Susmit Singha Roy

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Defect free germanium oxide gap fill
- Patent number 12,198,936
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor phase photoresists deposition
- Patent number 12,084,764
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal based hydrogen barrier
- Patent number 12,020,982
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective patterning with molecular layer deposition
- Patent number 11,990,369
- Issue date May 21, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Area selective carbon-based film deposition
- Patent number 11,972,940
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,886,120
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal deposition of silicon-germanium
- Patent number 11,830,734
- Issue date Nov 28, 2023
- Applied Materials, Inc.
- Huiyuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD based oxide-metal multi structure for 3D NAND memory devices
- Patent number 11,817,320
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diffusion barriers for germanium
- Patent number 11,791,155
- Issue date Oct 17, 2023
- Applied Materials, Inc.
- Huiyuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molecular layer deposition contact landing protection for 3D NAND
- Patent number 11,756,785
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,705,335
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of semiconductor integration films
- Patent number 11,562,904
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 11,545,504
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature graphene growth
- Patent number 11,515,163
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Jialiang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 11,430,801
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for three dimensional NAND structure fabrication
- Patent number 10,998,329
- Issue date May 4, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD based oxide-metal multi structure for 3D NAND memory devices
- Patent number 10,410,869
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
IN-SITU ETCH AND INHIBITION IN PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Publication number 20240420934
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Bhaskar Soman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE
- Publication number 20240234531
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Sai Hooi Yeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AREA SELECTIVE CARBON-BASED FILM DEPOSITION
- Publication number 20240234127
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYER INNER SPACER FOR GATE-ALL-AROUND DEVICE
- Publication number 20240194757
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Sai Hooi Yeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL BASED HYDROGEN BARRIER
- Publication number 20240194526
- Publication date Jun 13, 2024
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION
- Publication number 20240183035
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL
- Publication number 20240120193
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Shankar Venkataraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOLECULAR LAYER DEPOSITION CARBON MASKS FOR DIRECT SELECTIVE DEPOSI...
- Publication number 20240105499
- Publication date Mar 28, 2024
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING
- Publication number 20240055255
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEFECT FREE GERMANIUM OXIDE GAP FILL
- Publication number 20230407468
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS
- Publication number 20230402285
- Publication date Dec 14, 2023
- Applied Materials, Inc.
- Xinke Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230386839
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL METAL DICHALCOGENIDES
- Publication number 20230360967
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Chandan Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-AND-CARBON-CONTAINING MATERIALS WITH LOW DIELECTRIC CONSTANTS
- Publication number 20230360906
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LARGE AREA GAPFILL USING VOLUMETRIC EXPANSION
- Publication number 20230360903
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Supriya Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE CARBON GAPFILL
- Publication number 20230360924
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Supriya Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Area Selective Carbon-Based Film Deposition
- Publication number 20230335391
- Publication date Oct 19, 2023
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL METAL DICHALCOGENIDES
- Publication number 20230207314
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Chandan Das
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS
- Publication number 20230127535
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEXAGONAL BORON NITRIDE DEPOSITION
- Publication number 20230105408
- Publication date Apr 6, 2023
- Applied Materials, Inc.
- Zeqing Shen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE GRAPHENE DEPOSITION
- Publication number 20230090280
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Supriya Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GERMANIUM AND SILICON STACKS FOR 3D NAND
- Publication number 20230090426
- Publication date Mar 23, 2023
- Applied Materials, Inc.
- Sieun Chae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE GRAPHENE GROWTH
- Publication number 20230056280
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Jialiang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PATTERNING WITH MOLECULAR LAYER DEPOSITION
- Publication number 20230057258
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOLECULAR LAYER DEPOSITION CONTACT LANDING PROTECTION FOR 3D NAND
- Publication number 20230059788
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOLECULAR LAYER DEPOSITION LINER FOR 3D NAND
- Publication number 20230058831
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL DEPOSITION OF SILICON-GERMANIUM
- Publication number 20220375750
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Huiyuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20220367270
- Publication date Nov 17, 2022
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FULLY SELF-ALIGNED VIA
- Publication number 20220359289
- Publication date Nov 10, 2022
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conformal High Concentration Boron Doping Of Semiconductors
- Publication number 20220246432
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS

Susmit Singha Roy

Person

Patents Grantslast 30 patents

Defect free germanium oxide gap fill

Vapor phase photoresists deposition

Metal based hydrogen barrier

Selective patterning with molecular layer deposition

Area selective carbon-based film deposition

Deposition of semiconductor integration films

Thermal deposition of silicon-germanium

CVD based oxide-metal multi structure for 3D NAND memory devices

Diffusion barriers for germanium

Molecular layer deposition contact landing protection for 3D NAND

Conformal high concentration boron doping of semiconductors

Deposition of semiconductor integration films

Methods and apparatus for three dimensional NAND structure fabrication

Low temperature graphene growth

Methods and apparatus for three dimensional NAND structure fabrication

Methods and apparatus for three dimensional NAND structure fabrication

CVD based oxide-metal multi structure for 3D NAND memory devices

Patents Applicationslast 30 patents

IN-SITU ETCH AND INHIBITION IN PLASMA ENHANCED ATOMIC LAYER DEPOSITION

INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE

AREA SELECTIVE CARBON-BASED FILM DEPOSITION

MULTILAYER INNER SPACER FOR GATE-ALL-AROUND DEVICE

METAL BASED HYDROGEN BARRIER

AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION

CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL

MOLECULAR LAYER DEPOSITION CARBON MASKS FOR DIRECT SELECTIVE DEPOSI...

SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING

DEFECT FREE GERMANIUM OXIDE GAP FILL

METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

CONFORMAL METAL DICHALCOGENIDES

SILICON-AND-CARBON-CONTAINING MATERIALS WITH LOW DIELECTRIC CONSTANTS

LARGE AREA GAPFILL USING VOLUMETRIC EXPANSION

LOW TEMPERATURE CARBON GAPFILL

Area Selective Carbon-Based Film Deposition

CONFORMAL METAL DICHALCOGENIDES

DEPOSITION OF SEMICONDUCTOR INTEGRATION FILMS

HEXAGONAL BORON NITRIDE DEPOSITION

SELECTIVE GRAPHENE DEPOSITION

GERMANIUM AND SILICON STACKS FOR 3D NAND

LOW TEMPERATURE GRAPHENE GROWTH

SELECTIVE PATTERNING WITH MOLECULAR LAYER DEPOSITION

MOLECULAR LAYER DEPOSITION CONTACT LANDING PROTECTION FOR 3D NAND

MOLECULAR LAYER DEPOSITION LINER FOR 3D NAND

THERMAL DEPOSITION OF SILICON-GERMANIUM

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

FULLY SELF-ALIGNED VIA

Conformal High Concentration Boron Doping Of Semiconductors