Sven Muehle

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Nitrogen-free ARC layer and a method of manufacturing the same
- Patent number 7,326,646
- Issue date Feb 5, 2008
- Advanced Micro Devices, Inc.
- Hartmut Ruelke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrogen-free ARC/capping layer and method of manufacturing the same
- Patent number 7,314,824
- Issue date Jan 1, 2008
- Advanced Micro Devices, Inc.
- Kai Frohberg
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Nitrogen-free ARC/capping layer and method of manufacturing the same
- Publication number 20060024955
- Publication date Feb 2, 2006
- Kai Frohberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nitrogen-free ARC layer and a method of manufacturing the same
- Publication number 20050208755
- Publication date Sep 22, 2005
- Hartmut Ruelke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY