Taeko Ikegawa

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Kanagawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Copolymer, photoresist composition, and process for forming resist...
- Patent number 6,884,566
- Issue date Apr 26, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer, photoresist composition, and process for forming resist...
- Patent number 6,517,993
- Issue date Feb 11, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20040096772
- Publication date May 20, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20030186171
- Publication date Oct 2, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel copolymer, photoresist composition, and process for forming r...
- Publication number 20020031719
- Publication date Mar 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel copolymer, photoresist composition , and process for forming...
- Publication number 20020031720
- Publication date Mar 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...