Syogo Matsumaru

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer compound, photoresist composition containing such polymer c...
- Patent number 8,741,538
- Issue date Jun 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, photoresist composition including the polymer com...
- Patent number 7,807,328
- Issue date Oct 5, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, positive resist composition and method for forming resist...
- Patent number 7,763,412
- Issue date Jul 27, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, photoresist composition including the polymer com...
- Patent number 7,723,007
- Issue date May 25, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, photoresist composition containing such polymer c...
- Patent number 7,700,259
- Issue date Apr 20, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 7,682,770
- Issue date Mar 23, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition, and low-molecular compound and high-molecu...
- Patent number 7,592,122
- Issue date Sep 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER C...
- Publication number 20100151383
- Publication date Jun 17, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive Resist Composition For Immersion Exposure and Method of Fo...
- Publication number 20080193871
- Publication date Aug 14, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer Compound, Photoresist Composition Including the Polymer Com...
- Publication number 20080166655
- Publication date Jul 10, 2008
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, Positive Resist Composition and Method for Forming Resist...
- Publication number 20080063975
- Publication date Mar 13, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Composition and Method for Forming Resist Pattern
- Publication number 20070275307
- Publication date Nov 29, 2007
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer Compound, Photoresist Composition Containing Such Polymer C...
- Publication number 20070224520
- Publication date Sep 27, 2007
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer compound, photoresist composition including the polymer com...
- Publication number 20070172757
- Publication date Jul 26, 2007
- Toshiyuki Ogata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist composition and, used in the photoresist composition, l...
- Publication number 20060210913
- Publication date Sep 21, 2006
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY

Syogo Matsumaru

Person

Patents Grantslast 30 patents

Polymer compound, photoresist composition containing such polymer c...

Polymer compound, photoresist composition including the polymer com...

Polymer, positive resist composition and method for forming resist...

Polymer compound, photoresist composition including the polymer com...

Polymer compound, photoresist composition containing such polymer c...

Resist composition and method for forming resist pattern

Photoresist composition, and low-molecular compound and high-molecu...

Patents Applicationslast 30 patents

POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER C...

Positive Resist Composition For Immersion Exposure and Method of Fo...

Polymer Compound, Photoresist Composition Including the Polymer Com...

Polymer, Positive Resist Composition and Method for Forming Resist...

Resist Composition and Method for Forming Resist Pattern

Polymer Compound, Photoresist Composition Containing Such Polymer C...

Polymer compound, photoresist composition including the polymer com...

Photoresist composition and, used in the photoresist composition, l...