Taiga OGOSE

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, and reflective mask
- Patent number 12,353,121
- Issue date Jul 8, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga Ogose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, and method for manufacturing reflective mask
- Patent number 12,265,321
- Issue date Apr 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with film for reflective mask blank, reflective mask blan...
- Patent number 12,124,162
- Issue date Oct 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD THEREOF
- Publication number 20250172862
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...
- Publication number 20250138410
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK
- Publication number 20240210812
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Mask Blank, Reflective Mask, and Manufacturing Method Th...
- Publication number 20240210813
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20240077797
- Publication date Mar 7, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND REFLECTIVE MASK
- Publication number 20230152680
- Publication date May 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20230104571
- Publication date Apr 6, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20220404694
- Publication date Dec 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Taiga OGOSE

Person

Patents Grantslast 30 patents

Reflective mask blank, and reflective mask

Reflective mask blank, and method for manufacturing reflective mask

Substrate with film for reflective mask blank, reflective mask blan...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD THEREOF

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...

REFLECTIVE MASK BLANK

Reflective Mask Blank, Reflective Mask, and Manufacturing Method Th...

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK

REFLECTIVE MASK BLANK, AND REFLECTIVE MASK

SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK