Tadateru Yatsuo

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Negative resist composition, resist film using same, pattern formin...
- Patent number 10,007,180
- Issue date Jun 26, 2018
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification resist composition, resist film using the co...
- Patent number 9,625,813
- Issue date Apr 18, 2017
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition and pattern forming method using the same
- Patent number 9,034,560
- Issue date May 19, 2015
- FUJIFILM Corporation
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist pattern forming method, resist pattern, crosslinkable negati...
- Patent number 8,889,339
- Issue date Nov 18, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical amplification resist composition, and resist film, resist-...
- Patent number 8,778,593
- Issue date Jul 15, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,735,048
- Issue date May 27, 2014
- FUJIFILM Corporation
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist pattern forming method, developer and negative chem...
- Patent number 8,637,222
- Issue date Jan 28, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE RESIST COMPOSITION, RESIST FILM USING SAME, PATTERN FORMIN...
- Publication number 20150309408
- Publication date Oct 29, 2015
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20140227642
- Publication date Aug 14, 2014
- FUJIFILM CORPORATION
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...
- Publication number 20140030640
- Publication date Jan 30, 2014
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE CO...
- Publication number 20130302726
- Publication date Nov 14, 2013
- Tomotaka TSUCHIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-...
- Publication number 20130029254
- Publication date Jan 31, 2013
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20120301817
- Publication date Nov 29, 2012
- FUJIFILM CORPORATION
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120003585
- Publication date Jan 5, 2012
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEM...
- Publication number 20110287234
- Publication date Nov 24, 2011
- FUJIFILM CORPORATION
- Toru Tsuchihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080241745
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Tadateru Yatsuo

Person

Patents Grantslast 30 patents

Negative resist composition, resist film using same, pattern formin...

Chemical amplification resist composition, resist film using the co...

Negative resist composition and pattern forming method using the same

Resist pattern forming method, resist pattern, crosslinkable negati...

Chemical amplification resist composition, and resist film, resist-...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Negative resist pattern forming method, developer and negative chem...

Patents Applicationslast 30 patents

NEGATIVE RESIST COMPOSITION, RESIST FILM USING SAME, PATTERN FORMIN...

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATI...

CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE CO...

CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEM...

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME