Tadahito Fujisawa

Person

Yokkaichi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure control apparatus, manufacturing method of semiconductor d...
- Patent number 8,373,845
- Issue date Feb 12, 2013
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle set, method for designing a reticle set, exposure monitorin...
- Patent number 7,855,047
- Issue date Dec 21, 2010
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask, exposure method using the same, and method of generatin...
- Patent number 7,794,899
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device, method for making pattern layout, method for...
- Patent number 7,716,617
- Issue date May 11, 2010
- Kabushiki Kaisha Tosbhia
- Hiromitsu Mashita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor memory device
- Patent number 7,700,997
- Issue date Apr 20, 2010
- Kabushiki Kaisha Toshiba
- Takuya Futatsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern layout for forming integrated circuit
- Patent number 7,682,757
- Issue date Mar 23, 2010
- Kabushiki Kaisha Toshiba
- Hiromitsu Mashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern creation method, mask manufacturing method and semiconducto...
- Patent number 7,669,172
- Issue date Feb 23, 2010
- Kabushiki Kaisha Toshiba
- Takeshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask, exposure method using the same, and method of generatin...
- Patent number 7,662,523
- Issue date Feb 16, 2010
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle set, method for designing a reticle set, exposure monitorin...
- Patent number 7,655,369
- Issue date Feb 2, 2010
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask quality estimation system and method for use in manufactu...
- Patent number 7,636,910
- Issue date Dec 22, 2009
- Kabushiki Kaisha Toshiba
- Yukiyasu Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern data generating method, photo mask manufacturing metho...
- Patent number 7,585,597
- Issue date Sep 8, 2009
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature calibration method for baking processing apparatus, adj...
- Patent number 7,510,341
- Issue date Mar 31, 2009
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer flatness evaluation method, wafer flatness evaluation apparat...
- Patent number 7,474,386
- Issue date Jan 6, 2009
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G01 - MEASURING TESTING
Information Patent Grant
Mask pattern data forming method, photomask and method of manufactu...
- Patent number 7,426,711
- Issue date Sep 16, 2008
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control method and method of manufacturing a semiconductor...
- Patent number 7,396,621
- Issue date Jul 8, 2008
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo mask, exposure method using the same, and method of generatin...
- Patent number 7,384,712
- Issue date Jun 10, 2008
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for evaluating sensitivity of photoresist, method for prepar...
- Patent number 7,368,209
- Issue date May 6, 2008
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer flatness evaluation method, wafer flatness evaluation apparat...
- Patent number 7,365,830
- Issue date Apr 29, 2008
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G01 - MEASURING TESTING
Information Patent Grant
Focus monitor method and mask
- Patent number 7,250,235
- Issue date Jul 31, 2007
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer flatness evaluation method, wafer flatness evaluation apparat...
- Patent number 7,230,680
- Issue date Jun 12, 2007
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G01 - MEASURING TESTING
Information Patent Grant
Reticle set, method for designing a reticle set, exposure monitorin...
- Patent number 7,175,943
- Issue date Feb 13, 2007
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask having a focus monitor pattern
- Patent number 7,108,945
- Issue date Sep 19, 2006
- Kabushiki Kaisha Toshiba
- Takumichi Sutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dose monitoring method and manufacturing method of semiconductor de...
- Patent number 6,919,153
- Issue date Jul 19, 2005
- Kabushiki Kaisaha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and apparatus
- Patent number 6,813,001
- Issue date Nov 2, 2004
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method, exposure system and recording medium
- Patent number 6,741,334
- Issue date May 25, 2004
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus monitoring method, exposure apparatus, and exposure mask
- Patent number 6,701,512
- Issue date Mar 2, 2004
- Kabushiki Kaisha Toshiba
- Takumichi Sutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,667,139
- Issue date Dec 23, 2003
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for focus monitoring
- Patent number 6,440,616
- Issue date Aug 27, 2002
- Kabushiki Kaisha Toshiba
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control method for exposure apparatus and control method for semico...
- Patent number 6,376,139
- Issue date Apr 23, 2002
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of examining an exposure tool
- Patent number 6,317,198
- Issue date Nov 13, 2001
- Kabushiki Kaisha Toshiba
- Kazuya Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
TEMPLATE MANUFACTURING METHOD AND MANUFACTURING METHOD OF SEMICONDU...
- Publication number 20160064214
- Publication date Mar 3, 2016
- KABUSHIKI KAISHA TOSHIBA
- Tadahito FUJISAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN DETERMINING METHOD
- Publication number 20110047518
- Publication date Feb 24, 2011
- Issui Aiba
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE CONTROL APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR D...
- Publication number 20110043776
- Publication date Feb 24, 2011
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device, method for making pattern layout, method for...
- Publication number 20100193960
- Publication date Aug 5, 2010
- Kabushiki Kaisha Toshiba
- Hiromitsu Mashita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Reticle set, method for designing a reticle set, exposure monitorin...
- Publication number 20100112485
- Publication date May 6, 2010
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask quality estimation system and method for use in manufactu...
- Publication number 20100112812
- Publication date May 6, 2010
- Kabushiki Kaisha Toshiba
- Yukiyasu Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20080303115
- Publication date Dec 11, 2008
- Kabushiki Kaisha Toshiba
- Shoichi MIYAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN CREATION METHOD, MASK MANUFACTURING METHOD AND SEMICONDUCTO...
- Publication number 20080235650
- Publication date Sep 25, 2008
- Takeshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO MASK, EXPOSURE METHOD USING THE SAME, AND METHOD OF GENERATIN...
- Publication number 20080220377
- Publication date Sep 11, 2008
- Kabushiki Kaisha Toshiba
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MAKING COATING FILM
- Publication number 20080131599
- Publication date Jun 5, 2008
- Kabushiki Kaisha Toshiba
- Yasuhiko Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGNING APPARATUS, PHOTOMASK, PHOTOMASK DESIGNING METHO...
- Publication number 20080014510
- Publication date Jan 17, 2008
- Kabushiki Kaisha Toshiba
- Tadahito FUJISAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, exposure control method and method of manufacturing a se...
- Publication number 20070259280
- Publication date Nov 8, 2007
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask pattern data forming method, photomask and method of manufactu...
- Publication number 20070195295
- Publication date Aug 23, 2007
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer flatness evaluation method, wafer flatness evaluation apparat...
- Publication number 20070177126
- Publication date Aug 2, 2007
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G01 - MEASURING TESTING
Information Patent Application
Wafer flatness evaluation method, wafer flatness evaluation apparat...
- Publication number 20070177127
- Publication date Aug 2, 2007
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G01 - MEASURING TESTING
Information Patent Application
Reticle set, method for designing a reticle set, exposure monitorin...
- Publication number 20070105028
- Publication date May 10, 2007
- Kabushiki Kaisha Toshiba
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask quality estimation system and method for use in manufactu...
- Publication number 20070005280
- Publication date Jan 4, 2007
- Yukiyasu Arisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern layout for forming integrated circuit
- Publication number 20060228636
- Publication date Oct 12, 2006
- Hiromitsu Mashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor memory device
- Publication number 20060197136
- Publication date Sep 7, 2006
- KABUSHIKI KAISHA TOSHIBA
- Takuya Futatsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, method for making pattern layout, method for...
- Publication number 20060157833
- Publication date Jul 20, 2006
- Hiromitsu Mashita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask pattern data generating method, photo mask manufacturing metho...
- Publication number 20060093926
- Publication date May 4, 2006
- Kabushiki Kaisha Toshiba
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern and method for manufacturing semiconduct...
- Publication number 20050123858
- Publication date Jun 9, 2005
- Takeshi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, exposure control method and method of manufacturing a se...
- Publication number 20050030502
- Publication date Feb 10, 2005
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Temperature calibration method for baking processing apparatus, adj...
- Publication number 20050008979
- Publication date Jan 13, 2005
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo mask, exposure method using the same, and method of generatin...
- Publication number 20050003305
- Publication date Jan 6, 2005
- Koji Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for evaluating sensitivity of photoresist, method for prepar...
- Publication number 20040265713
- Publication date Dec 30, 2004
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Focus monitor method and mask
- Publication number 20040224242
- Publication date Nov 11, 2004
- Kyoko Izuha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle set, method for designing a reticle set, exposure monitorin...
- Publication number 20040219439
- Publication date Nov 4, 2004
- Masafumi Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer flatness evaluation method, wafer flatness evaluation apparat...
- Publication number 20040185662
- Publication date Sep 23, 2004
- Tadahito Fujisawa
- G01 - MEASURING TESTING
Information Patent Application
Dose monitoring method and manufacturing method of semiconductor de...
- Publication number 20040058256
- Publication date Mar 25, 2004
- Tadahito Fujisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tadahito Fujisawa

Person

Patents Grantslast 30 patents

Exposure control apparatus, manufacturing method of semiconductor d...

Reticle set, method for designing a reticle set, exposure monitorin...

Photo mask, exposure method using the same, and method of generatin...

Semiconductor device, method for making pattern layout, method for...

Semiconductor memory device

Pattern layout for forming integrated circuit

Pattern creation method, mask manufacturing method and semiconducto...

Photo mask, exposure method using the same, and method of generatin...

Reticle set, method for designing a reticle set, exposure monitorin...

Photomask quality estimation system and method for use in manufactu...

Mask pattern data generating method, photo mask manufacturing metho...

Temperature calibration method for baking processing apparatus, adj...

Wafer flatness evaluation method, wafer flatness evaluation apparat...

Mask pattern data forming method, photomask and method of manufactu...

Exposure control method and method of manufacturing a semiconductor...

Photo mask, exposure method using the same, and method of generatin...

Method for evaluating sensitivity of photoresist, method for prepar...

Wafer flatness evaluation method, wafer flatness evaluation apparat...

Focus monitor method and mask

Wafer flatness evaluation method, wafer flatness evaluation apparat...

Reticle set, method for designing a reticle set, exposure monitorin...

Photomask having a focus monitor pattern

Dose monitoring method and manufacturing method of semiconductor de...

Exposure method and apparatus

Exposure method, exposure system and recording medium

Focus monitoring method, exposure apparatus, and exposure mask

Method of manufacturing semiconductor device

Mask and method for focus monitoring

Control method for exposure apparatus and control method for semico...

Method of examining an exposure tool

Patents Applicationslast 30 patents

TEMPLATE MANUFACTURING METHOD AND MANUFACTURING METHOD OF SEMICONDU...

PATTERN DETERMINING METHOD

EXPOSURE CONTROL APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR D...

Semiconductor device, method for making pattern layout, method for...

Reticle set, method for designing a reticle set, exposure monitorin...

Photomask quality estimation system and method for use in manufactu...

SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FABRICATING THE SAME

PATTERN CREATION METHOD, MASK MANUFACTURING METHOD AND SEMICONDUCTO...

PHOTO MASK, EXPOSURE METHOD USING THE SAME, AND METHOD OF GENERATIN...

METHOD AND APPARATUS FOR MAKING COATING FILM

PHOTOMASK DESIGNING APPARATUS, PHOTOMASK, PHOTOMASK DESIGNING METHO...

Photomask, exposure control method and method of manufacturing a se...

Mask pattern data forming method, photomask and method of manufactu...

Wafer flatness evaluation method, wafer flatness evaluation apparat...

Wafer flatness evaluation method, wafer flatness evaluation apparat...

Reticle set, method for designing a reticle set, exposure monitorin...

Photomask quality estimation system and method for use in manufactu...

Pattern layout for forming integrated circuit

Semiconductor memory device

Semiconductor device, method for making pattern layout, method for...

Mask pattern data generating method, photo mask manufacturing metho...

Method for forming pattern and method for manufacturing semiconduct...

Photomask, exposure control method and method of manufacturing a se...

Temperature calibration method for baking processing apparatus, adj...

Photo mask, exposure method using the same, and method of generatin...

Method for evaluating sensitivity of photoresist, method for prepar...

Focus monitor method and mask

Reticle set, method for designing a reticle set, exposure monitorin...

Wafer flatness evaluation method, wafer flatness evaluation apparat...

Dose monitoring method and manufacturing method of semiconductor de...