Tadashi Kimura

Person

Yawata, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Deposition method by physical vapor deposition and target for depos...
- Patent number 8,419,911
- Issue date Apr 16, 2013
- Panasonic Corporation
- Hideki Yamashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,604,849
- Issue date Oct 20, 2009
- Panasonic Corporation
- Yoichiro Yashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,157,659
- Issue date Jan 2, 2007
- Matsushita Electric Industrial Co., Ltd.
- Yoichiro Yashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atmospheric pressure plasma processing method and apparatus
- Patent number 7,056,416
- Issue date Jun 6, 2006
- Matsushita Electric Industrial Co., Ltd.
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Thin film magnetic head
- Patent number 6,493,194
- Issue date Dec 10, 2002
- Matsushita Electric Industrial Co., Ltd.
- Masaya Sakaguchi
- G11 - INFORMATION STORAGE
Information Patent Grant
Thin film device and method for manufacturing thin film device
- Patent number 6,407,004
- Issue date Jun 18, 2002
- Matsushita Electric Industrial Co., Ltd.
- Tadashi Kimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method for metallic stamper and metallic stamper and,...
- Patent number 6,352,656
- Issue date Mar 5, 2002
- Matsushita Electric Industrial Co., Ltd.
- Tadashi Kimura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Microwave plasma torch having discretely positioned gas injection h...
- Patent number 5,734,143
- Issue date Mar 31, 1998
- Matsushita Electric Industrial Co., Ltd.
- Toru Kawase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus and processing method using t...
- Patent number 5,611,864
- Issue date Mar 18, 1997
- Matsushita Electric Industrial Co., Ltd.
- Tadashi Kimura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dry etching process utilizing a recessed electrode
- Patent number 5,443,689
- Issue date Aug 22, 1995
- Matsushita Electric Industrial Co., Ltd.
- Tadashi Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,318,668
- Issue date Jun 7, 1994
- Matsushita Electric Industrial Co., Ltd.
- Tokuhiko Tamaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a film capacitor
- Patent number 5,069,746
- Issue date Dec 3, 1991
- Matsushita Electric Industrial Co., Ltd.
- Tadashi Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film capacitor and method of making the same
- Patent number 5,043,843
- Issue date Aug 27, 1991
- Matsushita Electric Industrial Co., Ltd.
- Tadashi Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film capacitor, method of and apparatus for manufacturing the same
- Patent number 4,959,748
- Issue date Sep 25, 1990
- Matsushita Electric Industrial Co., Ltd.
- Tadashi Kimura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Display Panel and Method for Manufacturing Same
- Publication number 20090096375
- Publication date Apr 16, 2009
- Hideki Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20070075039
- Publication date Apr 5, 2007
- Yoichiro Yashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition method by physical vapor deposition and target for depos...
- Publication number 20060272936
- Publication date Dec 7, 2006
- Hideki Yamashita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and apparatus
- Publication number 20050279458
- Publication date Dec 22, 2005
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma processing method and apparatus
- Publication number 20040096581
- Publication date May 20, 2004
- Yoichiro Yashiro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20040075396
- Publication date Apr 22, 2004
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Tadashi Kimura

Person

Patents Grantslast 30 patents

Deposition method by physical vapor deposition and target for depos...

Plasma processing method and apparatus

Plasma processing method and apparatus

Atmospheric pressure plasma processing method and apparatus

Thin film magnetic head

Thin film device and method for manufacturing thin film device

Manufacturing method for metallic stamper and metallic stamper and,...

Microwave plasma torch having discretely positioned gas injection h...

Microwave plasma processing apparatus and processing method using t...

Dry etching process utilizing a recessed electrode

Dry etching method

Method for manufacturing a film capacitor

Film capacitor and method of making the same

Film capacitor, method of and apparatus for manufacturing the same

Patents Applicationslast 30 patents

Plasma Display Panel and Method for Manufacturing Same

Plasma processing method and apparatus

Deposition method by physical vapor deposition and target for depos...

Plasma processing method and apparatus

Plasma processing method and apparatus

Plasma processing method and apparatus