Tadayoshi Kawaguchi

Person

  • Kudamatsu, JP

Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 11,094,509
    • Issue date Aug 17, 2021
    • HITACHI HIGH-TECH CORPORATION
    • Makoto Satake
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,998,168
    • Issue date May 4, 2021
    • HITACHI HIGH-TECH CORPORATION
    • Yusaku Sakka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,796,884
    • Issue date Oct 6, 2020
    • HITACHI HIGH-TECH CORPORATION
    • Tsutomu Tetsuka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 10,541,115
    • Issue date Jan 21, 2020
    • Hitachi High-Technologies Corporation
    • Yusaku Sakka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus with lattice-like faraday shields

    • Patent number 10,229,813
    • Issue date Mar 12, 2019
    • Hitachi High-Technologies Corporation
    • Tadayoshi Kawaguchi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing apparatus

    • Patent number 9,039,865
    • Issue date May 26, 2015
    • Hitachi High-Technologies Corporation
    • Ken Yoshioka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method

    • Patent number 6,914,207
    • Issue date Jul 5, 2005
    • Hitachi High-Technologies Corporation
    • Tadayoshi Kawaguchi
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    RESTORING METHOD FOR INNER WALL MEMBER OF PLASMA PROCESSING APPARATUS

    • Publication number 20240240300
    • Publication date Jul 18, 2024
    • Hitachi High-Tech Corporation
    • Shoichiro Mizunashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20200066487
    • Publication date Feb 27, 2020
    • Hitachi High-Technologies Corporation
    • Yusaku SAKKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20180068835
    • Publication date Mar 8, 2018
    • Hitachi High-Technologies Corporation
    • Makoto SATAKE
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20150311040
    • Publication date Oct 29, 2015
    • Hitachi High-Technologies Corporation
    • TADAYOSHI KAWAGUCHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20150068681
    • Publication date Mar 12, 2015
    • Hitachi High-Technologies Corporation
    • Tsutomu Tetsuka
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20130299091
    • Publication date Nov 14, 2013
    • Hitachi High-Technologies Corporation
    • Yusaku SAKKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20130160949
    • Publication date Jun 27, 2013
    • Hitachi High-Technologies Corporation
    • Yusaku SAKKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20130087288
    • Publication date Apr 11, 2013
    • Hitachi High-Technologies Corporation
    • Yusaku SAKKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20120267050
    • Publication date Oct 25, 2012
    • Hitachi High-Technologies Corporation
    • Yusaku SAKKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20120138229
    • Publication date Jun 7, 2012
    • Hitachi High-Technologies Corporation
    • Yusaku SAKKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20110108194
    • Publication date May 12, 2011
    • Hitachi High-Technologies Corporation
    • Ken YOSHIOKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20080236494
    • Publication date Oct 2, 2008
    • TADAYOSHI KAWAGUCHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma etching equipment

    • Publication number 20080236744
    • Publication date Oct 2, 2008
    • Muneo Furuse
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS

    • Publication number 20080180030
    • Publication date Jul 31, 2008
    • Tsutomu Tetsuka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma etching apparatus and method for forming inner wall of plasm...

    • Publication number 20070215278
    • Publication date Sep 20, 2007
    • Muneo Furuse
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing method

    • Publication number 20040079733
    • Publication date Apr 29, 2004
    • Tadayoshi Kawaguchi
    • H01 - BASIC ELECTRIC ELEMENTS