Tadayoshi Kokubo

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Light-sensitive composition
- Patent number 5,707,777
- Issue date Jan 13, 1998
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photoresist composition comprising a novolak resin ma...
- Patent number 5,576,139
- Issue date Nov 19, 1996
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-sensitive composition
- Patent number 5,576,143
- Issue date Nov 19, 1996
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,565,300
- Issue date Oct 15, 1996
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition comprising a novolak resin having...
- Patent number 5,494,773
- Issue date Feb 27, 1996
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photoresist composition containing naphthoquinone...
- Patent number 5,429,905
- Issue date Jul 4, 1995
- Fuji Photo Film Co., Ltd.
- Shiro Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition comprising a siloxane or silsesquioxane polymer...
- Patent number 5,389,492
- Issue date Feb 14, 1995
- Fuji Photo Film Co., Ltd.
- Tadayoshi Kokubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Micropattern-forming material having a low molecular weight novolak...
- Patent number 5,380,618
- Issue date Jan 10, 1995
- Fuji Photo Film Co., Ltd.
- Tadayoshi Kokubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type 1,2-naphthoquinonediazide photoresist composition con...
- Patent number 5,360,692
- Issue date Nov 1, 1994
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-type photoresist composition
- Patent number 5,340,686
- Issue date Aug 23, 1994
- Fuji Photo Film Co., Ltd.
- Shinji Sakaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photoresist composition
- Patent number 5,340,688
- Issue date Aug 23, 1994
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative type photoresist composition
- Patent number 5,340,697
- Issue date Aug 23, 1994
- Fuji Photo Film Co., Ltd.
- Hiroshi Yoshimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type quinonediazide photoresist composition containing sel...
- Patent number 5,324,618
- Issue date Jun 28, 1994
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive quinone diazide photoresist composition containing select...
- Patent number 5,324,619
- Issue date Jun 28, 1994
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive quinonediazide photoresist composition containing select h...
- Patent number 5,318,875
- Issue date Jun 7, 1994
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive type photoresist composition comprising polyaromatic hydro...
- Patent number 5,290,658
- Issue date Mar 1, 1994
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-type photoresist composition
- Patent number 5,248,582
- Issue date Sep 28, 1993
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 5,173,389
- Issue date Dec 22, 1992
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive type photoresist composition comprising as a photosensitiv...
- Patent number 5,153,096
- Issue date Oct 6, 1992
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 5,130,224
- Issue date Jul 14, 1992
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light-sensitive positive working composition containing a pisolfone...
- Patent number 5,110,709
- Issue date May 5, 1992
- Fuji Photo Film Co., Ltd.
- Toshiaki Aoai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition utilizing O-quinonediazide and nov...
- Patent number 5,089,373
- Issue date Feb 18, 1992
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Developer for positive type photoresists
- Patent number 5,030,550
- Issue date Jul 9, 1991
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 4,894,311
- Issue date Jan 16, 1990
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 4,871,645
- Issue date Oct 3, 1989
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working o-quinone diazide photoresist composition
- Patent number 4,863,828
- Issue date Sep 5, 1989
- Fuji Photo Film Co., Ltd.
- Yasumasa Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positively working resist material
- Patent number 4,842,986
- Issue date Jun 27, 1989
- Fuji Photo Film Co., Ltd.
- Nobuaki Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic printing paper
- Patent number 4,657,846
- Issue date Apr 14, 1987
- Fuji Photo Film Co., Ltd.
- Tadayoshi Kokubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Internal latent image-type silver halide emulsion
- Patent number 4,639,416
- Issue date Jan 27, 1987
- Fuji Photo Film Co., Ltd.
- Tetsuo Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silver halide photographic printing paper
- Patent number 4,592,991
- Issue date Jun 3, 1986
- Fuji Photo Film Co., Ltd.
- Tetsuo Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tadayoshi Kokubo

Person

Patents Grantslast 30 patents

Light-sensitive composition

Positive type photoresist composition comprising a novolak resin ma...

Light-sensitive composition

Positive photoresist composition

Positive photoresist composition comprising a novolak resin having...

Positive working photoresist composition containing naphthoquinone...

Resist composition comprising a siloxane or silsesquioxane polymer...

Micropattern-forming material having a low molecular weight novolak...

Positive type 1,2-naphthoquinonediazide photoresist composition con...

Positive-type photoresist composition

Positive type photoresist composition

Negative type photoresist composition

Positive type quinonediazide photoresist composition containing sel...

Positive quinone diazide photoresist composition containing select...

Positive quinonediazide photoresist composition containing select h...

Positive type photoresist composition comprising polyaromatic hydro...

Positive-type photoresist composition

Positive-working photoresist composition

Positive type photoresist composition comprising as a photosensitiv...

Positive-working photoresist composition

Light-sensitive positive working composition containing a pisolfone...

Positive photoresist composition utilizing O-quinonediazide and nov...

Developer for positive type photoresists

Positive-working photoresist composition

Positive-working photoresist composition

Positive-working o-quinone diazide photoresist composition

Positively working resist material

Silver halide photographic printing paper

Internal latent image-type silver halide emulsion

Silver halide photographic printing paper