Taiichi Furukawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Negative resist pattern-forming method, and composition for upper l...
- Patent number 11,687,003
- Issue date Jun 27, 2023
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist pattern-forming method, and composition for upper l...
- Patent number 10,073,344
- Issue date Sep 11, 2018
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 10,025,188
- Issue date Jul 17, 2018
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,335,630
- Issue date May 10, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,298,090
- Issue date Mar 29, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method
- Patent number 9,229,323
- Issue date Jan 5, 2016
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,223,207
- Issue date Dec 29, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,170,488
- Issue date Oct 27, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,164,387
- Issue date Oct 20, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,122,163
- Issue date Sep 1, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and radiation-sensitive composition
- Patent number 9,034,559
- Issue date May 19, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method
- Patent number 8,993,223
- Issue date Mar 31, 2015
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer
- Patent number 8,980,539
- Issue date Mar 17, 2015
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 8,822,140
- Issue date Sep 2, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 8,815,493
- Issue date Aug 26, 2014
- JSR Corporation
- Koji Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 8,795,954
- Issue date Aug 5, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern and developer
- Patent number 8,703,401
- Issue date Apr 22, 2014
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 8,669,042
- Issue date Mar 11, 2014
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern
- Patent number 8,530,146
- Issue date Sep 10, 2013
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393687
- Publication date Nov 28, 2024
- JSR Corporation
- Fuyuki EGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240393688
- Publication date Nov 28, 2024
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220299873
- Publication date Sep 22, 2022
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220229367
- Publication date Jul 21, 2022
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...
- Publication number 20190004426
- Publication date Jan 3, 2019
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170322492
- Publication date Nov 9, 2017
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160320705
- Publication date Nov 3, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...
- Publication number 20160299432
- Publication date Oct 13, 2016
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION ME...
- Publication number 20160252818
- Publication date Sep 1, 2016
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160097978
- Publication date Apr 7, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION ME...
- Publication number 20150355550
- Publication date Dec 10, 2015
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20150177616
- Publication date Jun 25, 2015
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150160556
- Publication date Jun 11, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150050600
- Publication date Feb 19, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140363766
- Publication date Dec 11, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140295350
- Publication date Oct 2, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140255854
- Publication date Sep 11, 2014
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DEVELOPER
- Publication number 20140178825
- Publication date Jun 26, 2014
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20140134544
- Publication date May 15, 2014
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION
- Publication number 20130337385
- Publication date Dec 19, 2013
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20130323653
- Publication date Dec 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20130316287
- Publication date Nov 28, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130295506
- Publication date Nov 7, 2013
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130230803
- Publication date Sep 5, 2013
- JSR Corporation
- Koji ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20130230804
- Publication date Sep 5, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130224661
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130224666
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN AND DEVELOPER
- Publication number 20120308938
- Publication date Dec 6, 2012
- JSR Corporation
- Taiichi FURUKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120202150
- Publication date Aug 9, 2012
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20120183908
- Publication date Jul 19, 2012
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Taiichi Furukawa

Person

Patents Grantslast 30 patents

Negative resist pattern-forming method, and composition for upper l...

Negative resist pattern-forming method, and composition for upper l...

Resist pattern-forming method

Pattern-forming method, and radiation-sensitive composition

Pattern-forming method, and radiation-sensitive composition

Pattern-forming method

Resist pattern-forming method, and radiation-sensitive resin compos...

Resist pattern-forming method, and radiation-sensitive resin compos...

Pattern-forming method, and radiation-sensitive resin composition

Pattern-forming method, and radiation-sensitive resin composition

Pattern-forming method, and radiation-sensitive composition

Resist pattern-forming method

Developer

Resist pattern-forming method

Resist pattern-forming method, and radiation-sensitive resin compos...

Resist pattern-forming method, and radiation-sensitive resin compos...

Method for forming pattern and developer

Resist pattern-forming method

Method for forming resist pattern

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER L...

PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION ME...

RESIST PATTERN-FORMING METHOD

PRODUCTION METHOD OF SEMICONDUCTOR ELEMENT, AND ION IMPLANTATION ME...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

PATTERN-FORMING METHOD

DEVELOPER

RESIST PATTERN-FORMING METHOD

NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION

RESIST PATTERN-FORMING METHOD

PHOTORESIST COMPOSITION

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

METHOD FOR FORMING PATTERN AND DEVELOPER

RADIATION-SENSITIVE RESIN COMPOSITION

RESIST PATTERN-FORMING METHOD