Susan Telford

Person

Untergruttenbach, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Utilization of SiH4 soak and purge in deposition processes
- Patent number 6,193,813
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Meng Chu Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Preconditioning process for treating deposition chamber prior to de...
- Patent number 6,090,706
- Issue date Jul 18, 2000
- Applied Materials, Inc.
- Susan Weiher Telford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate having uniform tungsten silicide film and method of manuf...
- Patent number 5,997,950
- Issue date Dec 7, 1999
- Applied Materials, Inc.
- Susan G. Telford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Utilization of SiH.sub.4 soak and purge in deposition processes
- Patent number 5,817,576
- Issue date Oct 6, 1998
- Applied Materials, Inc.
- Meng Chu Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Purge in silicide deposition processes dichlorosilane
- Patent number 5,780,360
- Issue date Jul 14, 1998
- Applied Materials, Inc.
- Jennifer Meng Chu Tseng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Uniform tungsten silicide films produced by chemical vapor depostiton
- Patent number 5,643,633
- Issue date Jul 1, 1997
- Applied Materials, Inc.
- Susan G. Telford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Uniform tungsten silicide films produced by chemical vapor deposition
- Patent number 5,558,910
- Issue date Sep 24, 1996
- Applied Materials, Inc.
- Susan G. Telford
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Susan Telford

Person

Patents Grantslast 30 patents

Utilization of SiH4 soak and purge in deposition processes

Preconditioning process for treating deposition chamber prior to de...

Substrate having uniform tungsten silicide film and method of manuf...

Utilization of SiH.sub.4 soak and purge in deposition processes

Purge in silicide deposition processes dichlorosilane

Uniform tungsten silicide films produced by chemical vapor depostiton

Uniform tungsten silicide films produced by chemical vapor deposition