Susumu Goto

Person

Utsunomiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged-particle beam lithography apparatus and device manufacturin...
- Patent number 7,960,703
- Issue date Jun 14, 2011
- Canon Kabushiki Kaisha
- Susumu Goto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam application system
- Patent number 7,385,194
- Issue date Jun 10, 2008
- Hitachi High-Technologies Corporation
- Osamu Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus and electron beam processing appar...
- Patent number 7,041,988
- Issue date May 9, 2006
- Advantest Corp.
- Shinichi Hamaguchi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection apparatus for projecting a pattern formed on a mask onto...
- Patent number 7,034,314
- Issue date Apr 25, 2006
- Canon Kabushiki Kaisha
- Susumu Goto
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron beam exposure apparatus, reduction projection system, and...
- Patent number 6,831,260
- Issue date Dec 14, 2004
- Canon Kabushiki Kaisha
- Susumu Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus, electron lens, and device manufac...
- Patent number 6,452,193
- Issue date Sep 17, 2002
- Canon Kabushiki Kaisha
- Susumu Goto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam projection exposure apparatus
- Patent number 6,246,065
- Issue date Jun 12, 2001
- Canon Kabushiki Kaisha
- Susumu Goto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Position detection apparatus, electron beam exposure apparatus, and...
- Patent number 5,929,454
- Issue date Jul 27, 1999
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus and method of controlling same
- Patent number 5,864,142
- Issue date Jan 26, 1999
- Canon Kabushiki Kaisha
- Masato Muraki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Alignment system using an electron beam
- Patent number 4,812,662
- Issue date Mar 14, 1989
- Canon Kabushiki Kaisha
- Susumu Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment device
- Patent number 4,785,187
- Issue date Nov 15, 1988
- Canon Kabushiki Kaisha
- Takao Kariya
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED-PARTICLE BEAM LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURIN...
- Publication number 20090057571
- Publication date Mar 5, 2009
- Canon Kabushiki Kaisha
- Susumu Goto
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam application system
- Publication number 20070023654
- Publication date Feb 1, 2007
- Osamu Kamimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure apparatus and electron beam processing appar...
- Publication number 20030209674
- Publication date Nov 13, 2003
- Advantest Corporation
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
A PROJECTION APPARATUS FOR PROJECTING A PATTERN FORMED ON A MARK ON...
- Publication number 20030168617
- Publication date Sep 11, 2003
- SUSUMU GOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure apparatus, reduction projection system, and...
- Publication number 20020186357
- Publication date Dec 12, 2002
- Canon Kabushiki Kaisha
- Susumu Goto
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM EXPOSURE APPARATUS, ELECTRON LENS, AND DEVICE MANUFAC...
- Publication number 20020047096
- Publication date Apr 25, 2002
- SUSUMU GOTO
- B82 - NANO-TECHNOLOGY

Susumu Goto

Person

Patents Grantslast 30 patents

Charged-particle beam lithography apparatus and device manufacturin...

Charged particle beam application system

Electron beam exposure apparatus and electron beam processing appar...

Projection apparatus for projecting a pattern formed on a mask onto...

Electron beam exposure apparatus, reduction projection system, and...

Electron beam exposure apparatus, electron lens, and device manufac...

Electron beam projection exposure apparatus

Position detection apparatus, electron beam exposure apparatus, and...

Electron beam exposure apparatus and method of controlling same

Alignment system using an electron beam

Alignment device

Patents Applicationslast 30 patents

CHARGED-PARTICLE BEAM LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURIN...

Charged particle beam application system

Electron beam exposure apparatus and electron beam processing appar...

A PROJECTION APPARATUS FOR PROJECTING A PATTERN FORMED ON A MARK ON...

Electron beam exposure apparatus, reduction projection system, and...

ELECTRON BEAM EXPOSURE APPARATUS, ELECTRON LENS, AND DEVICE MANUFAC...