Swaminathan T. SRINIVASAN

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for epitaxially depositing a material on a substrate by flow...
- Patent number 12,091,749
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-density substrate processing systems and methods
- Patent number 12,074,042
- Issue date Aug 27, 2024
- Applied Materials, Inc.
- Jason M. Schaller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber architecture for epitaxial deposition and advanced epitaxia...
- Patent number 12,060,651
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injector for epitaxy and CVD chamber
- Patent number 12,018,372
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Tetsuya Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicide films through selective deposition
- Patent number 11,978,635
- Issue date May 7, 2024
- Applied Materials, Inc.
- Swaminathan Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,705,335
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-density substrate processing systems and methods
- Patent number 11,574,826
- Issue date Feb 7, 2023
- Applied Materials, Inc.
- Jason M. Schaller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple sequential linear powder dispensers for additive manufactu...
- Patent number 11,446,740
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Christopher A. Rowland
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Conformal high concentration boron doping of semiconductors
- Patent number 11,328,928
- Issue date May 10, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 11,037,825
- Issue date Jun 15, 2021
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicide films through selective deposition
- Patent number 10,950,450
- Issue date Mar 16, 2021
- Applied Materials, Inc.
- Swaminathan Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heater pedestal assembly for wide range temperature control
- Patent number 10,910,238
- Issue date Feb 2, 2021
- Applied Materials, Inc.
- Kaushik Alayavalli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective removal process to create high aspect ratio fully self-al...
- Patent number 10,790,191
- Issue date Sep 29, 2020
- Micromaterials LLC
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicide films through selective deposition
- Patent number 10,607,841
- Issue date Mar 31, 2020
- Applied Materials, Inc.
- Swaminathan Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deployment of light energy within specific spectral bands in specif...
- Patent number 10,373,823
- Issue date Aug 6, 2019
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bottom processing
- Patent number 10,128,197
- Issue date Nov 13, 2018
- Applied Materials, Inc.
- Joseph M. Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multizone control of lamps in a conical lamphead using pyrometers
- Patent number 10,077,508
- Issue date Sep 18, 2018
- Applied Materials, Inc.
- Joseph M. Ranish
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Utilization of angled trench for effective aspect ratio trapping of...
- Patent number 10,026,613
- Issue date Jul 17, 2018
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom processing
- Patent number 10,020,204
- Issue date Jul 10, 2018
- Applied Materials, Inc.
- Joseph M. Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber having separate process gas and purge gas regions
- Patent number 9,870,919
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- Joseph M. Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for impurity layered epitaxy
- Patent number 9,856,580
- Issue date Jan 2, 2018
- Applied Materials, Inc.
- Errol Antonio C. Sanchez
- C30 - CRYSTAL GROWTH
Information Patent Grant
Utilization of angled trench for effective aspect ratio trapping of...
- Patent number 9,799,531
- Issue date Oct 24, 2017
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multizone control of lamps in a conical lamphead using pyrometers
- Patent number 9,580,835
- Issue date Feb 28, 2017
- Applied Materials, Inc.
- Joseph M. Ranish
- C30 - CRYSTAL GROWTH
Information Patent Grant
Atomic layer epitaxy for semiconductor gate stack layer for advance...
- Patent number 9,455,143
- Issue date Sep 27, 2016
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Accelerated relaxation of strain-relaxed epitaxial buffers by use o...
- Patent number 9,443,728
- Issue date Sep 13, 2016
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Utilization of angled trench for effective aspect ratio trapping of...
- Patent number 9,406,507
- Issue date Aug 2, 2016
- Applied Materials, Inc.
- Swaminathan T. Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for forming angled structures for reduced defects in het...
- Patent number 9,287,123
- Issue date Mar 15, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Swaminathan Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multizone control of lamps in a conical lamphead using pyrometers
- Patent number 9,230,837
- Issue date Jan 5, 2016
- Applied Materials, Inc.
- Joseph M. Ranish
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices suitable for narrow pitch applications and me...
- Patent number 8,871,645
- Issue date Oct 28, 2014
- Applied Materials, Inc.
- Udayan Ganguly
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to adjust threshold voltage in semiconductor devices
- Patent number 8,802,522
- Issue date Aug 12, 2014
- Applied Materials, Inc.
- Michael G. Ward
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAS INJECTOR FOR EPITAXY AND CVD CHAMBER
- Publication number 20240337020
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...
- Publication number 20240209544
- Publication date Jun 27, 2024
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-DENSITY SUBSTRATE PROCESSING SYSTEMS AND METHODS
- Publication number 20230170231
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Jason M. Schaller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE LAMP HEATING AND TEMPERATURE MONITORING IN EPITAXY PROCE...
- Publication number 20220367216
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-PORT EXHAUST SYSTEM FOR EPITAXIAL DEPOSITION CHAMBER
- Publication number 20220364229
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...
- Publication number 20220364261
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTOR FOR EPITAXY AND CVD CHAMBER
- Publication number 20220364231
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Tetsuya ISHIKAWA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Conformal High Concentration Boron Doping Of Semiconductors
- Publication number 20220246432
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Srinivas Gandikota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS
- Publication number 20220028710
- Publication date Jan 27, 2022
- Applied Materials, Inc.
- Anantha K. Subramani
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
Silicide Films Through Selective Deposition
- Publication number 20210202256
- Publication date Jul 1, 2021
- Applied Materials, Inc.
- Swaminathan Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-DENSITY SUBSTRATE PROCESSING SYSTEMS AND METHODS
- Publication number 20210013055
- Publication date Jan 14, 2021
- Applied Materials, Inc.
- Jason M. Schaller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF COMPONENTS WITH CHEMICALLY RESISTANT SURFACES
- Publication number 20200385866
- Publication date Dec 10, 2020
- Applied Materials, Inc.
- Swaminathan Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Removal Process To Create High Aspect Ratio Fully Self-Al...
- Publication number 20200388535
- Publication date Dec 10, 2020
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICIDE FILMS THROUGH SELECTIVE DEPOSITION
- Publication number 20200227265
- Publication date Jul 16, 2020
- Applied Materials, Inc.
- Swaminathan Srinivasan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONDITIONING OF A PROCESSING CHAMBER
- Publication number 20200115795
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL HIGH CONCENTRATION BORON DOPING OF SEMICONDUCTORS
- Publication number 20190385851
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- SRINIVAS GANDIKOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Increasing The Verticality Of Pillars
- Publication number 20190355621
- Publication date Nov 21, 2019
- Micromaterials LLC.
- Christophe Marcadal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Removal Process To Create High Aspect Ratio Fully Self-Al...
- Publication number 20190348322
- Publication date Nov 14, 2019
- Micromaterials LLC.
- Amrita B. Mullick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicide Films Through Selective Deposition
- Publication number 20190189453
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Swaminathan Srinivasan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPLOYMENT OF LIGHT ENERGY WITHIN SPECIFIC SPECTRAL BANDS IN SPECIF...
- Publication number 20180350595
- Publication date Dec 6, 2018
- Applied Materials, Inc.
- Swaminathan T. SRINIVASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINEAR POWDER DISPENSER THAT RASTER SCANS FOR ADDITIVE MANUFACTURING
- Publication number 20180221949
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Christopher A. Rowland
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
MULTIPLE SEQUENTIAL LINEAR POWDER DISPENSERS FOR ADDITIVE MANUFACTU...
- Publication number 20180221948
- Publication date Aug 9, 2018
- Applied Materials, Inc.
- Christopher A. Rowland
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
EPITAXIAL CHAMBER WITH CUSTOMIZABLE FLOW INJECTION
- Publication number 20180209043
- Publication date Jul 26, 2018
- SHU-KWAN LAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS CHAMBER HAVING SEPARATE PROCESS GAS AND PURGE GAS REGIONS
- Publication number 20180138031
- Publication date May 17, 2018
- Applied Materials, Inc.
- Joseph M. RANISH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PEDESTAL ASSEMBLY FOR WIDE RANGE TEMPERATURE CONTROL
- Publication number 20180082866
- Publication date Mar 22, 2018
- Applied Materials, Inc.
- Kaushik ALAYAVALLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDEPENDENTLY CONTROLLABLE POWDER DELIVERY FOR ADDITIVE MANUFACTURING
- Publication number 20180065178
- Publication date Mar 8, 2018
- Applied Materials, Inc.
- Christopher A. Rowland
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...
- Publication number 20170330750
- Publication date Nov 16, 2017
- Applied Materials, Inc.
- Swaminathan T. SRINIVASAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM PROCESSING
- Publication number 20170263466
- Publication date Sep 14, 2017
- Applied Materials, Inc.
- Joseph M. RANISH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYERWISE HEATING, LINEWISE HEATING, PLASMA HEATING AND MULTIPLE FE...
- Publication number 20170203363
- Publication date Jul 20, 2017
- APPLIED MATERIALS ,INC.
- Christopher A. Rowland
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
ADDITIVE MANUFACTURING WITH LASER AND PLASMA
- Publication number 20170203364
- Publication date Jul 20, 2017
- Applied Materials, Inc.
- Kartik Ramaswamy
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY

Swaminathan T. SRINIVASAN

Person

Patents Grantslast 30 patents

Method for epitaxially depositing a material on a substrate by flow...

High-density substrate processing systems and methods

Chamber architecture for epitaxial deposition and advanced epitaxia...

Gas injector for epitaxy and CVD chamber

Silicide films through selective deposition

Conformal high concentration boron doping of semiconductors

High-density substrate processing systems and methods

Multiple sequential linear powder dispensers for additive manufactu...

Conformal high concentration boron doping of semiconductors

Selective removal process to create high aspect ratio fully self-al...

Silicide films through selective deposition

Heater pedestal assembly for wide range temperature control

Selective removal process to create high aspect ratio fully self-al...

Silicide films through selective deposition

Deployment of light energy within specific spectral bands in specif...

Bottom processing

Multizone control of lamps in a conical lamphead using pyrometers

Utilization of angled trench for effective aspect ratio trapping of...

Bottom processing

Process chamber having separate process gas and purge gas regions

Apparatus for impurity layered epitaxy

Utilization of angled trench for effective aspect ratio trapping of...

Multizone control of lamps in a conical lamphead using pyrometers

Atomic layer epitaxy for semiconductor gate stack layer for advance...

Accelerated relaxation of strain-relaxed epitaxial buffers by use o...

Utilization of angled trench for effective aspect ratio trapping of...

Techniques for forming angled structures for reduced defects in het...

Multizone control of lamps in a conical lamphead using pyrometers

Semiconductor devices suitable for narrow pitch applications and me...

Methods to adjust threshold voltage in semiconductor devices

Patents Applicationslast 30 patents

GAS INJECTOR FOR EPITAXY AND CVD CHAMBER

CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...

HIGH-DENSITY SUBSTRATE PROCESSING SYSTEMS AND METHODS

MULTI-ZONE LAMP HEATING AND TEMPERATURE MONITORING IN EPITAXY PROCE...

MULTI-PORT EXHAUST SYSTEM FOR EPITAXIAL DEPOSITION CHAMBER

CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIA...

GAS INJECTOR FOR EPITAXY AND CVD CHAMBER

Conformal High Concentration Boron Doping Of Semiconductors

DISTRIBUTION COMPONENTS FOR SEMICONDUCTOR PROCESSING SYSTEMS

Silicide Films Through Selective Deposition

HIGH-DENSITY SUBSTRATE PROCESSING SYSTEMS AND METHODS

RF COMPONENTS WITH CHEMICALLY RESISTANT SURFACES

Selective Removal Process To Create High Aspect Ratio Fully Self-Al...

SILICIDE FILMS THROUGH SELECTIVE DEPOSITION

CONDITIONING OF A PROCESSING CHAMBER

CONFORMAL HIGH CONCENTRATION BORON DOPING OF SEMICONDUCTORS

Method For Increasing The Verticality Of Pillars

Selective Removal Process To Create High Aspect Ratio Fully Self-Al...

Silicide Films Through Selective Deposition

DEPLOYMENT OF LIGHT ENERGY WITHIN SPECIFIC SPECTRAL BANDS IN SPECIF...

LINEAR POWDER DISPENSER THAT RASTER SCANS FOR ADDITIVE MANUFACTURING

MULTIPLE SEQUENTIAL LINEAR POWDER DISPENSERS FOR ADDITIVE MANUFACTU...

EPITAXIAL CHAMBER WITH CUSTOMIZABLE FLOW INJECTION

PROCESS CHAMBER HAVING SEPARATE PROCESS GAS AND PURGE GAS REGIONS

HEATER PEDESTAL ASSEMBLY FOR WIDE RANGE TEMPERATURE CONTROL

INDEPENDENTLY CONTROLLABLE POWDER DELIVERY FOR ADDITIVE MANUFACTURING

UTILIZATION OF ANGLED TRENCH FOR EFFECTIVE ASPECT RATIO TRAPPING OF...

BOTTOM PROCESSING

LAYERWISE HEATING, LINEWISE HEATING, PLASMA HEATING AND MULTIPLE FE...

ADDITIVE MANUFACTURING WITH LASER AND PLASMA