Taichi Hirano

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,181
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,182
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,476,089
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply system
- Patent number 10,755,894
- Issue date Aug 25, 2020
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and probe apparatus
- Patent number 10,229,819
- Issue date Mar 12, 2019
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,115,567
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply system, plasma processing apparatus and power supply c...
- Patent number 10,056,230
- Issue date Aug 21, 2018
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply system, plasma etching apparatus, and plasma etching m...
- Patent number 9,922,802
- Issue date Mar 20, 2018
- Tokyo Electron Limited
- Taichi Hirano
- G05 - CONTROLLING REGULATING
Information Patent Grant
Chamber cleaning method
- Patent number 8,999,068
- Issue date Apr 7, 2015
- Tokyo Electron Limited
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,512,510
- Issue date Aug 20, 2013
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and impedance adjustment method
- Patent number 8,193,097
- Issue date Jun 5, 2012
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,178,444
- Issue date May 15, 2012
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,506,610
- Issue date Mar 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method, and electrode plate for pla...
- Patent number 7,494,561
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250062101
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230377843
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220216036
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210327681
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200411286
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY SYSTEM
- Publication number 20180226226
- Publication date Aug 9, 2018
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- G05 - CONTROLLING REGULATING
Information Patent Application
POWER SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS AND POWER SUPPLY C...
- Publication number 20160284514
- Publication date Sep 29, 2016
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160079037
- Publication date Mar 17, 2016
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROBE APPARATUS
- Publication number 20150114563
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY SYSTEM, PLASMA ETCHING APPARATUS, AND PLASMA ETCHING M...
- Publication number 20150000842
- Publication date Jan 1, 2015
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20110214813
- Publication date Sep 8, 2011
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMBER CLEANING METHOD
- Publication number 20110048453
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Masanobu Honda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20100043974
- Publication date Feb 25, 2010
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND IMPEDANCE ADJUSTMENT METHOD
- Publication number 20090223926
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20090197423
- Publication date Aug 6, 2009
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and impedance adjustment method
- Publication number 20060021580
- Publication date Feb 2, 2006
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20060000803
- Publication date Jan 5, 2006
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method, and electrode plate for pla...
- Publication number 20050269292
- Publication date Dec 8, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20050257743
- Publication date Nov 24, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Taichi Hirano

Person

Patents Grantslast 30 patents

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Power supply system

Plasma processing apparatus and probe apparatus

Plasma processing apparatus

Power supply system, plasma processing apparatus and power supply c...

Power supply system, plasma etching apparatus, and plasma etching m...

Chamber cleaning method

Plasma processing method and apparatus

Plasma processing apparatus and impedance adjustment method

Substrate processing method and substrate processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus and method, and electrode plate for pla...

Patents Applicationslast 30 patents

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

POWER SUPPLY SYSTEM

POWER SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS AND POWER SUPPLY C...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PROBE APPARATUS

POWER SUPPLY SYSTEM, PLASMA ETCHING APPARATUS, AND PLASMA ETCHING M...

PLASMA PROCESSING METHOD AND APPARATUS

CHAMBER CLEANING METHOD

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA PROCESSING APPARATUS AND IMPEDANCE ADJUSTMENT METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Plasma processing apparatus and impedance adjustment method

Plasma processing method and apparatus

Plasma processing apparatus and method, and electrode plate for pla...

Plasma processing apparatus and method