Taiga FUDETANI

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Fukushima, JP

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
- Patent number 12,032,280
- Issue date Jul 9, 2024
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE EQUIPPED WI...
- Publication number 20250076748
- Publication date Mar 6, 2025
- AGC Inc.
- Yusuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD,...
- Publication number 20250036020
- Publication date Jan 30, 2025
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
- Publication number 20240160097
- Publication date May 16, 2024
- AGC Inc.
- Hiroshi HANEKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY