Takafumi Endo

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition containing a heterocyclic compound having a dicyanostyr...
- Patent number 12,366,804
- Issue date Jul 22, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical solution-resistant protective film forming composition con...
- Patent number 12,344,758
- Issue date Jul 1, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical-resistant protective film forming composition containing h...
- Patent number 12,331,156
- Issue date Jun 17, 2025
- NISSAN CHEMICAL CORPORATION
- Shigetaka Otagiri
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film forming composition having a disulfide struc...
- Patent number 12,222,651
- Issue date Feb 11, 2025
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-resistant protective film-forming composition containing p...
- Patent number 12,077,633
- Issue date Sep 3, 2024
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 12,072,629
- Issue date Aug 27, 2024
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Protective film-forming composition having acetal structure and ami...
- Patent number 12,044,968
- Issue date Jul 23, 2024
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition containing a dicyanostyryl group, for forming a resist...
- Patent number 11,977,331
- Issue date May 7, 2024
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-resistant protective film forming composition containing h...
- Patent number 11,965,059
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Shigetaka Otagiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective film forming composition having a diol structure
- Patent number 11,768,436
- Issue date Sep 26, 2023
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 11,681,223
- Issue date Jun 20, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming resist overlayer film for EUV lithography
- Patent number 11,675,269
- Issue date Jun 13, 2023
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming underlayer film of self-assembled film incl...
- Patent number 11,674,053
- Issue date Jun 13, 2023
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Stepped substrate coating composition containing compound having cu...
- Patent number 11,674,051
- Issue date Jun 13, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 11,650,505
- Issue date May 16, 2023
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protective film forming composition having an acetal structure
- Patent number 11,460,771
- Issue date Oct 4, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Crosslinkable compound-containing photocurable stepped substrate-co...
- Patent number 11,454,889
- Issue date Sep 27, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Multi-level substrate coating film-forming composition containing p...
- Patent number 11,385,546
- Issue date Jul 12, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming resist underlayer film having improved flat...
- Patent number 11,287,742
- Issue date Mar 29, 2022
- NISSAN CHEMICAL CORPORATION
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac polym...
- Patent number 11,199,777
- Issue date Dec 14, 2021
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition for lithography containi...
- Patent number 11,194,251
- Issue date Dec 7, 2021
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photocrosslinkable group-containing composition for coating stepped...
- Patent number 11,155,684
- Issue date Oct 26, 2021
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Stepped substrate-coating composition containing polyether resin ha...
- Patent number 10,871,712
- Issue date Dec 22, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing substituted c...
- Patent number 10,809,619
- Issue date Oct 20, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bottom layer film-formation composition of self-organizing film con...
- Patent number 10,508,181
- Issue date Dec 17, 2019
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for forming resist underlayer film with reduced outgassing
- Patent number 10,437,150
- Issue date Oct 8, 2019
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing polymer havin...
- Patent number 10,394,124
- Issue date Aug 27, 2019
- Nissan Chemical Industries, Ltd.
- Keisuke Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition for lithography containi...
- Patent number 10,295,907
- Issue date May 21, 2019
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING H...
- Publication number 20240301126
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Shigetaka OTAGIRI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20230244141
- Publication date Aug 3, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPP...
- Publication number 20230213857
- Publication date Jul 6, 2023
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE...
- Publication number 20220404706
- Publication date Dec 22, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION CONTAINING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST...
- Publication number 20220397828
- Publication date Dec 15, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION CONTAINING A HETEROCYCLIC COMPOUND HAVING A DICYANOSTYR...
- Publication number 20220319839
- Publication date Oct 6, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING H...
- Publication number 20220204686
- Publication date Jun 30, 2022
- NISSAN CHEMICAL CORPORATION
- Shigetaka OTAGIRI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL SOLUTION-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CON...
- Publication number 20220145119
- Publication date May 12, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE FILM-FORMING COMPOSITION HAVING ACETAL STRUCTURE AND AMI...
- Publication number 20220026806
- Publication date Jan 27, 2022
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING P...
- Publication number 20210403635
- Publication date Dec 30, 2021
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLYING FILM-FORMING COMPOSITION COMPRISING A REACTION PR...
- Publication number 20210271168
- Publication date Sep 2, 2021
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUC...
- Publication number 20210063881
- Publication date Mar 4, 2021
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STEPPED SUBSTRATE COATING COMPOSITION CONTAINING COMPOUND HAVING CU...
- Publication number 20210024773
- Publication date Jan 28, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION HAVING AN ACETAL STRUCTURE
- Publication number 20200409260
- Publication date Dec 31, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...
- Publication number 20200379352
- Publication date Dec 3, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PROTECTIVE FILM FORMING COMPOSITION HAVING A DIOL STRUCTURE
- Publication number 20200319561
- Publication date Oct 8, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...
- Publication number 20200301278
- Publication date Sep 24, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSSLINKABLE COMPOUND-CONTAINING PHOTOCURABLE STEPPED SUBSTRATE-CO...
- Publication number 20200225585
- Publication date Jul 16, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING IMPROVED FLAT...
- Publication number 20200174370
- Publication date Jun 4, 2020
- NISSAN CHEMICAL CORPORATION
- Hirokazu NISHIMAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...
- Publication number 20200124966
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20190171101
- Publication date Jun 6, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...
- Publication number 20190079397
- Publication date Mar 14, 2019
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG CHAIN AL...
- Publication number 20180314154
- Publication date Nov 1, 2018
- Nissan Chemical Industries, Ltd.
- Daigo SAITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING EPOXY ADDUCT...
- Publication number 20180181001
- Publication date Jun 28, 2018
- Nissan Chemical Industries, Ltd.
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCROSSLINKABLE GROUP-CONTAINING COMPOSITION FOR COATING STEPPED...
- Publication number 20180086886
- Publication date Mar 29, 2018
- Nissan Chemical Industries, Ltd.
- Rikimaru SAKAMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVIN...
- Publication number 20170315445
- Publication date Nov 2, 2017
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COATING LIQUID FOR RESIST PATTERN COATING
- Publication number 20170293227
- Publication date Oct 12, 2017
- Nissan Chemical Industries, Ltd.
- Tokio NISHITA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC RESIN...
- Publication number 20170227850
- Publication date Aug 10, 2017
- Nissan Chemical Industries, Ltd.
- Hirokazu NISHIMAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PR...
- Publication number 20170205711
- Publication date Jul 20, 2017
- Nissan Chemical Industries, Ltd.
- Noriaki Fujitani
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20170153548
- Publication date Jun 1, 2017
- Nissan Chemical Industries, Ltd.
- Hirokazu NISHIMAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Takafumi Endo

Person

Patents Grantslast 30 patents

Composition containing a heterocyclic compound having a dicyanostyr...

Chemical solution-resistant protective film forming composition con...

Chemical-resistant protective film forming composition containing h...

Resist underlayer film-forming composition comprising epoxy adduct...

Resist underlayer film forming composition having a disulfide struc...

Photocurable composition and method for producing semiconductor device

Chemical-resistant protective film-forming composition containing p...

Resist underlayer film-forming composition containing novolac resin...

Protective film-forming composition having acetal structure and ami...

Composition containing a dicyanostyryl group, for forming a resist...

Chemical-resistant protective film forming composition containing h...

Protective film forming composition having a diol structure

Photocurable composition and method for producing semiconductor device

Composition for forming resist overlayer film for EUV lithography

Composition for forming underlayer film of self-assembled film incl...

Stepped substrate coating composition containing compound having cu...

Resist underlayer film-forming composition containing novolac resin...

Protective film forming composition having an acetal structure

Crosslinkable compound-containing photocurable stepped substrate-co...

Multi-level substrate coating film-forming composition containing p...

Composition for forming resist underlayer film having improved flat...

Resist underlayer film-forming composition containing novolac polym...

Resist underlayer film-forming composition for lithography containi...

Photocrosslinkable group-containing composition for coating stepped...

Stepped substrate-coating composition containing polyether resin ha...

Resist underlayer film-forming composition containing substituted c...

Bottom layer film-formation composition of self-organizing film con...

Composition for forming resist underlayer film with reduced outgassing

Resist underlayer film-forming composition containing polymer havin...

Resist underlayer film-forming composition for lithography containi...

Patents Applicationslast 30 patents

CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING H...

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPP...

CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE...

COMPOSITION CONTAINING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST...

COMPOSITION CONTAINING A HETEROCYCLIC COMPOUND HAVING A DICYANOSTYR...

CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING H...

CHEMICAL SOLUTION-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CON...

PROTECTIVE FILM-FORMING COMPOSITION HAVING ACETAL STRUCTURE AND AMI...

CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION CONTAINING P...

RESIST UNDERLYING FILM-FORMING COMPOSITION COMPRISING A REACTION PR...

RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING A DISULFIDE STRUC...

STEPPED SUBSTRATE COATING COMPOSITION CONTAINING COMPOUND HAVING CU...

PROTECTIVE FILM FORMING COMPOSITION HAVING AN ACETAL STRUCTURE

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...

PROTECTIVE FILM FORMING COMPOSITION HAVING A DIOL STRUCTURE

STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...

CROSSLINKABLE COMPOUND-CONTAINING PHOTOCURABLE STEPPED SUBSTRATE-CO...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING IMPROVED FLAT...

MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG CHAIN AL...

RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING EPOXY ADDUCT...

PHOTOCROSSLINKABLE GROUP-CONTAINING COMPOSITION FOR COATING STEPPED...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVIN...

COATING LIQUID FOR RESIST PATTERN COATING

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC RESIN...

COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PR...

RESIST UNDERLAYER FILM-FORMING COMPOSITION