T. Todd Crkvenac

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Hockessin, DE, US

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Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,569,268
- Issue date Aug 4, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having a pressure relief channel
- Patent number 7,252,871
- Issue date Aug 7, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Grant
Porous polyurethane polishing pads
- Patent number 6,899,602
- Issue date May 31, 2005
- Rohm and Haas Electronic Materials CMP Holdings, NC
- Clyde A. Fawcett
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method for reducing slurry reflux
- Patent number 6,843,709
- Issue date Jan 18, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- T. Todd Crkvenac
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Chemical mechanical polishing pad
- Publication number 20100035529
- Publication date Feb 11, 2010
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20080182492
- Publication date Jul 31, 2008
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad having a pressure relief channel
- Publication number 20050281983
- Publication date Dec 22, 2005
- T. Todd Crkvenac
- B24 - GRINDING POLISHING
Information Patent Application
Porous polyurethane polishing pads
- Publication number 20050026552
- Publication date Feb 3, 2005
- Clyde A. Fawcett
- B24 - GRINDING POLISHING