Susmit Singha Roy

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Defect free germanium oxide gap fill
- Patent number 11,781,218
- Issue date Oct 10, 2023
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD tungsten containing hardmask films and methods of making
- Patent number 11,594,415
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Volumetric expansion of metal-containing films by silicidation
- Patent number 11,462,438
- Issue date Oct 4, 2022
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-aligned contact and contact over active gate structures
- Patent number 11,437,273
- Issue date Sep 6, 2022
- Micromaterials LLC
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fully self-aligned via
- Patent number 11,437,274
- Issue date Sep 6, 2022
- Micromaterials LLC
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned structures from sub-oxides
- Patent number 11,414,751
- Issue date Aug 16, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,328,928
- Issue date May 10, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom-up approach to high aspect ratio hole formation in 3D memory...
- Patent number 11,315,943
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Praburam Gopalraja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nucleation-free gap fill ALD process
- Patent number 11,289,374
- Issue date Mar 29, 2022
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching metal oxides with less etch residue
- Patent number 11,232,955
- Issue date Jan 25, 2022
- Applied Materials, Inc.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of carbon films and uses thereof
- Patent number 11,177,174
- Issue date Nov 16, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned high aspect ratio structures and methods of making
- Patent number 11,177,164
- Issue date Nov 16, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-doped nitride films for improved high-k reliability
- Patent number 11,171,047
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 11,094,544
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- David Thompson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-thin diffusion barriers
- Patent number 11,069,568
- Issue date Jul 20, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal and metal-derived films
- Patent number 10,998,195
- Issue date May 4, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective and self-limiting tungsten etch process
- Patent number 10,950,498
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linerless continuous amorphous metal films
- Patent number 10,930,493
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming self-aligned vias and air gaps
- Patent number 10,840,186
- Issue date Nov 17, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidative volumetric expansion of metals and metal containing compo...
- Patent number 10,741,435
- Issue date Aug 11, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching metal oxides with less etch residue
- Patent number 10,622,221
- Issue date Apr 14, 2020
- Applied Materials, Inc.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-thin diffusion barriers
- Patent number 10,600,684
- Issue date Mar 24, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PECVD tungsten containing hardmask films and methods of making
- Patent number 10,529,568
- Issue date Jan 7, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal and metal-derived films
- Patent number 10,510,547
- Issue date Dec 17, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thick tungsten hardmask films deposition on high compressive/tensil...
- Patent number 10,504,727
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Jiarui Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming self-aligned vias
- Patent number 10,410,865
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron doped tungsten carbide for hardmask applications
- Patent number 10,403,502
- Issue date Sep 3, 2019
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming self-aligned vias and air gaps
- Patent number 10,403,542
- Issue date Sep 3, 2019
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxidative volumetric expansion of metals and metal containing compo...
- Patent number 10,319,624
- Issue date Jun 11, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardmask layer for 3D NAND staircase structure in semiconductor app...
- Patent number 10,312,137
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DEPOSITING SILICON BASED DIELECTRIC FILM
- Publication number 20240026527
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Geetika BAJAJ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO REDUCE LINE EDGE ROUGHNESS FOR EUV PHOTORESIST PATTERN
- Publication number 20240027912
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Xinke Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW TEMPERATURE GROWTH OF TRANSITION METAL CHALCOGENIDES
- Publication number 20220411918
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Chandan Das
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUPER-CONFORMAL GERMANIUM OXIDE FILMS
- Publication number 20220186365
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEFECT FREE GERMANIUM OXIDE GAP FILL
- Publication number 20220189824
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL SILICON-GERMANIUM FILM DEPOSITION
- Publication number 20220165566
- Publication date May 26, 2022
- Applied Materials, Inc.
- Huiyuan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition of Germanium
- Publication number 20220108888
- Publication date Apr 7, 2022
- Applied Materials, Inc.
- Huiyuan Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRA-THIN FILMS WITH TRANSITION METAL DICHALCOGENIDES
- Publication number 20210404056
- Publication date Dec 30, 2021
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STACK FOR 3D-NAND MEMORY CELL
- Publication number 20210327891
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Takehito Koshizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fully Self-Aligned Via
- Publication number 20210090952
- Publication date Mar 25, 2021
- Micromaterials LLC.
- Regina Freed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bottom-Up Approach To High Aspect Ratio Hole Formation In 3D Memory...
- Publication number 20210050365
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Praburam Gopalraja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned Structures From Sub-Oxides
- Publication number 20210047728
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Srinivas Gandikota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Fluorine-Doped Nitride Films for Improved High-K Reliability
- Publication number 20200411373
- Publication date Dec 31, 2020
- Applied Materials, Inc.
- Yixiong Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL BASED HYDROGEN BARRIER
- Publication number 20200373200
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Volumetric Expansion Of Metal-Containing Films By Silicidation
- Publication number 20200279772
- Publication date Sep 3, 2020
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
- Publication number 20200279773
- Publication date Sep 3, 2020
- Micromaterials LLC.
- Yuriy Shusterman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Etching Metal Oxides With Less Etch Residue
- Publication number 20200227275
- Publication date Jul 16, 2020
- Applied Materials, Inc.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned High Aspect Ratio Structures And Methods Of Making
- Publication number 20200194304
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-THIN DIFFUSION BARRIERS
- Publication number 20200194307
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition Of Carbon Films And Uses Thereof
- Publication number 20200168503
- Publication date May 28, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINERLESS CONTINUOUS AMORPHOUS METAL FILMS
- Publication number 20200135456
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- Susmit Singha ROY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL AND METAL-DERIVED FILMS
- Publication number 20200083056
- Publication date Mar 12, 2020
- Applied Materials, Inc.
- Susmit Singha ROY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD Tungsten Containing Hardmask Films And Methods Of Making
- Publication number 20200075333
- Publication date Mar 5, 2020
- Applied Materias, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective and Self-Limiting Tungsten Etch Process
- Publication number 20200027785
- Publication date Jan 23, 2020
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL HIGH CONCENTRATION BORON DOPING OF SEMICONDUCTORS
- Publication number 20190385851
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- SRINIVAS GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming Self-Aligned Vias
- Publication number 20190385849
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nucleation-Free Gap Fill ALD Process
- Publication number 20190371662
- Publication date Dec 5, 2019
- Applied Materials, Inc.
- Yihong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Increasing The Verticality Of Pillars
- Publication number 20190355621
- Publication date Nov 21, 2019
- Micromaterials LLC.
- Christophe Marcadal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods Of Forming Self-Aligned Vias And Air Gaps
- Publication number 20190348368
- Publication date Nov 14, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxidative Volumetric Expansion Of Metals And Metal Containing Compo...
- Publication number 20190259652
- Publication date Aug 22, 2019
- Applied Materials, Inc.
- Susmit Singha Roy
- H01 - BASIC ELECTRIC ELEMENTS

Susmit Singha Roy

Person

Patents Grantslast 30 patents

Defect free germanium oxide gap fill

PECVD tungsten containing hardmask films and methods of making

Volumetric expansion of metal-containing films by silicidation

Self-aligned contact and contact over active gate structures

Fully self-aligned via

Self-aligned structures from sub-oxides

Conformal high concentration boron doping of semiconductors

Bottom-up approach to high aspect ratio hole formation in 3D memory...

Nucleation-free gap fill ALD process

Methods of etching metal oxides with less etch residue

Selective deposition of carbon films and uses thereof

Self-aligned high aspect ratio structures and methods of making

Fluorine-doped nitride films for improved high-k reliability

Methods of forming self-aligned vias

Ultra-thin diffusion barriers

Metal and metal-derived films

Selective and self-limiting tungsten etch process

Linerless continuous amorphous metal films

Methods of forming self-aligned vias and air gaps

Oxidative volumetric expansion of metals and metal containing compo...

Methods of etching metal oxides with less etch residue

Ultra-thin diffusion barriers

PECVD tungsten containing hardmask films and methods of making

Metal and metal-derived films

Thick tungsten hardmask films deposition on high compressive/tensil...

Methods of forming self-aligned vias

Boron doped tungsten carbide for hardmask applications

Methods of forming self-aligned vias and air gaps

Oxidative volumetric expansion of metals and metal containing compo...

Hardmask layer for 3D NAND staircase structure in semiconductor app...

Patents Applicationslast 30 patents

METHOD OF DEPOSITING SILICON BASED DIELECTRIC FILM

METHOD TO REDUCE LINE EDGE ROUGHNESS FOR EUV PHOTORESIST PATTERN

LOW TEMPERATURE GROWTH OF TRANSITION METAL CHALCOGENIDES

SUPER-CONFORMAL GERMANIUM OXIDE FILMS

DEFECT FREE GERMANIUM OXIDE GAP FILL

CONFORMAL SILICON-GERMANIUM FILM DEPOSITION

Selective Deposition of Germanium

ULTRA-THIN FILMS WITH TRANSITION METAL DICHALCOGENIDES

STACK FOR 3D-NAND MEMORY CELL

Fully Self-Aligned Via

Bottom-Up Approach To High Aspect Ratio Hole Formation In 3D Memory...

Self-Aligned Structures From Sub-Oxides

Fluorine-Doped Nitride Films for Improved High-K Reliability

METAL BASED HYDROGEN BARRIER

Volumetric Expansion Of Metal-Containing Films By Silicidation

SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES

Methods Of Etching Metal Oxides With Less Etch Residue

Self-Aligned High Aspect Ratio Structures And Methods Of Making

ULTRA-THIN DIFFUSION BARRIERS

Selective Deposition Of Carbon Films And Uses Thereof

LINERLESS CONTINUOUS AMORPHOUS METAL FILMS

METAL AND METAL-DERIVED FILMS

PECVD Tungsten Containing Hardmask Films And Methods Of Making

Selective and Self-Limiting Tungsten Etch Process

CONFORMAL HIGH CONCENTRATION BORON DOPING OF SEMICONDUCTORS

Methods Of Forming Self-Aligned Vias

Nucleation-Free Gap Fill ALD Process

Method For Increasing The Verticality Of Pillars

Methods Of Forming Self-Aligned Vias And Air Gaps

Oxidative Volumetric Expansion Of Metals And Metal Containing Compo...