Tadahiro Kimura

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Slurry, polishing fluid set, polishing fluid, and substrate polishi...
- Patent number 10,703,947
- Issue date Jul 7, 2020
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, polishing fluid set, polishing fluid, and substrate polishi...
- Patent number 9,982,177
- Issue date May 29, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing solution for CMP and polishing method using the polishing...
- Patent number 9,022,834
- Issue date May 5, 2015
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing slurry for CMP, and polishing method
- Patent number 8,778,217
- Issue date Jul 15, 2014
- Hitachi Chemical Company, Ltd.
- Tadahiro Kimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...
- Publication number 20180251664
- Publication date Sep 6, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro IWANO
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SLURRY FOR CMP AND POLISHING METHOD
- Publication number 20170267895
- Publication date Sep 21, 2017
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SLURRY FOR CMP AND POLISHING METHOD
- Publication number 20150315419
- Publication date Nov 5, 2015
- Hitachi Chemical Company, Ltd.
- Takashi Shinoda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SLURRY FOR CMP AND POLISHING METHOD
- Publication number 20140065825
- Publication date Mar 6, 2014
- HITACHI CHEMICAL CO., Ltd.
- Takashi Shinoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...
- Publication number 20120322346
- Publication date Dec 20, 2012
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...
- Publication number 20110275285
- Publication date Nov 10, 2011
- Hitachi Chemical Company, Ltd.
- Eiichi Satou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND...
- Publication number 20100015806
- Publication date Jan 21, 2010
- Masato Fukasawa
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING SLURRY FOR CMP
- Publication number 20090283715
- Publication date Nov 19, 2009
- Shigeru Nobe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING SLURRY FOR CMP, AND POLISHING METHOD
- Publication number 20090209104
- Publication date Aug 20, 2009
- Tadahiro Kimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polishing slurry for CMP and polishing method
- Publication number 20070117394
- Publication date May 24, 2007
- HITACHI CHEMICAL CO., Ltd.
- Takashi Shinoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Tadahiro Kimura

Person

Patents Grantslast 30 patents

Slurry, polishing fluid set, polishing fluid, and substrate polishi...

Slurry, polishing fluid set, polishing fluid, and substrate polishi...

Polishing solution for CMP and polishing method using the polishing...

Polishing slurry for CMP, and polishing method

Patents Applicationslast 30 patents

SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...

POLISHING SLURRY FOR CMP AND POLISHING METHOD

POLISHING SLURRY FOR CMP AND POLISHING METHOD

POLISHING SLURRY FOR CMP AND POLISHING METHOD

SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...

POLISHING SOLUTION FOR CMP AND POLISHING METHOD USING THE POLISHING...

CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND...

POLISHING SLURRY FOR CMP

POLISHING SLURRY FOR CMP, AND POLISHING METHOD

Polishing slurry for CMP and polishing method