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Taeho Shin
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San Jose, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma control using dual cathode frequency mixing
Patent number
7,838,430
Issue date
Nov 23, 2010
Applied Materials, Inc.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma control using dual cathode frequency mixing and controlling...
Patent number
7,736,914
Issue date
Jun 15, 2010
Applied Materials, Inc.
Jingbao Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for providing uniform plasma in a magnetic fie...
Patent number
7,374,636
Issue date
May 20, 2008
Applied Materials, Inc.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for controlling the magnetic field intensity i...
Patent number
7,316,199
Issue date
Jan 8, 2008
Applied Materials, Inc.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Storage poly process without carbon contamination
Patent number
6,372,151
Issue date
Apr 16, 2002
Applied Materials, Inc.
Taeho Shin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma etching of polysilicon using fluorinated gas mixtures
Patent number
6,312,616
Issue date
Nov 6, 2001
Applied Materials, Inc.
Jeffrey Chinn
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLASMA CONTROL USING DUAL CATHODE FREQUENCY MIXING
Publication number
20090142859
Publication date
Jun 4, 2009
Applied Materials, Inc.
JINGBAO LIU
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of controlling sidewall profile by using intermittent, perio...
Publication number
20080286979
Publication date
Nov 20, 2008
APPLIED MATERIALS, INC.
Taeho Shin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
STABILIZING AN OPENED CARBON HARDMASK
Publication number
20080102553
Publication date
May 1, 2008
Applied Materials, Inc.
TAEHO SHIN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of controlling silicon-containing polymer build up during et...
Publication number
20070243714
Publication date
Oct 18, 2007
APPLIED MATERIALS, INC.
Taeho Shin
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA CONTROL USING DUAL CATHODE FREQUENCY MIXING
Publication number
20070000611
Publication date
Jan 4, 2007
Applied Materials, Inc.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma control using dual cathode frequency mixing
Publication number
20050090118
Publication date
Apr 28, 2005
APPLIED MATERIALS, INC.
Steven C. Shannon
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for creating circumferential process gas flow...
Publication number
20030192645
Publication date
Oct 16, 2003
APPLIED MATERIALS, INC.
Jingboa Liu
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Method and apparatus for controlling the magnetic field intensity i...
Publication number
20030085000
Publication date
May 8, 2003
APPLIED MATERIALS, INC.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for providing uniform plasma in a magnetic fie...
Publication number
20030006008
Publication date
Jan 9, 2003
APPLIED MATERIALS, INC.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS