TREA

Tadashi Saga

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  • Tokyo, JP
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PHOTOMASK BLANK AND PHOTOMASK MAKING METHOD
    • Publication number 20100261099
    • Publication date Oct 14, 2010
    • Hiroki Yoshikawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PHOTOMASK BLANK AND PHOTOMASK
    • Publication number 20100261100
    • Publication date Oct 14, 2010
    • Hiroki YOSHIKAWA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTOMASK BLANK AND PHOTOMASK
    • Publication number 20100261101
    • Publication date Oct 14, 2010
    • Hiroki YOSHIKAWA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTOMASK BLANK AND PHOTOMASK
    • Publication number 20100143831
    • Publication date Jun 10, 2010
    • Hiroki Yoshikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK
    • Publication number 20090057143
    • Publication date Mar 5, 2009
    • Hiroki YOSHIKAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Photomask Blank and Photomask
    • Publication number 20080063950
    • Publication date Mar 13, 2008
    • Hiroki Yoshikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photomask Blank, Photomask and Method for Producing Those
    • Publication number 20070259276
    • Publication date Nov 8, 2007
    • Hiroki Yoshikawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Photomask blank
    • Publication number 20070248897
    • Publication date Oct 25, 2007
    • Shin-Etsu Chemical Co., Ltd. & Toppan Printing Co. , Ltd.
    • Hiroki Yoshikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photomask blank and photomask
    • Publication number 20070212618
    • Publication date Sep 13, 2007
    • Shin-Etsu Chemical Co., Ltd.
    • Hiroki Yoshikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photomask blank and photomask making method
    • Publication number 20070212619
    • Publication date Sep 13, 2007
    • Shin-Etsu Chemical Co., Ltd.
    • Hiroki YOSHIKAWA
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Photomask blank, photomask and fabrication method thereof
    • Publication number 20070020534
    • Publication date Jan 25, 2007
    • Hiroki Yoshikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Halftone phase shift mask blank, halftone phase shift mask, and pat...
    • Publication number 20050244722
    • Publication date Nov 3, 2005
    • Shin-Etsu Chemical Co., Ltd.
    • Kimihiro Okada
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Film-depositing target and preparation of phase shift mask blank
    • Publication number 20050217988
    • Publication date Oct 6, 2005
    • Shin-Etsu Chemical Co., Ltd.
    • Hiroki Yoshikawa
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    Phase shift mask blank, phase shift mask, and pattern transfer method
    • Publication number 20050112477
    • Publication date May 26, 2005
    • Shin-Etsu Chemical Co., Ltd.
    • Hiroki Yoshikawa
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY