Taeho Cha

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Gyeonggi-Do, KR

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Patents Grantslast 30 patents

Information Patent Grant
Dual gate structure, fabrication method for the same, semiconductor...
- Patent number 7,939,401
- Issue date May 10, 2011
- Samsung Electronics Co., Ltd.
- Heesook Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual gate structure, fabrication method for the same, semiconductor...
- Patent number 7,635,897
- Issue date Dec 22, 2009
- Samsung Electronics Co., Ltd.
- Heesook Park
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATED CIRCUIT DEVICE
- Publication number 20240321874
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Jeonghyeon Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE
- Publication number 20240304704
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Subin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL GATE STRUCTURE, FABRICATION METHOD FOR THE SAME, SEMICONDUCTOR...
- Publication number 20100055891
- Publication date Mar 4, 2010
- Heesook Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual gate structure, fabrication method for the same, semiconductor...
- Publication number 20070034964
- Publication date Feb 15, 2007
- Heesook Park
- H01 - BASIC ELECTRIC ELEMENTS