Tadamitsu NAKAMURA

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Hitachi-shi, lbaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive-type photosensitive resin composition
- Patent number 11,592,743
- Issue date Feb 28, 2023
- HD MICROSYSTEMS, LTD.
- Tadamitsu Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photosensitive resin composition
- Patent number 11,592,744
- Issue date Feb 28, 2023
- HD MICROSYSTEMS, LTD.
- Daisaku Matsukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, cured product of same, interlayer...
- Patent number 11,021,572
- Issue date Jun 1, 2021
- HD MICROSYSTEMS, LTD.
- Ayaka Azuma
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF SAME, INTERLAYER...
- Publication number 20190161580
- Publication date May 30, 2019
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Ayaka AZUMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...