators to improve epi uniformity tuning

EPI base ring

Quartz upper and lower domes

EPI base ring

Apparatus for controlling the temperature uniformity of a substrate

Multi-zoned plasma processing electrostatic chuck with improved tem...

Multi-zoned plasma processing electrostatic chuck with improved tem...

Assembly for delivering RF power and DC voltage to a plasma process...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

UNIFORM RADIATION HEATING CONTROL ARCHITECTURE

BATCH THERMAL PROCESS CHAMBER

GAS ENTRAINMENT DURING JETTING OF FLUID FOR TEMPERATURE CONTROL IN...

WAFER EDGE TEMPERATURE CORRECTION IN BATCH THERMAL PROCESS CHAMBER

Wafer Heater With Backside And Integrated Bevel Purge

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

GAS ENTRAINMENT DURING JETTING OF FLUID FOR TEMPERATURE CONTROL IN...

Wafer Heater With Backside And Integrated Bevel Purge

HIGH QUALITY FACTOR EMBEDDED RESONATOR WAFERS

LINER FOR PROCESSING CHAMBER

HEATING MODULATORS TO IMPROVE EPI UNIFORMITY TUNING

QUARTZ UPPER AND LOWER DOMES

PROCESS CHAMBER WITH REFLECTOR

EPI BASE RING

APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE

CARBON FIBER RING SUSCEPTOR

MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...

REFLECTIVE LINERS

EPI BASE RING

QUARTZ UPPER AND LOWER DOMES

MULTI-ZONED PLASMA PROCESSING ELECTROSTATIC CHUCK WITH IMPROVED TEM...

ASSEMBLY FOR DELIVERING RF POWER AND DC VOLTAGE TO A PLASMA PROCESS...

APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SUBSTRATE