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Tadamitsu Kanekiyo

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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing method and plasma ashing apparatus
    • Patent number 11,456,183
    • Issue date Sep 27, 2022
    • HITACHI HIGH-TECH CORPORATION
    • Toru Ito
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 9,038,567
    • Issue date May 26, 2015
    • Hitachi High-Technologies Corporation
    • Hiroyuki Kobayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing method
    • Patent number 8,801,951
    • Issue date Aug 12, 2014
    • Hitachi High-Technologies Corporation
    • Yoshiharu Inoue
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus and method
    • Patent number 8,795,467
    • Issue date Aug 5, 2014
    • Hitachi High-Technologies Corporation
    • Ryoji Nishio
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 8,733,282
    • Issue date May 27, 2014
    • Hitachi High-Technologies Corporation
    • Hiroyuki Kobayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method and apparatus for plasma processing
    • Patent number 8,632,637
    • Issue date Jan 21, 2014
    • Hitachi High-Technologies Corporation
    • Ryoji Nishio
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 8,397,668
    • Issue date Mar 19, 2013
    • Hitachi High-Technologies Corporation
    • Hiroyuki Kobayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method and apparatus for plasma processing
    • Patent number 8,366,870
    • Issue date Feb 5, 2013
    • Hitachi High-Technologies Corporation
    • Ryoji Nishio
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Grant

    Plasma processing method and plasma processing device
    • Patent number 8,163,652
    • Issue date Apr 24, 2012
    • Hitachi High-Technologies Corporation
    • Kenji Maeda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus and method
    • Patent number 8,062,473
    • Issue date Nov 22, 2011
    • Hitachi High-Technologies Corporation
    • Ryoji Nishio
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Method and apparatus for plasma processing
    • Patent number 8,057,634
    • Issue date Nov 15, 2011
    • Hitachi High-Technologies Corporation
    • Ryoji Nishio
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Grant

    Vacuum processing apparatus and vacuum processing method of sample
    • Patent number 7,947,189
    • Issue date May 24, 2011
    • Hitachi High-Technologies Corporation
    • Tooru Aramaki
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing method
    • Patent number 7,833,429
    • Issue date Nov 16, 2010
    • Hitachi High-Technologies Corporation
    • Ryoji Nishio
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus and method
    • Patent number 7,740,739
    • Issue date Jun 22, 2010
    • Hitachi High-Technologies Corporation
    • Ryoji Nishio
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus
    • Patent number 7,662,232
    • Issue date Feb 16, 2010
    • Hitachi, Ltd.
    • Hiroyuki Kobayashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing apparatus capable of controlling plasma emission...
    • Patent number 7,658,815
    • Issue date Feb 9, 2010
    • Hitachi High-Technologies Corporation
    • Kenji Maeda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method and plasma processing device
    • Patent number 7,435,687
    • Issue date Oct 14, 2008
    • Hitachi High-Technologies Corporation
    • Kenji Maeda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 6,914,207
    • Issue date Jul 5, 2005
    • Hitachi High-Technologies Corporation
    • Tadayoshi Kawaguchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    High-frequency power supply apparatus for plasma generation apparatus
    • Patent number 6,586,887
    • Issue date Jul 1, 2003
    • Hitachi High-Technologies Corporation
    • Yasuo Oogoshi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method and apparatus for plasma processing
    • Patent number 6,156,663
    • Issue date Dec 5, 2000
    • Hitachi, Ltd.
    • Katsuya Watanabe
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Plasma processing method and apparatus
    • Patent number 5,961,850
    • Issue date Oct 5, 1999
    • Hitachi, Ltd.
    • Yoshiaki Satou
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry etching method
    • Patent number 5,320,707
    • Issue date Jun 14, 1994
    • Hitachi, Ltd.
    • Tadamitsu Kanekiyo
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents